Claims
- 1. A photosensitive composition containing as active ingredient a polymer which has, in the molecular structure, a structural unit represented by the general formula (I): ##STR4## wherein R.sub.1 represents hydrogen, an alkyl group or carboxyl; R.sub.2 represents hydrogen, halogen or an alkyl group; R.sub.3 represents hydrogen, an alkyl group, an aryl group or an aralkyl group; Y and Z individually represent an arylene group; X represents a divalent organic group connecting the adjacent nitrogen atom and the aromatic ring carbon atom of Y; and n represents 0 or 1, the structural unit of said polymer being present in said polymer in an amount not less than 10 mole percent and said polymer having a molecular weight of from about 2,000 to about 1,000,000.
- 2. A photosensitive composition according to claim 1 wherein the aryl group and the aralkyl group in R.sub.3 are respectively phenyl and benzyl.
- 3. A photosensitive composition according to claim 1 wherein the arylene group for Y and Z is selected from a phenylene group and a naphthylene group.
- 4. A photosensitive composition according to claim 3 wherein the phenylene group is phenylene while the naphthylene group is naphthylene.
- 5. A photosensitive composition according to claim 1 wherein the alkyl group for R.sub.1 is methyl.
- 6. A photosensitive composition according to claim 1 wherein the halogen for R.sub.2 is chlorine or bromine while the alkyl for R.sub.2 and R.sub.3 is methyl or ethyl.
- 7. A photosensitive composition according to claim 1 wherein the divalent group for X is an alkylene group.
- 8. A photosensitive composition according to claim 7 wherein the alkylene group for X is methylene or ethylene.
- 9. A photosensitive composition according to claim 1 wherein the divalent group for X is selected from ##STR5##
- 10. A photosensitive composition according to claim 3 wherein the phenylene group for Y is cyano, methyl and/or methoxy substituted phenylene and Z is phenylene or naphthylene substituted with nitro and/or chlorine.
- 11. A photosensitive composition according to claim 1 wherein the composition further contains 1-azidopyrene.
- 12. A photosensitive composition according to claim 1 wherein the composition further contains cellulose methyl ether and/or cellulose ethyl ether.
- 13. A photosensitive composition according to claim 1 wherein Y is naphthalene substituted with a sulfonic acid.
Parent Case Info
This is a Rule 60 Continuation of U.S. patent application Ser. No. 818,728, filed July 25, 1977 now abandoned.
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Non-Patent Literature Citations (1)
Entry |
Abstract, Journal of National Chem. Laboratory for Industry 68(3) 90 (1973). |
Continuations (1)
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Number |
Date |
Country |
Parent |
818728 |
Jul 1977 |
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