Macromolecular azides Macromolecular additives

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CPC
G03F7/012

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/012Macromolecular azides Macromolecular additives

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Photoresist composition and method of forming photoresist pattern
- Patent number 11,971,659
- Issue date Apr 30, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun-Chih Ho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Click-chemistry compatible structures, click-chemistry functionaliz...
- Patent number 11,106,131
- Issue date Aug 31, 2021
- Lawrence Livermore National Security, LLC
- Patrick Campbell
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Grant
Click-chemistry compatible structures, click-chemistry functionaliz...
- Patent number 10,962,879
- Issue date Mar 30, 2021
- Lawrence Livermore National Security, LLC
- Patrick Campbell
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Grant
Photosensitive compositions, color filter and microlens derived the...
- Patent number 10,915,019
- Issue date Feb 9, 2021
- PROMERUS, LLC
- Pramod F Kandanarachch
- G02 - OPTICS
Information Patent Grant
Thin film transistor substrate provided with protective film and me...
- Patent number 10,916,661
- Issue date Feb 9, 2021
- Merck Patent GmbH
- Yukiharu Uraoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist composition, method of forming resist pattern, compound, and...
- Patent number 10,649,330
- Issue date May 12, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi Arai
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Curable composition for permanent resist films, and permanent resis...
- Patent number 10,179,828
- Issue date Jan 15, 2019
- DIC Corporation
- Tomoyuki Imada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method for direct photopatterning of molecules on surfaces
- Patent number 10,124,312
- Issue date Nov 13, 2018
- The Regents of the University of California
- Matthew B. B. Francis
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Photoactivatable crosslinker compositions for surface modification
- Patent number 9,809,713
- Issue date Nov 7, 2017
- INNOVATION SURFACE TECHNOLOGIES, INC.
- Timothy A. Bloomquist
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive compound, photosensitive resin, and photosensitive c...
- Patent number 9,223,210
- Issue date Dec 29, 2015
- Toyo Gosei Co., Ltd.
- Toru Shibuya
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Information recording medium and method of manufacturing the same
- Patent number 9,104,103
- Issue date Aug 11, 2015
- Kabushiki Kaisha Toshiba
- Takeo Miki
- B42 - BOOKBINDING ALBUMS FILES SPECIAL PRINTED MATTER
Information Patent Grant
Manufacture of a polymer device
- Patent number 8,530,269
- Issue date Sep 10, 2013
- Cambridge Enterprise Ltd
- Lay-Lay Chua
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Benzocyclobutene based polymer formulations and methods for process...
- Patent number 8,143,324
- Issue date Mar 27, 2012
- Dow Global Technologies LLC
- Ying Hung So
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photo-sensitive composition
- Patent number 7,695,875
- Issue date Apr 13, 2010
- Koninklijke Philips Electronics
- Fredericus Johannes Touwslager
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photosensitive resin, photosensitive composition and photo-crosslin...
- Patent number 7,605,191
- Issue date Oct 20, 2009
- Toyo Gosei Co., Ltd.
- Takeshi Ikeya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymeric structures, particularly microstructures, and methods for...
- Patent number 7,405,034
- Issue date Jul 29, 2008
- State of Oregon Acting by and Through the State Board of Higher Education on...
- Mingdi Yan
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Polymer composite
- Patent number 7,252,912
- Issue date Aug 7, 2007
- Toyo Gosei Co., Ltd.
- Kazunori Kataoka
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Grant
Pattern-forming process using photosensitive resin composition
- Patent number 7,153,631
- Issue date Dec 26, 2006
- Hitachi Chemical Co., Ltd.
- Hideo Hagiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist coatings for copper clad stainless steel printing plates
- Patent number 6,924,085
- Issue date Aug 2, 2005
- Printing Developments, Inc.
- Jeffrey George Zaloom
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive compound and photosensitive composition
- Patent number 6,908,719
- Issue date Jun 21, 2005
- Sanyo Chemical Industries, Ltd.
- Tetsuya Watanabe
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive compound, photosensitive resin, and photosensitive c...
- Patent number 6,861,456
- Issue date Mar 1, 2005
- Toyo Gosei Kogyo Co., Ltd.
- Toru Shibuya
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive composition and use thereof
- Patent number 6,727,034
- Issue date Apr 27, 2004
- Sanyo Chemical Industries, Ltd.
- Naohito Ogiso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photosensitive compound and photosensitive resin
- Patent number 6,610,791
- Issue date Aug 26, 2003
- Toyo Gosai Kogyo Co., Ltd.
- Kentaro Tada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imageable photoresist laminate
- Patent number 6,605,406
- Issue date Aug 12, 2003
- The Chromaline Corporation
- Kyle Johnson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive compositions and pattern formation method
- Patent number 6,444,391
- Issue date Sep 3, 2002
- Toyo Gosei Kogyo Co., Ltd.
- Masaharu Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photocurable and photopatternable hydrogel matrix based on azlacton...
- Patent number 6,372,407
- Issue date Apr 16, 2002
- 3M Innovative Properties Company
- Jie Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive compositions and pattern formation method
- Patent number 6,342,330
- Issue date Jan 29, 2002
- Toyo Gosei Kogyo Co., Ltd.
- Masaharu Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, method for forming pattern theref...
- Patent number 6,291,619
- Issue date Sep 18, 2001
- Hitachi Chemical Co., Ltd.
- Yasunari Maekawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Hydroxyalkylated high performance curable polymers
- Patent number 6,203,143
