Claims
- 1. A method for forming a permanent reproduction of a half-tone color image comprising:
- selecting a substantially reflecting inorganic refractory substrate having a first index of refraction, said substrate being selected from the group consisting of silicon, germanium, gallium arsenide, sapphire, and alumina;
- depositing a substantially transparent inorganic thin film coating having a second index of refraction onto said substrate, where the second index of refraction is less than the first index of refraction and said thin film is selected from the group consisting of silicon nitride, silicon monoxide, silicon dioxide, alumina, tantalum oxide, and titanium oxide;
- building the deposit of said thin film to a thickness substantially equal to an odd number of quarter wavelengths of the viewing light for determining the color and quality of the resulting image, said thin film thickness being in the range of 50-1000 nanometers;
- coating the thin film with a photosensitive mask;
- selectively exposing the mask to form the half-tone image in the photosensitive layer;
- developing the exposed mask areas; and
- etching to produce the desired pattern of openings in the thin film wherein the area of the openings is proportional to the local intensity of the image formed.
- 2. The method accordingly to claim 1, where said second index of refraction is substantially equal to the square root of said first index of refraction.
Parent Case Info
This application is a continuation of application Ser. No. 221,167, filed 12/29/80, now abandoned.
US Referenced Citations (11)
Foreign Referenced Citations (1)
Number |
Date |
Country |
1514420 |
Jun 1978 |
GBX |
Continuations (1)
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Number |
Date |
Country |
Parent |
221167 |
Dec 1980 |
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