Pellicles, e.g. pellicle assemblies

Industry

CPC
G03F1/62

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/62Pellicles, e.g. pellicle assemblies

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Reticle cleaning device and method of use
- Patent number 12,210,295
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Che-Chang Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask and reticle protection with atomic layer deposition (ALD)
- Patent number 12,197,125
- Issue date Jan 14, 2025
- Nano-Master, Inc.
- Birol Kuyel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pellicle for an EUV lithography mask and a method of manufacturing...
- Patent number 12,174,526
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzu-Ang Chao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for an EUV lithography mask and a method of manufacturing...
- Patent number 12,174,527
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle
- Patent number 12,164,224
- Issue date Dec 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yu Yanase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Nanofiber filtered films and soluble substrate processing
- Patent number 12,151,215
- Issue date Nov 26, 2024
- LINTEC OF AMERICA, INC.
- Marcio D. Lima
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Pellicle frame with stress relief trenches
- Patent number 12,130,551
- Issue date Oct 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuo-Hao Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection apparatus
- Patent number 12,124,176
- Issue date Oct 22, 2024
- ASML Netherlands B.V.
- Pawel Safinowski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for an EUV lithography mask and a method of manufacturing...
- Patent number 12,117,725
- Issue date Oct 15, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask cleaning tool
- Patent number 12,085,848
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Pin Cheng Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle
- Patent number 12,085,847
- Issue date Sep 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yu Yanase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle and pellicle assembly
- Patent number 12,066,758
- Issue date Aug 20, 2024
- ASML Netherlands B.V.
- David Ferdinand Vles
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet lithography method using robust, high transmiss...
- Patent number 12,055,855
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for flat panel display photomask
- Patent number 12,013,642
- Issue date Jun 18, 2024
- Photronics, Inc.
- Bryan S. Kasprowicz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask cleaning
- Patent number 12,013,633
- Issue date Jun 18, 2024
- Applied Materials, Inc.
- Jerry Cullins
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle having vent hole
- Patent number 12,013,632
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chue San Yoo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for fabricating a semiconductor device and method for fab...
- Patent number 12,009,238
- Issue date Jun 11, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Po-Chien Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a membrane assembly
- Patent number 12,001,135
- Issue date Jun 4, 2024
- ASML Netherlands B.V.
- Paul Janssen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle intermediary body, pellicle, method for manufacturing of p...
- Patent number 12,001,136
- Issue date Jun 4, 2024
- Air Water Inc.
- Hidehiko Oku
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle and method for producing the same
- Patent number 11,988,955
- Issue date May 21, 2024
- Shin-Etsu Chemical Co., Ltd.
- Akinori Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for EUV lithography
- Patent number 11,977,326
- Issue date May 7, 2024
- ASML Netherlands B.V.
- Dennis De Graaf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal-silicide-nitridation for stress reduction
- Patent number 11,971,654
- Issue date Apr 30, 2024
- ASML Netherlands B.V.
- Pieter-Jan Van Zwol
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing a membrane assembly
- Patent number 11,971,656
- Issue date Apr 30, 2024
- ASML Netherlands B.V.
- Johan Hendrik Klootwijk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle removal tool
- Patent number 11,948,824
- Issue date Apr 2, 2024
- Photronics, Inc.
- Hilario Ar-Miguel Alvarez
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Simultaneous double-side coating of multilayer graphene pellicle by...
- Patent number 11,947,256
- Issue date Apr 2, 2024
- ASML Netherlands B.V.
- Evgenia Kurganova
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Mask protective module, pellicle having the same, and lithography a...
- Patent number 11,940,726
- Issue date Mar 26, 2024
- Industry-University Cooperation Foundation Hanyang University
- Jinho Ahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pellicle for extreme ultraviolet lithography based on yttrium carbide
- Patent number 11,927,881
- Issue date Mar 12, 2024
- Korea Electronics Technology Institute
- Hyeong Keun Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle assembly and method for advanced lithography
- Patent number 11,914,286
- Issue date Feb 27, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Amo Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for determining a condition associated with a...
- Patent number 11,906,907
- Issue date Feb 20, 2024
- ASML Netherlands B.V.
- Derk Servatius Gertruda Brouns
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle and method of using the same
- Patent number 11,868,041
- Issue date Jan 9, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chue San Yoo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR MANUFACTURING GRAPHENE THIN FILM FOR PELLICLE MATERIAL U...
- Publication number 20250028237
- Publication date Jan 23, 2025
- GrapheneLab.Co.,Ltd.
