A claim of priority is made to Korean Patent Application No. 10-2008-0113343, filed on Nov. 14, 2008, in the Korean Intellectual Properly Office, the subject matter of which is hereby incorporated by reference.
Embodiments of the present inventive concept relate to a phase-change random access memory device, and more particularly, to a phase-change random access memory device which discharges nodes positioned on a sensing path during periods other than a sensing period.
Phase-change random access memory (PRAM) is non-volatile memory that stores data using material, such as germanium, antimony and tellurium (GeSbTe), called “GST,” the resistivity of which changes according to phase-changes corresponding to temperature changes (hereinafter, referred to as phase-change material). Generally, PRAM has non-volatile and low power consumption characteristics, together with the characteristics of dynamic random access memory (DRAM). Thus, PRAM has been recognized as next-generation memory.
According to an aspect of the present invention, there is provided a phase-change random access memory device, including a phase-change memory cell array, a sensing unit and a discharge unit. The phase-change memory cell array includes multiple phase-change memory cells. The sensing unit detects data, stored in a phase-change memory cell to be sensed of the multiple phase-change memory cells, during a sensing period. The discharge unit discharges at least one node positioned on a sensing path between the phase-change memory cell array and the sensing unit during a period other than the sensing period.
The discharge unit may discharge the at least one node positioned on the sensing path with a ground voltage.
The discharge unit may include a first terminal connected to the at least one node, a second terminal connected to the ground voltage, and at least one discharge transistor including a gate that receives a discharge control signal. The discharge control signal may be disabled during the sensing period and enabled during the period other than the sensing period.
The phase-change memory cell to be sensed is connected to a word line and a bit line. The sensing unit may compare a voltage of the bit line connected to the phase-change memory cell to be sensed with a reference voltage to detect the data stored in the phase-change memory cell to be sensed.
The embodiments of the present invention will be described with reference to the attached drawings, in which:
The present invention will now be described more fully with reference to the accompanying drawings, in which exemplary embodiments of the invention are shown. The invention, however, may be embodied in various different forms, and should not be construed as being limited only to the illustrated embodiments. Rather, these embodiments are provided as examples, to convey the concept of the invention to one skilled in the art. Accordingly, known processes, elements, and techniques are not described with respect to some of the embodiments of the present invention. Throughout the drawings and written description, like reference numerals will be used to refer to like or similar elements.
Referring to
The phase-change memory cell array 110 includes multiple phase-change memory cells C11 through Cnn arranged in an array. The sensing unit 140 detects data stored in a phase-change memory cell to be sensed, among the phase-change memory cells C11 through Cnn.
The discharge unit 130 discharges one or more sensing nodes, depicted by representative sensing nodes NRDL and NSA, positioned on a sensing path formed between the phase-change memory cell array 110 and the sensing unit 140. The discharge unit 130 discharges the nodes NRDL and NSA in periods other than a sensing period, during which the sensing unit 140 detects data stored in the phase-change memory cell to be sensed of the phase-change memory cell array 110. For example, the discharge unit 130 may discharge the nodes NRDL and NSA to a ground voltage before and after the sensing period.
