Number | Date | Country | Kind |
---|---|---|---|
2-160630 | Jun 1990 | JPX | |
3-132472 | Jun 1991 | JPX |
Number | Name | Date | Kind |
---|---|---|---|
4022617 | McGuckin | May 1977 | |
4603101 | Crivello | Jul 1986 | |
4996136 | Houlihan et al. | Feb 1991 |
Number | Date | Country |
---|---|---|
0425142 | May 1991 | EPX |
Entry |
---|
"Acid Hardening Positive Photoresist Using Photochemical Generation of Base", Journal of Photopolymer Science and Technology, by Mark R. Winkle et al, vol. 3, No. 3, pp. 419-422, 1990. |
"Aqueous Base Developable Deep UV Resist Systems Based on Novel Monomeric and Polymeric Dissolution Inhibitors", SPIE, vol. 920 Advances in Resist Technology and Processing V, by Hiroshi Ito, pp. 33-41, 1988. |