Pellicles, e.g. pellicle assemblies

Industry

CPC
G03F1/62

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/62Pellicles, e.g. pellicle assemblies

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Simultaneous carbon nanotube growth, catalyst removal, boron nitrid...
- Patent number 12,346,021
- Issue date Jul 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical assembly with coating and methods of use
- Patent number 12,346,023
- Issue date Jul 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Optical assembly with coating and methods of use
- Patent number 12,346,020
- Issue date Jul 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of fabricating pellicle structure
- Patent number 12,346,022
- Issue date Jul 1, 2025
- Samsung Electronics Co., Ltd.
- Mun Ja Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for extreme ultraviolet lithography containing molybdenum...
- Patent number 12,326,658
- Issue date Jun 10, 2025
- Korea Electronics Technology Institute
- Hyeong Keun Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for extreme ultraviolet lithography containing amorphous c...
- Patent number 12,321,092
- Issue date Jun 3, 2025
- Korea Electronics Technology Institute
- Hyeong Keun Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a pellicle for a lithographic apparatus, a...
- Patent number 12,298,663
- Issue date May 13, 2025
- ASML Netherlands B.V.
- Mária Péter
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Apparatuses comprising films with free-standing region
- Patent number 12,291,447
- Issue date May 6, 2025
- Canatu Oy
- Bjørn Mikladal
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Low-temperature direct growth method of multilayer graphene, pellic...
- Patent number 12,287,568
- Issue date Apr 29, 2025
- Korea Electronics Technology Institute
- Hyeong Keun Kim
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Pellicle film for photolithography, pellicle, photolithography mask...
- Patent number 12,287,569
- Issue date Apr 29, 2025
- Mitsui Chemicals, Inc.
- Yousuke Ono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for extreme ultraviolet lithography based on yttrium
- Patent number 12,282,250
- Issue date Apr 22, 2025
- Korea Electronics Technology Institute
- Hyeong Keun Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for flat panel display photomask
- Patent number 12,282,257
- Issue date Apr 22, 2025
- Photronics, Inc.
- Bryan S. Kasprowicz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for cleaning lithography mask
- Patent number 12,276,906
- Issue date Apr 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- I-Hsiung Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for an EUV lithography mask and a method of manufacturing...
- Patent number 12,265,323
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzu-Ang Chao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask protection device, photomask protection system, and use m...
- Patent number 12,259,648
- Issue date Mar 25, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Fei Sun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning method for photo masks and apparatus therefor
- Patent number 12,259,649
- Issue date Mar 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle removal tool
- Patent number 12,249,528
- Issue date Mar 11, 2025
- Photronics, Inc.
- Hilario Ar-Miguel Alvarez
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask assembly and method of forming the same
- Patent number 12,242,181
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuo-Hao Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle cleaning device and method of use
- Patent number 12,210,295
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Che-Chang Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask and reticle protection with atomic layer deposition (ALD)
- Patent number 12,197,125
- Issue date Jan 14, 2025
- Nano-Master, Inc.
- Birol Kuyel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pellicle for an EUV lithography mask and a method of manufacturing...
- Patent number 12,174,526
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzu-Ang Chao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for an EUV lithography mask and a method of manufacturing...
- Patent number 12,174,527
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle
- Patent number 12,164,224
- Issue date Dec 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yu Yanase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Nanofiber filtered films and soluble substrate processing
- Patent number 12,151,215
- Issue date Nov 26, 2024
- LINTEC OF AMERICA, INC.
- Marcio D. Lima
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Pellicle frame with stress relief trenches
- Patent number 12,130,551
- Issue date Oct 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuo-Hao Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection apparatus
- Patent number 12,124,176
- Issue date Oct 22, 2024
- ASML Netherlands B.V.
- Pawel Safinowski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for an EUV lithography mask and a method of manufacturing...
- Patent number 12,117,725
- Issue date Oct 15, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask cleaning tool
- Patent number 12,085,848
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Pin Cheng Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle
- Patent number 12,085,847
- Issue date Sep 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yu Yanase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle and pellicle assembly
- Patent number 12,066,758
- Issue date Aug 20, 2024
- ASML Netherlands B.V.
- David Ferdinand Vles
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PELLICLE FOR EUV APPLICATIONS
- Publication number 20250237941
- Publication date Jul 24, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Hsun Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUSES AND METHODS FOR ASSESSING DEEP ULTRAVIOLET REFLECTIVITY...