The discharge unit 130 may include discharge transistors T131 and T132. A first terminal (drain or source) of the discharge transistor T131 is connected to the node NRDL, and a second terminal (source or drain) of the discharge transistor T131 is connected to the ground voltage. A first terminal (drain or source) of the discharge transistor T132 is connected to the node NSA, and a second terminal (source or drain) of the discharge transistor T132 is connected to the ground voltage. In addition, gates of the discharge transistors T131 and T132 receive a discharge control signal PDIs. The discharge control signal PDIS is disabled during the sensing period and enabled during any period other than the sensing period. Accordingly, the discharge transistors T131 and T132 are turned on during the periods other than the sensing period, thus connecting the nodes NRDL and NSA to the ground voltage to be discharged to the ground voltage. The discharge transistors T131 and T132 are turned off during the sensing period, thus disconnecting the nodes NRDL and NSA from the ground voltage to prevent discharging to the ground voltage. An example of a discharge control signal generating unit that generates control signal PDIS will be described below with reference to
The bit line selection circuit 120 may include bit line selection units T121, T122, . . . , and T12n. The bit line selection units T121, T122, . . . , and T12n are respectively connected between bit lines BL1, BL2, . . . , and BLn and the nodes NRDL and NSA. The bit line selection units T121, T122, . . . , and T12n select bit lines connected to a memory cell to be sensed. For purposes of explanation, it may be assumed that representative phase-change memory cell Cln, for example, is a memory cell to be sensed. Accordingly, the bit line selection unit T12n is turned on in response to a bit line selection control signal Yn, connecting the memory cell to be sensed Cln and the bit line BLn to the nodes NRDL and NSA and the sensing unit 140. The other bit line selection units T121, T122, etc., operate in a similar manner to the bit line selection unit T12n in response to bit line selection control signals Y1, Y2, etc., respectively.
The sensing unit 140 detects data stored in the phase-change memory cell to be sensed Cln by comparing a voltage of the bit line, BLn, connected to the phase-change memory cell to be sensed Cln, with a reference voltage VREF.
The phase-change random access memory device 100 according to the current embodiment may further include a sensing current control unit 170 and a precharge unit 160 and/or a clamping unit 150.
The sensing current control unit 170 allows a sensing current to flow through the sensing path and adjusts the amount of sensing current. The sensing current is supplied to the phase-change memory cell to be sensed Cln and is used to detect data stored in the phase-change memory cell to be sensed. The sensing current control unit 170 may include two transistors T171 and T172, for example, which are connected in series. The transistor T171 supplies a sensing current to at least the node NSA in response to a sensing current control signal nPBias. The sensing current supplied to the node NSA may be supplied to the phase-change memory cells C11 through Cnn via the sensing path. The transistor T172 determines the amount of the sensing current supplied to the node NSA in response to a sensing current amount control signal Vbias. The amount of the sensing current supplied to the node NSA may be changed according to a voltage level of the sensing current amount control signal Vbias. The sensing current control unit 170 may also supply the sensing current to the node NRDL, for example, through the clamping unit 150.
The precharge unit 160 precharges at least the node NSA positioned on the sensing path formed between the phase-change memory cells C11 through Cnn and the sensing unit 140. The precharge unit 160 may include a precharge transistor TI60. The transistor T160 precharges the node NSA in response to a precharge control signal nPreBL during at least a portion of the sensing period. For example, the precharge transistor T160 may precharge the node NSA with a VSA voltage level. The precharge unit 160 may also precharge the node NRDL, for example, through the clamping unit 150.
The clamping unit 150 is connected between the sensing unit 140 and the phase-change memory cells C11 through Cnn of the phase-change memory cell array 110. The clamping unit 150 is configured to selectively connect the sensing unit 140 to one or more phase-change memory cells C11 through Cnn of the phase-change memory cell array 110 via the bit line selection circuit 120, or to disconnect the sensing unit 140 from the phase-change memory cells C11 through Cnn via the bit line selection circuit 120. More particularly, the clamping unit 150 may include a clamping transistor T150, which is turned on or off in response to a clamping control signal Vclamp. When the clamping transistor T150 is turned on, the sensing unit 140 and selected phase-change memory cells of the phase-change memory cell array 110 may be connected to one another. When the clamping transistor T150 is turned off, the sensing unit 140 and the phase-change memory cells of the phase-change memory cell array 110 may not connected to one another.
