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G03F1/54

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/54Absorbers

Industries

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Patents Grantslast 30 patents

Information Patent Grant
EUV photo masks and manufacturing method thereof
- Patent number 12,147,154
- Issue date Nov 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate with film for reflective mask blank, reflective mask blan...
- Patent number 12,124,162
- Issue date Oct 22, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask defect prevention
- Patent number 12,124,163
- Issue date Oct 22, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Ta Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective photomask blank and reflective photomask
- Patent number 12,111,565
- Issue date Oct 8, 2024
- TOPPAN INC.
- Ayumi Goda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for forming extreme ultraviolet mask comprising magnetic ma...
- Patent number 12,092,952
- Issue date Sep 17, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kevin Tanady
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask and method of forming the same
- Patent number 12,066,757
- Issue date Aug 20, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Chiang Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask blanks and methods for depositing layers on mask blank
- Patent number 12,019,367
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, transfer mask, and method for manufacturing semiconduct...
- Patent number 12,013,631
- Issue date Jun 18, 2024
- Hoya Corporation
- Hiroaki Shishido
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Protection layer on low thermal expansion material (LTEM) substrate...
- Patent number 12,001,132
- Issue date Jun 4, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Pei-Cheng Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 12,001,133
- Issue date Jun 4, 2024
- AGC Inc.
- Takuma Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and method of fabricating a photomask
- Patent number 11,982,936
- Issue date May 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for making photolithography mask plate
- Patent number 11,947,255
- Issue date Apr 2, 2024
- Tsinghua University
- Mo Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank and reflective mask
- Patent number 11,914,283
- Issue date Feb 27, 2024
- AGC Inc.
- Hiroyoshi Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask and method of manufacturing...
- Patent number 11,892,768
- Issue date Feb 6, 2024
- Hoya Corporation
- Mizuki Kataoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask defect prevention
- Patent number 11,860,530
- Issue date Jan 2, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Ta Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask including fiducial mark and method of making a semiconduc...
- Patent number 11,860,532
- Issue date Jan 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography mask with a black border regions and method of fabricat...
- Patent number 11,852,966
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chin-Hsiang Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV photomask
- Patent number 11,846,881
- Issue date Dec 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ching-Huang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask blank for EUV exposure, and reflective mask
- Patent number 11,835,852
- Issue date Dec 5, 2023
- AGC Inc.
- Hiroyoshi Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV photo masks and manufacturing method thereof
- Patent number 11,829,062
- Issue date Nov 28, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Pei-Cheng Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV lithography mask with a porous reflective multilayer structure
- Patent number 11,809,075
- Issue date Nov 7, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask and method of manufacturing the same
- Patent number 11,789,355
- Issue date Oct 17, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank and reflective mask
- Patent number 11,703,751
- Issue date Jul 18, 2023
- AGC Inc.
- Hiroshi Hanekawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of accelerated hazing of mask assembly
- Patent number 11,703,752
- Issue date Jul 18, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wu-Hung Ko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Interconnection structure fabrication using grayscale lithography
- Patent number 11,664,303
- Issue date May 30, 2023
- Intel Corporation
- Johanna Swan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask and method of forming the same
- Patent number 11,662,656
- Issue date May 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Chiang Tu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,630,385
- Issue date Apr 18, 2023
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, method for manufacturing phase shift mask, and method f...
- Patent number 11,630,388
- Issue date Apr 18, 2023
- Hoya Corporation
- Osamu Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask blank, transfer mask, and method of manufacturing semiconducto...
- Patent number 11,624,979
- Issue date Apr 11, 2023
- Hoya Corporation
- Kazutake Taniguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV photo masks and manufacturing method thereof
- Patent number 11,619,875
- Issue date Apr 4, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsin-Chang Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
REFLECTIVE PHOTOMASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE...
