Claims
- 1. A phosphor panel comprising a phosphor layer and a protective layer, wherein the phosphor layer has a main surface and edges, characterized in thatsaid protective layer is divided in at least two layers, a layer A, being closest to said phosphor layer and a layer B farther away from said phosphor layer and in that said layer A is a layer of parylene wherein said parylene is selected from the group consisting of parylene C, parylene D and parylene HT.
- 2. A phosphor panel according to claim 1, wherein said layer B is an outermost layer, has a thickness, t, and looses in a Taber abrasion test (sandpaper P220, load 250 g, 500 cycles) at most 20% of the said thickness t.
- 3. A phosphor panel according to claim 1, wherein said layer A has a thickness in the range between 0.05 μm and 15 μm.
- 4. A phosphor panel according to claim 2, wherein said layer A has a thickness in the range between 0.05 μm and 15 μm.
- 5. A phosphor panel according to claim 2, wherein said layer B is a radiation cured polymeric layer.
- 6. A phosphor panel according to claim 3, wherein said layer B is a radiation cured polymeric layer.
- 7. A phosphor panel according to claim 4, wherein said layer B is a radiation cured polymeric layer.
- 8. A phosphor panel according to claim 1, wherein the panel comprises further a support with a surface larger than said main surface of said phosphor layer, so that said phosphor layer leaves a portion or said support free, and said layer A covers at least a part said portion of said support left free by said phosphor layer.
- 9. A phosphor panel according to claim 8, wherein said layer B is an outermost layer, has a thickness, t, and looses in a Taber abrasion test (sandpaper P220, load 250 g, 500 cycles) at most 20% of the said thickness t.
- 10. A phosphor panel according to claim 1, wherein said phosphor layer is a photostimulable phosphor layer.
- 11. A phosphor panel according to claim 1, wherein said phosphor layer is a binderless photostimulable phosphor layer.
- 12. A phosphor panel according to claim 11, wherein said binderless photostimulable phosphor layer contains a CsX:Eu stimulable phosphor, with X representing a halide selected from the group consisting of Br and Cl.
- 13. A phosphor panel according to claim 2, wherein said phosphor layer is a photostimulable phosphor layer.
- 14. A phosphor panel according to claim 2, wherein said panel comprises a binderless photostimulable phosphor layer.
- 15. A phosphor panel according to claim 14, wherein said binderless photostimulable phosphor layer contains a CsX:Eu stimulable phosphor, with X representing a halide selected from the group consisting of Br and Cl.
- 16. A phosphor panel according to claim 8, wherein said phosphor layer is a photostimulable phosphor layer.
- 17. A phosphor panel according to claim 8, wherein said panel comprises a binderless photostimulable phosphor layer.
- 18. A phosphor panel according to claim 17, wherein said binderless photostimulable phosphor layer contains a CsX:Eu stimulable phosphor, with X representing a halide selected from the group consisting of Br and Cl.
- 19. A method for the preparation of a binderless phosphor panel comprising the steps of:providing a support; vapor depositing a CsX:Eu phosphor, wherein X represents a halide selected from the group consisting of Br and Cl, thereby forming a binderless phosphor layer on the said support; applying a layer of parylene on the said binderless phosphor layer by chemical vapor deposition, thereby forming a layer A; applying a radiation curable solution on top of the said layer A; and applying a radiation curable solution on top of said layer A, and curing it by UV exposure, thereby forming layer B.
- 20. A method for the preparation of a binderless phosphor panel comprising the steps of:providing a support; vapor depositing a CsX:Eu phosphor, wherein X represents a halide selected from the group consisting of Br and Cl, thereby forming a binderless phosphor layer on the said support; applying a layer of parylene on the said binderless phosphor layer by chemical vapor deposition, thereby forming a layer A; applying a radiation curable solution on top of the said layer A; and curing it by electron beam exposure, thereby forming layer B.
Priority Claims (2)
Number |
Date |
Country |
Kind |
01000401 |
Aug 2001 |
EP |
|
02100298 |
Mar 2002 |
EP |
|
Parent Case Info
This application claims the benefit of provisional application No. 60/322,612 filed Sep. 17, 2001.
US Referenced Citations (3)
Foreign Referenced Citations (2)
Number |
Date |
Country |
1286362 |
Feb 2003 |
EP |
2287864 |
Sep 1995 |
GB |
Provisional Applications (1)
|
Number |
Date |
Country |
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60/322612 |
Sep 2001 |
US |