This is continuation-in-part application of copending U.S. application Ser. No. 06/929,060, filed Nov. 7, 1986, now abandoned.
| Number | Name | Date | Kind |
|---|---|---|---|
| 4131363 | Shea et al. | Dec 1978 | |
| 4378953 | Winn | Apr 1983 | |
| 4476172 | Ward | Oct 1984 | |
| 4482591 | Ward | Nov 1984 | |
| 4499231 | Ward et al. | Feb 1985 | |
| 4523974 | Duly et al. | Jan 1985 | |
| 4536240 | Winn | Aug 1985 | |
| 4657805 | Fukumitsu et al. | Apr 1987 |
| Number | Date | Country |
|---|---|---|
| 0117117 | Jul 1984 | JPX |
| 0083032 | May 1985 | JPX |
| Entry |
|---|
| Ron Hershel, Pellicle Protection of Integrated Circuit (IC) Masks, SPIE, vol. 275, Semiconductor Microlithography VI, 1981, 23-28. |
| R. Iscoff, Pellicle 1985, An update, Semiconductor International, Apr. 1985. |
| I. Ward and D. Duly, Optical Microlithograph III: Technology for the Next Decade, SPIE, vol. 470, pp. 147-154 (H. L. Stover, Editor), 1984. |
| F. W. Billmeyer, Jr., Textbook of Polymer Science, pp. 468-470 (John Wiley and Sons, Inc., 2nd ed., 1971). |
| Number | Date | Country | |
|---|---|---|---|
| Parent | 929060 | Nov 1986 |