Claims
- 1. A Photopolymerizable, aqueous developable, organosol photoresist and solder mask coating composition comprising
- (1) a plasticizer which is an ethylenically unsaturated photopolymerizable monomer, at an amount in the range of from about 30 to about 70% by weight of the total weight of the resin and plasticizer,
- (2) a particulate, thermoplastic resin which is soluble or dispersible in a basic aqueous solution and has a midpoint Tg greater than 110.degree. C. and an acid number greater than 110, at an amount in the range of from about 30 to about 70% by weight of the total weight of the resin and plasticizer, wherein the resin is selected from the group consisting of a copolymer of styrene and maleic acid half ester and a copolymer of N-alkylacrylamide/alkylamino(meth)acrylate/(meth)acrylic acid,
- (3) a tertiary amine stabilizer which is present at an amount in the range of from about 1 to about 10 parts by weight per hundred parts of resin, and is selected from the group consisting of triethyl amine, N-butyl diethanol amine, 4-methyl morpholine, and dimethyl aminoethanol,
- (4) a photoinitiator, and
- (5) a volatilizable diluent.
- 2. The organosol of claim 1 wherein the volatilizable diluent is either
- (a) an aliphatic hydrocarbon or
- (b) mineral spirits from the odorless boiling range.
- 3. The organosol of claim 1 wherein the tertiary amine stabilizer includes the 4-methyl morpholine.
- 4. The organosol of claim 1 wherein the plasticizer is
- (a) water sensitive,
- (b) has two or more acrylate species, or
- (c) is both water sensitive and has two or more acrylate species.
- 5. The organosol of claim 1 wherein the photoinitiator is isopropylthioxanthone with 2-methyl-1[4(methylthio)phenyl]-2-morpholinopropane.
- 6. The organosol of claim 1 wherein the resin does not contain vinyl chloride monomer and the tertiary amine stabilizer is 4-methyl morpholine, triethyl amine, or a mixture of both.
- 7. The organosol of claim 1 which is contact imagable with a plasticizer:resin ratio in the range of from about 0.65 to about 1.25.
- 8. A method for the preparation of a plastisol composition comprising the steps
- (1) combining a tertiary amine stabilizer selected from the group consisting of triethyl amine, N-butyl diethanol amine, 4-methyl morpholine, and dimethyl aminoethanol, and a plasticizer, which is an ethylenically unsaturated photopolymerizable monomer, at an amount in the range of from about 30 to about 70% by weight of the total weight of the resin and the plasticizer, to form an admixture, and then
- (2) dispersing a resin in the admixture, further providing that the resin is a particulate, thermoplastic resin having a midpoint Tg greater than 110.degree. C. and an acid number greater than 110, at an amount in the range of from about 30 to about 70% by weight of the total weight of the resin and plasticizer, wherein the resin is selected from the group consisting of a copolymer of styrene and maleic acid half ester and a copolymer of N-alkylacrylamide/alkylamino(meth)acrylate/(meth)acrylic acid.
- 9. The method of claim 8 wherein the resin has a maximum particle size of about 300 microns or less.
- 10. The method of claim 8 wherein, to prepare an organosol, a volatizable diluent is also added in step (1).
- 11. The method of claim 8 wherein the tertiary amine stabilizer is present at an amount in the range of from about 1 to about 10 parts by weight per hundred parts of resin.
- 12. The method of claim 8 wherein a photoinitiator is also combined.
CROSS-REFERENCE TO RELATED APPLICATION
This is a divisional of application Ser. No. 07/917,649, filed Jul. 23, 1992, now U.S. Pat. No. 6,060,214 which is a continuation-in-part of U.S. Ser. No. 546,814, filed Jul. 2, 1990, entitled "A Photopolymerizable, Coatable Plastisol" now abandoned.
US Referenced Citations (13)
Divisions (1)
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917649 |
Jul 1992 |
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Continuation in Parts (1)
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546814 |
Jul 1990 |
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