Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube

Industry

CPC
H01J2237/022

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/022Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Process chamber component and method of forming a surface texture
- Patent number 12,269,095
- Issue date Apr 8, 2025
- Cleanpart Group GmbH
- Olivier Marchand
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Method and apparatus for revitalizing plasma processing tools
- Patent number 12,261,026
- Issue date Mar 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chi-Hsing Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for the removal and/or avoidance of contamination...
- Patent number 12,202,019
- Issue date Jan 21, 2025
- ASML Netherlands B.V.
- Marc Smits
- B08 - CLEANING
Information Patent Grant
System and method for residual gas analysis
- Patent number 12,176,193
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yen-Liang Chen
- B08 - CLEANING
Information Patent Grant
Electron microscope and specimen contamination prevention method
- Patent number 12,131,881
- Issue date Oct 29, 2024
- Jeol Ltd.
- Takeshi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus, electrode assembly, and method of cl...
- Patent number 12,119,203
- Issue date Oct 15, 2024
- Canon Anelva Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Grant
Refillable ion chamber with automated purging system
- Patent number 12,106,929
- Issue date Oct 1, 2024
- Varian Medical Systems, Inc.
- Amir Shojaei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 12,106,930
- Issue date Oct 1, 2024
- HITACHI HIGH-TECH CORPORATION
- Takafumi Miwa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching apparatus and methods of cleaning thereof
- Patent number 12,080,582
- Issue date Sep 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Chi Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sensors and system for in-situ edge ring erosion monitor
- Patent number 12,009,236
- Issue date Jun 11, 2024
- Applied Materials, Inc.
- Yaoling Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for preventing contamination of self-plasma chamber
- Patent number 11,990,320
- Issue date May 21, 2024
- NANOTECH INC.
- Dong Ho Cha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for precleaning and treating wafer surfaces
- Patent number 11,939,666
- Issue date Mar 26, 2024
- Applied Materials, Inc.
- Xiangjin Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for metal contamination control in an ion impl...
- Patent number 11,923,169
- Issue date Mar 5, 2024
- Axcelis Technologies, Inc.
- Causon Ko-Chuan Jen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cold-field-emitter electron gun with self-cleaning extractor using...
- Patent number 11,830,699
- Issue date Nov 28, 2023
- KLA Corporation
- Luca Grella
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Germanium tetraflouride and hydrogen mixtures for an ion implantati...
- Patent number 11,827,973
- Issue date Nov 28, 2023
- Entegris, Inc.
- Oleg Byl
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion gun and vacuum processing apparatus
- Patent number 11,810,748
- Issue date Nov 7, 2023
- Canon Anelva Corporation
- Tsutomu Hiroishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for directional processing
- Patent number 11,791,126
- Issue date Oct 17, 2023
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for residual gas analysis
- Patent number 11,791,141
- Issue date Oct 17, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yen-Liang Chen
- B08 - CLEANING
Information Patent Grant
Method and system for the removal and/or avoidance of contamination...
- Patent number 11,738,376
- Issue date Aug 29, 2023
- ASML Netherlands, B.V.
- Marc Smits
- B08 - CLEANING
Information Patent Grant
System and tool for cleaning a glass surface of an accelerator column
- Patent number 11,691,184
- Issue date Jul 4, 2023
- Varian Semiconductor Equipment Associates, Inc.
- Michael J. Blanchard
- B08 - CLEANING
Information Patent Grant
Refillable ion chamber with automated purging system
- Patent number 11,651,931
- Issue date May 16, 2023
- Varian Medical Systems, Inc.
- Amir Shojaei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for examining and/or processing a sample
- Patent number 11,592,461
- Issue date Feb 28, 2023
- Carl Zeiss SMT GmbH
- Christof Baur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low profile deposition ring for enhanced life
- Patent number 11,581,166
- Issue date Feb 14, 2023
- Applied Materials, Inc.
- Kirankumar Neelasandra Savandaiah
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor processing chamber and methods for cleaning the same
- Patent number 11,532,463
- Issue date Dec 20, 2022
- Applied Materials, Inc.
- Vishwas Kumar Pandey
- B08 - CLEANING
Information Patent Grant
Ion gun and vacuum processing apparatus
- Patent number 11,521,822
- Issue date Dec 6, 2022
- Canon Anelva Corporation
- Tsutomu Hiroishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ plasma cleaning of process chamber components
- Patent number 11,495,434
- Issue date Nov 8, 2022
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- B08 - CLEANING
Information Patent Grant
Plasma density control on substrate edge
- Patent number 11,495,440
- Issue date Nov 8, 2022
- Applied Materials, Inc.
- Bhaskar Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Three-dimensional (3D) imaging system and method for nanostructure
- Patent number 11,488,801
- Issue date Nov 1, 2022
- INSTITUTE OF GEOLOGY AND GEOPHYSICS, CHINESE ACADEMY OF SCIENCES
- Zhongming Du
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transparent halo assembly for reduced particle generation
- Patent number 11,424,112
- Issue date Aug 23, 2022
- Varian Semiconductor Equipment Associates, Inc.
- Ernest E. Allen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma process apparatus with low particle contamination and method...
- Patent number 11,371,141
- Issue date Jun 28, 2022
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Tuqiang Ni