- Publication number 20240411219
- Publication date Dec 12, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keisuke SAKURAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR FORMING EXTREME ULTRAVIOLET MASK COMPRISING MAGNETIC MA...
- Publication number 20240393674
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kevin TANADY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK DEFECT PREVENTION
- Publication number 20240385507
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi-Ta Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF
- Publication number 20240385506
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsin-Chang LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV Lithography Mask With A Porous Reflective Multilayer Structure
- Publication number 20240377720
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WITH MULTILAYER REFLECTIVE FILM REFLECTIVE MASK BLANK, RE...
- Publication number 20240377719
- Publication date Nov 14, 2024
- HOYA CORPORATION
- Teiichiro UMEZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK AND METHOD OF FORMING THE SAME
- Publication number 20240377722
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Chiang Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optical Component with Apodized Mask
- Publication number 20240319582
- Publication date Sep 26, 2024
- Apple Inc.
- Takeyoshi Saiga
- G02 - OPTICS
Information Patent Application
REFLECTIVE PHOTOMASK AND METHOD FOR MANUFACTURING REFLECTIVE PHOTOMASK
- Publication number 20240288763
- Publication date Aug 29, 2024
- TOPPAN PHOTOMASK CO., LTD.
- Daisuke Miyawaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20240280890
- Publication date Aug 22, 2024
- AGC Inc.
- Takuma KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate with Film for Reflective Mask Blank, and Reflective Mask...
- Publication number 20240248388
- Publication date Jul 25, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo TERASAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOMASKS HAVING INTERMEDIATE BARRIER LAYERS
- Publication number 20240241434
- Publication date Jul 18, 2024
- Intel Corporation
- Yongbae Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR DETERMINING OPTICAL PROPERTIES OF DEPOSITI...
- Publication number 20240219844
- Publication date Jul 4, 2024
- Carl Zeiss SMT GMBH
- Nicole Auth
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK FOR EXTREME ULTRAVIOLET LITHOGRAPHY AND A METHOD OF...
- Publication number 20240219824
- Publication date Jul 4, 2024
- Samsung Electronics Co., Ltd.
- AKIO MISAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
- Publication number 20240176225
- Publication date May 30, 2024
- AGC Inc.
- Hiroyoshi TANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FABRICATING EUV MASK AND PHOTOMASK USING THE EUV MASK
- Publication number 20240176226
- Publication date May 30, 2024
- SK HYNIX INC.
- Suk Won PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD FOR MANUFACTURING RE...
- Publication number 20240142866
- Publication date May 2, 2024
- HOYA CORPORATION
- Masanori NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK INCLUDING FIDUCIAL MARK AND METHOD OF MAKING A PHOTOMASK
- Publication number 20240094625
- Publication date Mar 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsin-Chang LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR QUALIFYING A MASK FOR USE IN LITHOGRAPHY
- Publication number 20240085779
- Publication date Mar 14, 2024
- Carl Zeiss SMT GMBH
- Renzo Capelli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE MASK
- Publication number 20240077797
- Publication date Mar 7, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE MASK, PATTERN FORMING METHOD, AND METHOD OF MANUFACTURING...
- Publication number 20240069430
- Publication date Feb 29, 2024
- KIOXIA Corporation
- Naoki SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET MASK WITH DIFFUSION BARRIER LAYER
- Publication number 20240045318
- Publication date Feb 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsin-Chang LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20240045320
- Publication date Feb 8, 2024
- AGC Inc.
- Takuma KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK AND METHOD OF DESIGNING ANTI-REFLECTION PATTERN OF...
- Publication number 20240027890
- Publication date Jan 25, 2024
- Samsung Electronics Co., Ltd.
- Hyungjong Bae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV Lithography Mask With A Porous Reflective Multilayer Structure
- Publication number 20230384663
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV PHOTOMASK AND RELATED METHODS
- Publication number 20230386838
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi-Hung LIAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF
- Publication number 20230375910
- Publication date Nov 23, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Cheng Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK
- Publication number 20230375908
- Publication date Nov 23, 2023
- TOPPAN PHOTOMASK CO., LTD.
- Kazuaki MATSUI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANK MASK AND PHOTOMASK USING THE SAME
- Publication number 20230367200
- Publication date Nov 16, 2023
- SK enpulse Co., Ltd.
- Seong Yoon KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask Defect Prevention
- Publication number 20230367197
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi-Ta Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

EUV photo masks and manufacturing method thereof

Substrate with film for reflective mask blank, reflective mask blan...