- Gyu Hyun LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING PELLICLE AND PELLICLE MANUFACTURED THEREBY
- Publication number 20250028238
- Publication date Jan 23, 2025
- GrapheneLab.Co.,Ltd.
- Seung Il MOON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLES AND MEMBRANES FOR USE IN A LITHOGRAPHIC APPARATUS
- Publication number 20250013142
- Publication date Jan 9, 2025
- ASML NETHERLANDS B.V.
- Zomer Silvester HOUWELING
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE MEMBRANE
- Publication number 20250004362
- Publication date Jan 2, 2025
- ASML NETHERLANDS B.V.
- Franciscus Theodorus AGRICOLA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE MEMBRANE FOR A LITHOGRAPHIC APPARATUS
- Publication number 20240411222
- Publication date Dec 12, 2024
- ASML NETHERLANDS B.V.
- Inci DONMEZ NOYAN
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
LITHOGRAPHIC APPARATUS AND ASSOCIATED METHODS
- Publication number 20240411233
- Publication date Dec 12, 2024
- ASML NETHERLANDS B.V.
- Gosse Charles DE VRIES
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE, EXPOSURE ORIGINAL PLATE, EXPOSURE DEVICE, AND METHOD OF M...
- Publication number 20240402590
- Publication date Dec 5, 2024
- MITSUI CHEMICALS, INC.
- Hirofumi TANAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK CLEANING TOOL
- Publication number 20240393680
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pin Cheng CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ENHANCED ULTRA-THIN, ULTRA-LOW DENSITY FILMS FOR EUV LITHOGRAPHY AN...
- Publication number 20240385508
- Publication date Nov 21, 2024
- LINTEC OF AMERICA, INC.
- Marcio D. LIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING...
- Publication number 20240377724
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yun-Yue LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FABRICATION OF NANOTUBE BUNDLES AND REACTORS FOR THE SAME
- Publication number 20240351881
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Dung-Yue SU
- C01 - INORGANIC CHEMISTRY
Information Patent Application
APPARATUS AND METHOD FOR PREPARING AND CLEANING A COMPONENT
- Publication number 20240337956
- Publication date Oct 10, 2024
- ASML NETHERLANDS B.V.
- Lucas Christiaan Johan HEIJMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE HAVING VENT HOLE
- Publication number 20240329517
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chue San YOO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METAL-SILICIDE-NITRIDATION FOR STRESS REDUCTION
- Publication number 20240302734
- Publication date Sep 12, 2024
- ASML NETHERLANDS B.V.
- Pieter-Jan VAN ZWOL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR EUV LITHOGRAPHY
- Publication number 20240302736
- Publication date Sep 12, 2024
- ASML NETHERLANDS B.V.
- Dennis DE GRAAF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUORINE-CONTAINING COMPOSITION AND PRODUCTION METHOD THEREFOR
- Publication number 20240301194
- Publication date Sep 12, 2024
- DAIKIN INDUSTRIES., LTD.
- Yuki SUZUKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
APPARATUS FOR FABRICATING A SEMICONDUCTOR DEVICE AND METHOD FOR FAB...
- Publication number 20240297057
- Publication date Sep 5, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- PO-CHIEN HUANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR FLAT PANEL DISPLAY PHOTOMASK
- Publication number 20240280908
- Publication date Aug 22, 2024
- PHOTRONICS, INC.
- Bryan S. Kasprowicz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET PELLICLES AND METHOD OF MANUFACTURING
- Publication number 20240248391
- Publication date Jul 25, 2024
- Applied Mateials, Inc.
- Thomas Joseph Knisley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE REMOVAL TOOL
- Publication number 20240242996
- Publication date Jul 18, 2024
- PHOTRONICS, INC.
- Hilario Ar-Miguel Alvarez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PELLICLE, ORIGINAL PLATE FOR LIGHT EXPOSURE, LIGHT EXPOSURE DEVICE,...
- Publication number 20240192585
- Publication date Jun 13, 2024
- MITSUI CHEMICALS, INC.
- Yousuke ONO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE MEMBRANE FOR A LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20240116760
- Publication date Apr 11, 2024
- Paul Alexander VERMEULEN
- B82 - NANO-TECHNOLOGY
Information Patent Application
APPARATUS AND METHOD FOR DETERMINING A CONDITION ASSOCIATED WITH A...
- Publication number 20240103386
- Publication date Mar 28, 2024
- ASML NETHERLANDS B.V.
- Derk Servatius Gertruda BROUNS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FILM, PELLICLE, EXPOSURE ORIGINAL PLATE, EXPOSURE DEVICE,...
- Publication number 20240103357
- Publication date Mar 28, 2024
- MITSUI CHEMICALS, INC.
- Yosuke ONO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND STRUCTURE INCLUDING A PELLICLE
- Publication number 20240103358
- Publication date Mar 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chue San YOO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING...
- Publication number 20240094629
- Publication date Mar 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tzu-Ang CHAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THE...
- Publication number 20240094626
- Publication date Mar 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Cheng HSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSPECTION METHOD FOR PELLICLE MEMBRANE OF LITHOGRAPHY SYSTEM
- Publication number 20240053676
- Publication date Feb 15, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia Hao CHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROTECTIVE MEMBRANE FOR PHOTO LITHOGRAPHY, PELLICLE INCLUDING THE S...
- Publication number 20240036460
- Publication date Feb 1, 2024
- SOULBRAIN CO., LTD
- MUN JA KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THE...
- Publication number 20240036459
- Publication date Feb 1, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wei-Hao LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Pellicles, e.g. pellicle assemblies

