Plasma treatment apparatus

Abstract

The present invention relates to a plasma treatment apparatus, and more particularly, to a plasma treatment apparatus capable of supplying pressure gas while preventing flying of particles accumulated on the bottom of a chamber. The plasma treatment apparatus of the present invention comprises a chamber; an intake/exhaust portion provided to the bottom of the chamber to supply the chamber with pressure gas, the intake/exhaust portion being configured such that an inner diameter thereof is increased upwardly; and a pressure gas source connected to the intake/exhaust portion to supply the pressure gas thereto. The apparatus may further comprise a vacuum source connected to the intake/exhaust portion to exhaust the chamber.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a sectional view showing a conventional plasma treatment apparatus.

FIG. 2 is a view showing an operating state of the plasma treatment apparatus of FIG. 1.

FIG. 3 is a sectional view showing a plasma treatment apparatus according to the present invention.

FIGS. 4 to 6 are sectional views showing various examples of an intake/exhaust portion corresponding to an essential part of the plasma treatment apparatus of FIG. 3.

FIG. 7 shows a plasma treatment apparatus according to another embodiment of the present invention.

Claims

1. A plasma treatment apparatus, comprising: a chamber;an intake/exhaust portion provided to the bottom of the chamber to supply the chamber with pressure gas, the intake/exhaust portion being configured such that an inner diameter thereof is increased upwardly; anda pressure gas source connected to the intake/exhaust portion to supply the pressure gas thereto.

2. The plasma treatment apparatus according to claim 1, further comprising a vacuum source connected to the intake/exhaust portion to exhaust the chamber.

3. The plasma treatment apparatus according to claim 2, wherein at least one exhaust hole is formed in a side of the intake/exhaust portion to discharge particles accumulated on the bottom of the chamber.

4. The plasma treatment apparatus according to claim 3, wherein the exhaust hole is inclined with respect to the chamber bottom.

5. The plasma treatment apparatus according to claim 3, further comprising a closing member for selectively opening or closing the intake/exhaust portion or the exhaust hole.

6. The plasma treatment apparatus according to claim 5, wherein the closing member is a check valve.

7. The plasma treatment apparatus according to claim 2, further comprising a valve for selectively connecting the intake/exhaust portion with the pressure gas source or the vacuum source.

8. The plasma treatment apparatus according to claim 1, wherein the pressure gas is nitrogen (N2).

9. The plasma treatment apparatus according to claim 1, wherein the chamber is a process chamber or a load lock chamber.

10. A plasma treatment apparatus, comprising: a chamber;an intake portion provided to the bottom of the chamber to supply the chamber with pressure gas and configured such that an inner diameter thereof is increased upwardly;a pressure gas source connected to the intake portion to supply the pressure gas thereto;an exhaust portion provided to the bottom of the chamber to exhaust the chamber and configured such that an inner diameter thereof is increased upwardly; anda vacuum source connected to the exhaust portion.

11. The plasma treatment apparatus according to claim 10, wherein at least one exhaust hole is formed in a side of the exhaust portion to discharge particles accumulated on the bottom of the chamber.

12. The plasma treatment apparatus according to claim 11, wherein the exhaust hole is inclined with respect to the chamber bottom.