- Issue date Mar 20, 2001
- Xerox Corporation
- Ram S. Narang
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Pattern-forming process using photosensitive resin composition
- Patent number 6,194,126
- Issue date Feb 27, 2001
- Hitachi Chemical Co., Ltd.
- Hideo Hagiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN
- Publication number 20230028673
- Publication date Jan 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Chih HO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, RESIST MATERIAL, AND PATTERN FORMING APPARATUS
- Publication number 20220365448
- Publication date Nov 17, 2022
- OJI HOLDINGS CORPORATION
- Kazuyo MORITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLICK-CHEMISTRY COMPATIBLE STRUCTURES, CLICK-CHEMISTRY FUNCTIONALIZ...
- Publication number 20210364915
- Publication date Nov 25, 2021
- LAWRENCE LIVERMORE NATIONAL SECURITY, LLC
- Patrick Campbell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN
- Publication number 20200272051
- Publication date Aug 27, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Chih HO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING RESIST PATTERN
- Publication number 20190391497
- Publication date Dec 26, 2019
- ZEON CORPORATION
- Nobuhiro SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILM TRANSISTOR SUBSTRATE PROVIDED WITH PROTECTIVE FILM AND ME...
- Publication number 20190319131
- Publication date Oct 17, 2019
- Yukiharu URAOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOSENSITIVE COMPOSITION AND ORGANIC THIN-FILM TRANSISTOR
- Publication number 20190250509
- Publication date Aug 15, 2019
- Sumitomo Chemical Company, Limited
- Takayuki OKACHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE COMPOSITION AND ORGANIC THIN-FILM TRANSISTOR
- Publication number 20190250510
- Publication date Aug 15, 2019
- Sumitomo Chemical Company, Limited
- Takayuki Okachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Heat-Sensitive Recording Material
- Publication number 20180345710
- Publication date Dec 6, 2018
- NIPPON KAYAKU KABUSHIKI KAISHA
- Kyohei Miyanaga
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOSENSITIVE COMPOSITIONS, COLOR FILTER AND MICROLENS DERIVED THE...
- Publication number 20180284609
- Publication date Oct 4, 2018
- PROMERUS, LLC
- PRAMOD F. KANDANARACHCH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...
- Publication number 20180149973
- Publication date May 31, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi ARAI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CURABLE COMPOSITION FOR PERMANENT RESIST FILMS, AND PERMANENT RESIS...
- Publication number 20170349690
- Publication date Dec 7, 2017
- DIC CORPORATION
- Tomoyuki Imada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SURFACE PATTERNING WITH FUNCTIONAL POLYMERS
- Publication number 20120121861
- Publication date May 17, 2012
- BASF SE
- Werner Hölzl
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOACTIVATABLE CROSSLINKER COMPOSITIONS FOR SURFACE MODIFICATION
- Publication number 20110223336
- Publication date Sep 15, 2011
- Innovative Surface Technologies, Inc.
- Timothy A. Bloomquist
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Benzocyclobutene based polymer formulations and methods for process...
- Publication number 20090275673
- Publication date Nov 5, 2009
- Ying Hung So
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
INFORMATION RECORDING MEDIUM AND METHOD OF MANUFACTURING THE SAME
- Publication number 20090236546
- Publication date Sep 24, 2009
- Kabushiki Kaisha Toshiba
- Takeo Miki
- B42 - BOOKBINDING ALBUMS FILES SPECIAL PRINTED MATTER
Information Patent Application
Manufacture of a polymer device
- Publication number 20070172978
- Publication date Jul 26, 2007
- Cambridge University Technical Service Limited
- Lay-Lay Chua
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Photosensitive resin, photosensitive composition and photo-crosslin...
- Publication number 20060235103
- Publication date Oct 19, 2006
- Takeshi Ikeya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photo-sensitive composition
- Publication number 20050089791
- Publication date Apr 28, 2005
- Fredericus Johannes Touwslager
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NOVEL PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE RESIN, AND PHOTOSENSI...
- Publication number 20040266901
- Publication date Dec 30, 2004
- Toru Shibuya
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Polymeric structures, particularly microstructures, and methods for...
- Publication number 20040242023
- Publication date Dec 2, 2004
- State Board of Higher Education on Behalf of Portland State University
- Mingdi Yan
- C40 - COMBINATORIAL CHEMISTRY
Information Patent Application
Photoresist coatings for copper clad stainless steel printing plates
- Publication number 20040185376
- Publication date Sep 23, 2004
- Jeffrey George Zaloom
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Pattern-forming process using photosensitive resin composition
- Publication number 20040106066
- Publication date Jun 3, 2004
- Hideo Hagiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method for the production of anhydride modified polyvinyl acetals u...
- Publication number 20030166750
- Publication date Sep 4, 2003
- Gabor I. Koletar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Imageable photoresist laminate
- Publication number 20020115014
- Publication date Aug 22, 2002
- Kyle Johnson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive resin composition
- Publication number 20020004177
- Publication date Jan 10, 2002
- Hideo Hagiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photosensitive compound and photosensitive resin
- Publication number 20010047068
- Publication date Nov 29, 2001
- Kentaro Tada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive compositions and pattern formation method
- Publication number 20010012597
- Publication date Aug 9, 2001
- Masaharu Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive compositions and pattern formation method
- Publication number 20010003633
- Publication date Jun 14, 2001
- Masaharu Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Macromolecular azides Macromolecular additives