Referring to
When the bit line selection control signal Y1 transitions to a logic high level (enabled), the sensing operation starts. The bit line selection transistor T121 corresponding to bit line BL1 is turned on. When the bit line selection control signal Y1 transitions to the logic high level, the discharge control signal PDIS transitions to a logic low level. Accordingly, the discharge transistors T131 and T132 are turned off and do not discharge the nodes NRDL and NSA. Also, when the bit line selection control signal Y1 transitions to the logic high level, the precharge control signal nPreBL transitions to a logic low level. Accordingly, the precharge transistor T160 is turned on and precharges the nodes NRDL and NSA. For example, the nodes NRDL and NSA may be precharged with the VSA voltage level.
Next, when word line control signal WL1 transitions to a logic low level, the corresponding word line WL1 is enabled, where the word line control signal and the word line have the same reference numeral. When word line WL1 is enabled, the phase-change memory cell to be sensed C11, connected to the selected bit line BL1, is selected.
In addition, when the sensing current control signal nPBias transitions to a logic low level, a sensing current is supplied to the phase-change memory cell to be sensed C11, and a sensing operation is performed, as previously described. Voltage levels of the bit line BL1 and the node NSA change depending on whether data stored in the phase-change memory cell to be sensed C11 is “1” or “0”.
Referring to
in the depicted embodiment, the discharge control signal generating unit 400 includes a first delay unit 410, a second delay unit 420, and a logic operation unit 450.
The first delay unit 410 delays column addresses Y1 through Yn (e.g., A1 through A24) for a first delay time, and the second delay unit 420 delays the column addresses Y1 through Yn (e.g., A1 through A24) for a second delay time that is shorter than the first delay time. For example, the first delay unit 410 may include two delayers 411 and 412 connected in series, and the second delay unit 420 may include one delayer 421, so that the second delay time is shorter than the first delay time. Of course, in various embodiments, the number of delayers of the first delay unit 410 and the number of delayers of the second delay unit 420 may vary, without departing from the scope of the present teachings, under the condition that the number of delayers of the first delay unit 410 is larger than the number of delayers of the second delay unit 420.
The logic operation unit 450 performs a logic operation on an output of the first delay unit 410 and an output of the second delay unit 420, and generates the discharge control signal PDIS. For example, the logic operation unit 450 may be a NAND logic gate.
A diode type phase-change memory cell C is illustrated in
Each of the diode type phase-change memory cells C includes a memory device ME and a P-N diode D. The memory device ME include a phase-change material, such as GST (germanium, antimony and tellurium (GeSbTe)), connected to a bit line BL. More particularly, the phase-change material GST is connected to a P-junction of the diode D, and a word line WL is connected to an N-junction of the diode D.
The phase-change material GST of the memory device ME becomes amorphous or crystallized, according to temperature and heating time, so that data can be stored in the diode type phase-change memory cell C. For phase-change of the phase-change material GST, high temperature (e.g., over 900° C.) is needed. The high temperature is obtained due to Joule heating using a current that flows through the diode type phase-change memory cell C.
With respect to the write operation, in order to store data “1”, the phase-change material GST is heated to over a melting temperature TMP2 at time t1, and then rapidly cooled, so that the phase-change material GST becomes amorphous. The amorphous state is defined as data “1” and is referred to as a “reset state.” In order to store data “0”, the phase-change material GST is heated to over a crystallization temperature TMP1 and is maintained for a predetermined amount of time t2, and then the phase-change material is slowly cooled. In this case, the phase-change material becomes crystallized. This state is defined as data “0” and is referred to as a “set state.”
With respect to the read operation, the memory cell is selected to be read by selecting bit line BL and word line WL, which correspond to each other. A read current is supplied to the selected memory cell C so that “1” and “0” can be differentiated by using a difference in voltage change due to the resistivity state of the phase-change material GST.
It is understood that the phase-change memory cells shown in
While the present inventive concept has been described with reference to exemplary embodiments, it will be apparent to those skilled in the art that various changes and modifications may be made without departing from the spirit and scope of the present invention. Therefore, it should be understood that the above embodiments are not limiting, but illustrative.
Number | Date | Country | Kind |
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1020080113343 | Nov 2008 | KR | national |