- Publication number 20250231474
- Publication date Jul 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kelvin Elphick
- G01 - MEASURING TESTING
Information Patent Application
COMPREHENSIVE INSPECTION EQUIPMENT FOR EUV EXPOSURE PROCESS
- Publication number 20250231494
- Publication date Jul 17, 2025
- IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY)
- Jinho AHN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR A LITHOGRAPHIC APPARATUS
- Publication number 20250224667
- Publication date Jul 10, 2025
- ASML NETHERLANDS B.V.
- Andrey NIKIPELOV
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CARBON-CONTAINING DIFFUSION BARRIER LAYER FOR PROTECTION OF CNT EUV...
- Publication number 20250216770
- Publication date Jul 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Cheng HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR EXTREME ULTRAVIOLET LITHOGRAPHY BASED ON METAL CARBIDE...
- Publication number 20250216771
- Publication date Jul 3, 2025
- Korea Electronics Technology Institute
- Hyeong Keun KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FILM FOR PHOTOLITHOGRAPHY, PELLICLE, PHOTOLITHOGRAPHY MASK...
- Publication number 20250216772
- Publication date Jul 3, 2025
- Mitsui Chemicals, Inc.
- Yousuke ONO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING PELLICLE FOR FORMING METAL SILICIDE CAPPIN...
- Publication number 20250199396
- Publication date Jun 19, 2025
- DNF CO., LTD.
- Sangyong JEON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PELLICLE FOR FLAT PANEL DISPLAY PHOTOMASK
- Publication number 20250199410
- Publication date Jun 19, 2025
- PHOTRONICS, INC.
- Bryan S. Kasprowicz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE REMOVAL TOOL
- Publication number 20250191952
- Publication date Jun 12, 2025
- PHOTRONICS, INC.
- Hilario Ar-Miguel Alvarez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING...
- Publication number 20250189882
- Publication date Jun 12, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tzu-Ang CHAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLEANING METHOD FOR PHOTO MASKS AND APPARATUS THEREFOR
- Publication number 20250180983
- Publication date Jun 5, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsin-Chang LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK
- Publication number 20250155795
- Publication date May 15, 2025
- SAMSUNG DISPLAY CO., LTD.
- Hyung-Gyu PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLE CLEANING DEVICE AND METHOD OF USE
- Publication number 20250110414
- Publication date Apr 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Che-Chang HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ASSEMBLY FOR A LITHOGRAPHIC APPARATUS
- Publication number 20250102902
- Publication date Mar 27, 2025
- ASML NETHERLANDS B.V.
- Tim Willem Johan VAN DE GOOR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE, EXPOSURE MASTER, EXPOSURE DEVICE, PELLICLE PRODUCTION MET...
- Publication number 20250093767
- Publication date Mar 20, 2025
- MITSUI CHEMICALS, INC.
- Yutaka YOSHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTILAYER PROTECTION COATING WITH LAYERS OF DIFFERENT FUNCTIONS ON...
- Publication number 20250085623
- Publication date Mar 13, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Pei-Cheng HSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PELLICLE FOR EUV LITHOGRAPHY MASK
- Publication number 20250076752
- Publication date Mar 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yun-Yue LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE MEMBRANE, PELLICLE ASSEMBLY INCLUDING THE SAME AND METHOD...
- Publication number 20250076750
- Publication date Mar 6, 2025
- SK HYNIX INC.
- Tae Joong HA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE STRUCTURE
- Publication number 20250076751
- Publication date Mar 6, 2025
- SK HYNIX INC.
- Tae Joong HA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE
- Publication number 20250068055
- Publication date Feb 27, 2025
- Shin-Etsu Chemical Co., Ltd.
- Yu YANASE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask and Reticle Protection with Atomic Layer Deposition (ALD)
- Publication number 20250068054
- Publication date Feb 27, 2025
- Nano-Master, Inc.
- Birol Kuyel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AN EUV PELLICLE
- Publication number 20250060662
- Publication date Feb 20, 2025
- IMEC vzw
- Marina TIMMERMANS
- C01 - INORGANIC CHEMISTRY
Information Patent Application
PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING...
- Publication number 20250060663
- Publication date Feb 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tzu-Ang CHAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING GRAPHENE THIN FILM FOR PELLICLE MATERIAL U...
- Publication number 20250028237
- Publication date Jan 23, 2025
- GrapheneLab.Co.,Ltd.
- Gyu Hyun LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING PELLICLE AND PELLICLE MANUFACTURED THEREBY
- Publication number 20250028238
- Publication date Jan 23, 2025
- GrapheneLab.Co.,Ltd.
- Seung Il MOON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLES AND MEMBRANES FOR USE IN A LITHOGRAPHIC APPARATUS
- Publication number 20250013142
- Publication date Jan 9, 2025
- ASML NETHERLANDS B.V.
- Zomer Silvester HOUWELING
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE MEMBRANE
- Publication number 20250004362
- Publication date Jan 2, 2025
- ASML NETHERLANDS B.V.
- Franciscus Theodorus AGRICOLA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE MEMBRANE FOR A LITHOGRAPHIC APPARATUS
- Publication number 20240411222
- Publication date Dec 12, 2024
- ASML NETHERLANDS B.V.
- Inci DONMEZ NOYAN
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
LITHOGRAPHIC APPARATUS AND ASSOCIATED METHODS
- Publication number 20240411233
- Publication date Dec 12, 2024
- ASML NETHERLANDS B.V.
- Gosse Charles DE VRIES
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Pellicles, e.g. pellicle assemblies