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Photoresist composition and method of forming photoresist pattern

Click-chemistry compatible structures, click-chemistry functionaliz...

Click-chemistry compatible structures, click-chemistry functionaliz...

Photosensitive compositions, color filter and microlens derived the...

Thin film transistor substrate provided with protective film and me...

Resist composition, method of forming resist pattern, compound, and...

Curable composition for permanent resist films, and permanent resis...

Method for direct photopatterning of molecules on surfaces

Photoactivatable crosslinker compositions for surface modification

Photosensitive compound, photosensitive resin, and photosensitive c...

Information recording medium and method of manufacturing the same

Manufacture of a polymer device

Benzocyclobutene based polymer formulations and methods for process...

Photo-sensitive composition

Photosensitive resin, photosensitive composition and photo-crosslin...

Polymeric structures, particularly microstructures, and methods for...

Polymer composite

Pattern-forming process using photosensitive resin composition

Photoresist coatings for copper clad stainless steel printing plates

Photosensitive compound and photosensitive composition

Photosensitive compound, photosensitive resin, and photosensitive c...

Photosensitive composition and use thereof

Photosensitive compound and photosensitive resin

Imageable photoresist laminate

Photosensitive compositions and pattern formation method

Photocurable and photopatternable hydrogel matrix based on azlacton...

Photosensitive compositions and pattern formation method

Photosensitive resin composition, method for forming pattern theref...

Hydroxyalkylated high performance curable polymers

Pattern-forming process using photosensitive resin composition

Patents Applicationslast 30 patents

PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN

PATTERN FORMING METHOD, RESIST MATERIAL, AND PATTERN FORMING APPARATUS

CLICK-CHEMISTRY COMPATIBLE STRUCTURES, CLICK-CHEMISTRY FUNCTIONALIZ...

PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN

METHOD OF FORMING RESIST PATTERN

THIN FILM TRANSISTOR SUBSTRATE PROVIDED WITH PROTECTIVE FILM AND ME...

PHOTOSENSITIVE COMPOSITION AND ORGANIC THIN-FILM TRANSISTOR

PHOTOSENSITIVE COMPOSITION AND ORGANIC THIN-FILM TRANSISTOR

Heat-Sensitive Recording Material

PHOTOSENSITIVE COMPOSITIONS, COLOR FILTER AND MICROLENS DERIVED THE...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...

CURABLE COMPOSITION FOR PERMANENT RESIST FILMS, AND PERMANENT RESIS...

SURFACE PATTERNING WITH FUNCTIONAL POLYMERS

PHOTOACTIVATABLE CROSSLINKER COMPOSITIONS FOR SURFACE MODIFICATION

Benzocyclobutene based polymer formulations and methods for process...

INFORMATION RECORDING MEDIUM AND METHOD OF MANUFACTURING THE SAME

Manufacture of a polymer device

Photosensitive resin, photosensitive composition and photo-crosslin...

Photo-sensitive composition

NOVEL PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE RESIN, AND PHOTOSENSI...

Polymeric structures, particularly microstructures, and methods for...

Photoresist coatings for copper clad stainless steel printing plates

Pattern-forming process using photosensitive resin composition

Method for the production of anhydride modified polyvinyl acetals u...

Imageable photoresist laminate

Photosensitive resin composition

Photosensitive compound and photosensitive resin

Photosensitive compositions and pattern formation method

Photosensitive compositions and pattern formation method