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20250140513
- Publication date May 1, 2025
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Satoshi TOMIMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND CL...
- Publication number 20250112031
- Publication date Apr 3, 2025
- TOKYO ELECTRON LIMITED
- Takashi ARAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS
- Publication number 20250079142
- Publication date Mar 6, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Liang CHEN
- B08 - CLEANING
Information Patent Application
Electronic Cleaning Device
- Publication number 20250037962
- Publication date Jan 30, 2025
- Hitachi High-Tech Corporation
- Yuto KUBONAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...
- Publication number 20250014861
- Publication date Jan 9, 2025
- Canon ANELVA Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Application
MULTI-CHAMBER PROCESSING TOOL WITH ENHANCED THROUGHPUT
- Publication number 20240395514
- Publication date Nov 28, 2024
- Prashant AGARWAL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING APPARATUS AND METHODS OF CLEANING THEREOF
- Publication number 20240355663
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Chi LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING KIT SHIELD
- Publication number 20240352574
- Publication date Oct 24, 2024
- Applied Materials, Inc.
- Sundarapandian Ramaling Vijayalaskshmi REDDY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS OF CLEANING ELECTRON SOURCES IN CHARGED-PARTICL...
- Publication number 20240347313
- Publication date Oct 17, 2024
- ASML NETHERLANDS B.V.
- Zhidong DU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSORS AND SYSTEM FOR IN-SITU EDGE RING EROSION MONITOR
- Publication number 20240321610
- Publication date Sep 26, 2024
- Applied Materials, Inc.
- Yaoling PAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CLEANING CHAMBER COMPONENTS WITH METAL ETCH RESIDUES
- Publication number 20240304428
- Publication date Sep 12, 2024
- LAM RESEARCH CORPORATION
- Wenbing YANG
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
FOCUSED ION BEAM APPARATUS AND CONTROL METHOD THEREOF
- Publication number 20240282548
- Publication date Aug 22, 2024
- Samsung Electronics Co., Ltd.
- Yeoseon Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A MULTIPOLE DEVICE, METHOD OF INFLUENCING AN ELEC...
- Publication number 20240274396
- Publication date Aug 15, 2024
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- John Breuer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED LASER AND PLASMA ETCH DICING
- Publication number 20240266220
- Publication date Aug 8, 2024
- Jonathan Bryant MELLEN
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
APPARATUS FOR PREVENTING CONTAMINATION OF SELF-PLASMA CHAMBER
- Publication number 20240258077
- Publication date Aug 1, 2024
- NANOTECH INC.
- Dong Ho Cha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONDENSATE PRECURSORS AND CONTAMINANT PURGE APPARATUS AND METHODS
- Publication number 20240222068
- Publication date Jul 4, 2024
- FEI Company
- Jing Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR PRECLEANING AND TREATING WAFER SURFACES
- Publication number 20240183028
- Publication date Jun 6, 2024
- Applied Materials, Inc.
- Xiangjin XIE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PIPING, SEMICONDUCTOR MANUFACTURING APPARATUS, AND METHOD FOR MANUF...
- Publication number 20240068094
- Publication date Feb 29, 2024
- KIOXIA Corporation
- Yuya MATSUBARA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION...
- Publication number 20240017301
- Publication date Jan 18, 2024
- ASML NETHERLANDS B.V.
- Marc SMITS
- B08 - CLEANING
Information Patent Application
SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS
- Publication number 20230386807
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Liang CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GA IMPLANT PROCESS CONTROL FOR ENHANCED PARTICLE PERFORMANCE
- Publication number 20230386786
- Publication date Nov 30, 2023
- Applied Materials, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS
- Publication number 20230386808
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Liang CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING LITHIUM NIOBATE AND METHOD FOR FORMING LITHIUM N...
- Publication number 20230307214
- Publication date Sep 28, 2023
- Korea Institute of Science and Technology
- Ho Joong JUNG
- B08 - CLEANING
Information Patent Application
REFILLABLE ION CHAMBER WITH AUTOMATED PURGING SYSTEM
- Publication number 20230260738
- Publication date Aug 17, 2023
- Varian Medical Systems, Inc.
- Amir Shojaei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE DEVICE, CHARGED PARTICLE BEAM APPARATUS, AND VACUUM APPARATUS
- Publication number 20230260740
- Publication date Aug 17, 2023
- HITACHI HIGH-TECH CORPORATION
- Motohiro TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY DEVICE, SYSTEM HAVING A GAS SUPPLY DEVICE, AND PARTICLE...
- Publication number 20230241650
- Publication date Aug 3, 2023
- CARL ZEISS MICROSCOPY GMBH
- Andreas Schmaunz
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND PARTICLE REMOVAL METHOD
- Publication number 20230245871
- Publication date Aug 3, 2023
- TOKYO ELECTRON LIMITED
- Hiroshi NAGAIKE
- B08 - CLEANING
Information Patent Application
HIGH INCIDENCE ANGLE GRAPHITE FOR PARTICLE CONTROL WITH DEDICATED L...
- Publication number 20230235449
- Publication date Jul 27, 2023
- Axcelis Technologies, Inc.
- David M. Burtner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTERMITTENT STAGNANT FLOW
- Publication number 20230230820
- Publication date Jul 20, 2023
- LAM RESEARCH CORPORATION
- Douglas L. KEIL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEVICE FOR REDUCING ICE CONTAMINATION OF A SAMPLE, FOCUSED ION BEAM...
- Publication number 20230215681
- Publication date Jul 6, 2023
- Max-Planck-Gesellschaft zur Forderung der Wissenschaften e.V.
- Sebastian TACKE
- H01 - BASIC ELECTRIC ELEMENTS

Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Process chamber component and method of forming a surface texture

Method and apparatus for revitalizing plasma processing tools

Method and system for the removal and/or avoidance of contamination...

System and method for residual gas analysis

Electron microscope and specimen contamination prevention method

Ion beam processing apparatus, electrode assembly, and method of cl...

Refillable ion chamber with automated purging system

Charged particle beam device

Etching apparatus and methods of cleaning thereof

Sensors and system for in-situ edge ring erosion monitor

Apparatus for preventing contamination of self-plasma chamber

Methods and apparatus for precleaning and treating wafer surfaces

Apparatus and method for metal contamination control in an ion impl...

Cold-field-emitter electron gun with self-cleaning extractor using...

Germanium tetraflouride and hydrogen mixtures for an ion implantati...

Ion gun and vacuum processing apparatus

Apparatus for directional processing

System and method for residual gas analysis

Method and system for the removal and/or avoidance of contamination...

System and tool for cleaning a glass surface of an accelerator column

Refillable ion chamber with automated purging system

Apparatus and method for examining and/or processing a sample

Low profile deposition ring for enhanced life

Semiconductor processing chamber and methods for cleaning the same

Ion gun and vacuum processing apparatus

In-situ plasma cleaning of process chamber components

Plasma density control on substrate edge

Three-dimensional (3D) imaging system and method for nanostructure

Transparent halo assembly for reduced particle generation

Plasma process apparatus with low particle contamination and method...

Patents Applicationslast 30 patents

CHARGED PARTICLE BEAM DEVICE

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND CL...

SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS

Electronic Cleaning Device

ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...

MULTI-CHAMBER PROCESSING TOOL WITH ENHANCED THROUGHPUT

ETCHING APPARATUS AND METHODS OF CLEANING THEREOF

PROCESSING KIT SHIELD

SYSTEMS AND METHODS OF CLEANING ELECTRON SOURCES IN CHARGED-PARTICL...

SENSORS AND SYSTEM FOR IN-SITU EDGE RING EROSION MONITOR

METHOD OF CLEANING CHAMBER COMPONENTS WITH METAL ETCH RESIDUES

FOCUSED ION BEAM APPARATUS AND CONTROL METHOD THEREOF

METHOD OF FORMING A MULTIPOLE DEVICE, METHOD OF INFLUENCING AN ELEC...

INTEGRATED LASER AND PLASMA ETCH DICING

APPARATUS FOR PREVENTING CONTAMINATION OF SELF-PLASMA CHAMBER

CONDENSATE PRECURSORS AND CONTAMINANT PURGE APPARATUS AND METHODS

METHODS AND APPARATUS FOR PRECLEANING AND TREATING WAFER SURFACES

PIPING, SEMICONDUCTOR MANUFACTURING APPARATUS, AND METHOD FOR MANUF...

METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION...

SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS

GA IMPLANT PROCESS CONTROL FOR ENHANCED PARTICLE PERFORMANCE

SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS

METHOD FOR ETCHING LITHIUM NIOBATE AND METHOD FOR FORMING LITHIUM N...

REFILLABLE ION CHAMBER WITH AUTOMATED PURGING SYSTEM

STAGE DEVICE, CHARGED PARTICLE BEAM APPARATUS, AND VACUUM APPARATUS

GAS SUPPLY DEVICE, SYSTEM HAVING A GAS SUPPLY DEVICE, AND PARTICLE...

SUBSTRATE PROCESSING SYSTEM AND PARTICLE REMOVAL METHOD

HIGH INCIDENCE ANGLE GRAPHITE FOR PARTICLE CONTROL WITH DEDICATED L...

INTERMITTENT STAGNANT FLOW

DEVICE FOR REDUCING ICE CONTAMINATION OF A SAMPLE, FOCUSED ION BEAM...