Mask defect prevention

Reflective photomask blank and reflective photomask

Methods for forming extreme ultraviolet mask comprising magnetic ma...

Mask and method of forming the same

Mask blanks and methods for depositing layers on mask blank

Mask blank, transfer mask, and method for manufacturing semiconduct...

Protection layer on low thermal expansion material (LTEM) substrate...

Reflective mask blank, reflective mask, method of manufacturing ref...

Photomask and method of fabricating a photomask

Method for making photolithography mask plate

Reflective mask blank and reflective mask

Reflective mask blank, reflective mask and method of manufacturing...

Mask defect prevention

Photomask including fiducial mark and method of making a semiconduc...

Lithography mask with a black border regions and method of fabricat...

EUV photomask

Reflective mask blank for EUV exposure, and reflective mask

EUV photo masks and manufacturing method thereof

EUV lithography mask with a porous reflective multilayer structure

Extreme ultraviolet mask and method of manufacturing the same

Reflective mask blank and reflective mask

Method of accelerated hazing of mask assembly

Interconnection structure fabrication using grayscale lithography

Mask and method of forming the same

Extreme ultraviolet mask absorber materials

Mask blank, method for manufacturing phase shift mask, and method f...

Mask blank, transfer mask, and method of manufacturing semiconducto...

EUV photo masks and manufacturing method thereof

Patents Applicationslast 30 patents

REFLECTIVE PHOTOMASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE...

METHODS FOR FORMING EXTREME ULTRAVIOLET MASK COMPRISING MAGNETIC MA...

MASK DEFECT PREVENTION

EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF

EUV Lithography Mask With A Porous Reflective Multilayer Structure

SUBSTRATE WITH MULTILAYER REFLECTIVE FILM REFLECTIVE MASK BLANK, RE...

MASK AND METHOD OF FORMING THE SAME

Optical Component with Apodized Mask

REFLECTIVE PHOTOMASK AND METHOD FOR MANUFACTURING REFLECTIVE PHOTOMASK

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

Substrate with Film for Reflective Mask Blank, and Reflective Mask...

PHOTOMASKS HAVING INTERMEDIATE BARRIER LAYERS

METHOD AND APPARATUS FOR DETERMINING OPTICAL PROPERTIES OF DEPOSITI...

REFLECTIVE MASK FOR EXTREME ULTRAVIOLET LITHOGRAPHY AND A METHOD OF...

REFLECTIVE MASK BLANK AND REFLECTIVE MASK

METHOD FOR FABRICATING EUV MASK AND PHOTOMASK USING THE EUV MASK

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD FOR MANUFACTURING RE...

PHOTOMASK INCLUDING FIDUCIAL MARK AND METHOD OF MAKING A PHOTOMASK

METHOD AND APPARATUS FOR QUALIFYING A MASK FOR USE IN LITHOGRAPHY

REFLECTIVE MASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE MASK

EXPOSURE MASK, PATTERN FORMING METHOD, AND METHOD OF MANUFACTURING...

EXTREME ULTRAVIOLET MASK WITH DIFFUSION BARRIER LAYER

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

REFLECTIVE MASK AND METHOD OF DESIGNING ANTI-REFLECTION PATTERN OF...

EUV Lithography Mask With A Porous Reflective Multilayer Structure

EUV PHOTOMASK AND RELATED METHODS

EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF

REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK

BLANK MASK AND PHOTOMASK USING THE SAME

Mask Defect Prevention