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Reticle cleaning device and method of use

Mask and reticle protection with atomic layer deposition (ALD)

Pellicle for an EUV lithography mask and a method of manufacturing...

Pellicle for an EUV lithography mask and a method of manufacturing...

Pellicle

Nanofiber filtered films and soluble substrate processing

Pellicle frame with stress relief trenches

Inspection apparatus

Pellicle for an EUV lithography mask and a method of manufacturing...

Photomask cleaning tool

Pellicle

Pellicle and pellicle assembly

Extreme ultraviolet lithography method using robust, high transmiss...

Pellicle for flat panel display photomask

Photomask cleaning

Pellicle having vent hole

Apparatus for fabricating a semiconductor device and method for fab...

Method of manufacturing a membrane assembly

Pellicle intermediary body, pellicle, method for manufacturing of p...

Pellicle and method for producing the same

Pellicle for EUV lithography

Metal-silicide-nitridation for stress reduction

Method for manufacturing a membrane assembly

Pellicle removal tool

Simultaneous double-side coating of multilayer graphene pellicle by...

Mask protective module, pellicle having the same, and lithography a...

Pellicle for extreme ultraviolet lithography based on yttrium carbide

Pellicle assembly and method for advanced lithography

Apparatus and method for determining a condition associated with a...

Pellicle and method of using the same

Patents Applicationslast 30 patents

METHOD FOR MANUFACTURING GRAPHENE THIN FILM FOR PELLICLE MATERIAL U...

METHOD FOR MANUFACTURING PELLICLE AND PELLICLE MANUFACTURED THEREBY

PELLICLES AND MEMBRANES FOR USE IN A LITHOGRAPHIC APPARATUS

PELLICLE MEMBRANE

PELLICLE MEMBRANE FOR A LITHOGRAPHIC APPARATUS

LITHOGRAPHIC APPARATUS AND ASSOCIATED METHODS

PELLICLE, EXPOSURE ORIGINAL PLATE, EXPOSURE DEVICE, AND METHOD OF M...

PHOTOMASK CLEANING TOOL

ENHANCED ULTRA-THIN, ULTRA-LOW DENSITY FILMS FOR EUV LITHOGRAPHY AN...

PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING...

FABRICATION OF NANOTUBE BUNDLES AND REACTORS FOR THE SAME

APPARATUS AND METHOD FOR PREPARING AND CLEANING A COMPONENT

PELLICLE HAVING VENT HOLE

METAL-SILICIDE-NITRIDATION FOR STRESS REDUCTION

PELLICLE FOR EUV LITHOGRAPHY

FLUORINE-CONTAINING COMPOSITION AND PRODUCTION METHOD THEREFOR

APPARATUS FOR FABRICATING A SEMICONDUCTOR DEVICE AND METHOD FOR FAB...

PELLICLE FOR FLAT PANEL DISPLAY PHOTOMASK

EXTREME ULTRAVIOLET PELLICLES AND METHOD OF MANUFACTURING

PELLICLE REMOVAL TOOL

PELLICLE, ORIGINAL PLATE FOR LIGHT EXPOSURE, LIGHT EXPOSURE DEVICE,...

PELLICLE MEMBRANE FOR A LITHOGRAPHIC APPARATUS AND METHOD

APPARATUS AND METHOD FOR DETERMINING A CONDITION ASSOCIATED WITH A...

PELLICLE FILM, PELLICLE, EXPOSURE ORIGINAL PLATE, EXPOSURE DEVICE,...

SYSTEM AND STRUCTURE INCLUDING A PELLICLE

PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING...

PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THE...

INSPECTION METHOD FOR PELLICLE MEMBRANE OF LITHOGRAPHY SYSTEM

PROTECTIVE MEMBRANE FOR PHOTO LITHOGRAPHY, PELLICLE INCLUDING THE S...

PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THE...