S. Wolf et al., Silicon Processing for the VLSI ERA vol. 1: Process Technology, Lattice Press, Sunset Beach, CA (1989), pp. 520-523. |
Suemasu et al., “Room temperature negative differential resistance of Metal (CoSi2)/Insulator (CaF2) resonant tunneling diode”, Electronics Letters, vol. 28, No. 15, Jul. 16, 1992, pp. 1432-1434. |
Smith et al., “The electronic properties of epitaxial calcium fluoride-silicon structures”, Materials Research Soceity Symposia Proceedings, vol. 54: Thin Films-Interfaces and Phenomena, Boston, USA, Dec. 2-6, 1985, pp. 295-305. |
Toyama, et al., “Crack-Free PZT Thin Films Micropatterned on Silicon Substrate for Integrated Circuits”, (abstract) Seiko Instruments Inc. |
Watton, et al., “Materials and Technology Research in Uncooled Ferroelectric IR Detector Arrays”, Royal Signals and Radar Establishment, U.K.., pp. 69-77. |
Kauffman, et al., “Studies of Reactions of Atomic and Diatomic Cr, Mn, Fe, Co, Ni, Cu, and Zn with Molecular Water at 15 K”, Journal of Physical Chemistry, vol. 89, No. 16, pp. 3541-3547, 1985. |
Park, et al., “Reactions and Photochemistry of Atmoic and Diatomic Nickel with Water at 15 k”, High Temperature Science, pp. 1-15, vol. 25, 1988. |
Hauge, et al., “Matrix Isolation Studies of the Reaction of Metal Atoms with Water”, High Temperature Science Inc., pp. 338-339, 1981. |
Kauffman, et al., “Infrared Matric Isolation Studies of the Interactions of Mg, Ca, Sr, and Ba atoms and Small CLusters with Water”, High Temperature Science, pp. 97-118, vol. 18, 1984. |
Douglas, et al., “Matrix Isolation Studies by Electronic Spectroscopy of Group IIIA Metal-Water Photochemistry”, J. Chem. Soc., Faraday Trans. 1, pp. 1533-1553, 79, 1983. |
Douglas, et al., “Electronic Matrix Isolation Spectroscopic Studies of the Group IIA Metal-Water Photochemistry”, High Temperature Science, pp. 201-235, vol. 17, 1984. |