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Simultaneous carbon nanotube growth, catalyst removal, boron nitrid...

Optical assembly with coating and methods of use

Optical assembly with coating and methods of use

Method of fabricating pellicle structure

Pellicle for extreme ultraviolet lithography containing molybdenum...

Pellicle for extreme ultraviolet lithography containing amorphous c...

Method of manufacturing a pellicle for a lithographic apparatus, a...

Apparatuses comprising films with free-standing region

Low-temperature direct growth method of multilayer graphene, pellic...

Pellicle film for photolithography, pellicle, photolithography mask...

Pellicle for extreme ultraviolet lithography based on yttrium

Pellicle for flat panel display photomask

Methods for cleaning lithography mask

Pellicle for an EUV lithography mask and a method of manufacturing...

Photomask protection device, photomask protection system, and use m...

Cleaning method for photo masks and apparatus therefor

Pellicle removal tool

Photomask assembly and method of forming the same

Reticle cleaning device and method of use

Mask and reticle protection with atomic layer deposition (ALD)

Pellicle for an EUV lithography mask and a method of manufacturing...

Pellicle for an EUV lithography mask and a method of manufacturing...

Pellicle

Nanofiber filtered films and soluble substrate processing

Pellicle frame with stress relief trenches

Inspection apparatus

Pellicle for an EUV lithography mask and a method of manufacturing...

Photomask cleaning tool

Pellicle

Pellicle and pellicle assembly

Patents Applicationslast 30 patents

PELLICLE FOR EUV APPLICATIONS

APPARATUSES AND METHODS FOR ASSESSING DEEP ULTRAVIOLET REFLECTIVITY...

COMPREHENSIVE INSPECTION EQUIPMENT FOR EUV EXPOSURE PROCESS

APPARATUS AND METHOD FOR A LITHOGRAPHIC APPARATUS

CARBON-CONTAINING DIFFUSION BARRIER LAYER FOR PROTECTION OF CNT EUV...

PELLICLE FOR EXTREME ULTRAVIOLET LITHOGRAPHY BASED ON METAL CARBIDE...

PELLICLE FILM FOR PHOTOLITHOGRAPHY, PELLICLE, PHOTOLITHOGRAPHY MASK...

METHOD FOR MANUFACTURING PELLICLE FOR FORMING METAL SILICIDE CAPPIN...

PELLICLE FOR FLAT PANEL DISPLAY PHOTOMASK

PELLICLE REMOVAL TOOL

PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING...

CLEANING METHOD FOR PHOTO MASKS AND APPARATUS THEREFOR

PHOTOMASK

RETICLE CLEANING DEVICE AND METHOD OF USE

ASSEMBLY FOR A LITHOGRAPHIC APPARATUS

PELLICLE, EXPOSURE MASTER, EXPOSURE DEVICE, PELLICLE PRODUCTION MET...

MULTILAYER PROTECTION COATING WITH LAYERS OF DIFFERENT FUNCTIONS ON...

PELLICLE FOR EUV LITHOGRAPHY MASK

PELLICLE MEMBRANE, PELLICLE ASSEMBLY INCLUDING THE SAME AND METHOD...

PELLICLE STRUCTURE

PELLICLE

Mask and Reticle Protection with Atomic Layer Deposition (ALD)

AN EUV PELLICLE

PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING...

METHOD FOR MANUFACTURING GRAPHENE THIN FILM FOR PELLICLE MATERIAL U...

METHOD FOR MANUFACTURING PELLICLE AND PELLICLE MANUFACTURED THEREBY

PELLICLES AND MEMBRANES FOR USE IN A LITHOGRAPHIC APPARATUS

PELLICLE MEMBRANE

PELLICLE MEMBRANE FOR A LITHOGRAPHIC APPARATUS

LITHOGRAPHIC APPARATUS AND ASSOCIATED METHODS