Claims
- 1. A polishing pad comprising a body of sintered thermoplastic particles, wherein the particles comprise a material that is resilient to an applied stress, such that the particles exhibit full recovery from the applied stress, and wherein the material has a melting point and wherein the material is thermally stable at a temperature up to about the melting point, and wherein the sintered thermoplastic particles are arranged in the body, such that the body has a fully interconnected void volume forming a substantially continuous bulk porosity.
- 2. The polishing pad of claim 1, wherein the body comprises sintered thermoplastic particles having an average particle size 20 to 100 microns.
- 3. The polishing pad of claim 1, wherein the particles comprise a thermoplastic having one of urethane, carbonate, amide, sulfone, vinyl chloride, acrylate, methacrylate, vinyl alcohol, ester and acrylamide moieties.
- 4. The polishing pad of claim 1, wherein the particles comprise a mixture of particles containing polyurethane and particles containing a material selected from the group consisting of polyethylene, polypropylene, nylon, polyester and combinations thereof.
- 5. The polishing pad of claim 4, wherein about 10 to about 65 weight percent of the particles comprise polyurethane.
- 6. The polishing pad of claim 1, wherein the particles comprise a mixture of polyurethane particles and polyethylene particles.
- 7. The polishing pad of claim 1, wherein the body has a porosity of about 27% to about 35%.
- 8. The polishing pad of claim 1, wherein the body has a density of about 0.8 g/cm3 to about 0.9 g/cm3.
- 9. The polishing pad of claim 1, wherein the body comprises a mixture of at least two kinds of sintered thermoplastic particles having different compositions, and wherein at least about 20% by weight of the sintered thermoplastic particles in the mixture comprise a hydrophilic material.
- 10. The polishing pad of claim 9, wherein the mixture comprises thermoplastic polymers selected from the group consisting of polyurethanes, polyamides, polycarbonates, polyacrylates, methacrylates, acrylates, polysulfones, and polyesters.
- 11. A polishing pad made by a process comprising the steps of:a) providing a mold; b) placing powdered thermoplastic polymeric particles in the mold; c) compacting said particles in the mold at a pressure in excess of 100 psi (0.70 Mpa) to form a powdered compact, and d) sintering the powdered compact at a temperature above the glass transition temperature of said thermoplastic polymeric particles but below the melting point of said thermoplastic polymeric particles, such that a polishing pad is formed having a fully interconnected void volume that is characterized by a substantially continuous bulk porosity.
Parent Case Info
This application is a continuation of application Ser. No. 09/571,920 filed May 16, 2000, now U.S. Pat. No. 6,231,434, which is a continuation of application Ser. No. 08/814,514 filed Mar. 10, 1997, now U.S. Pat. No. 6,106,754, which is a continuation-in-part of application Ser. No. 08/782,717 filed Jan. 13, 1997, now U.S. Pat. No. 6,017,265, which is a continuation-in-part of application Ser. No. 08/480,166 filed Jun. 7, 1995 now abandoned, which is a divisional of application Ser. No. 08/344,165 filed on Nov. 23, 1994 now abandoned.
US Referenced Citations (13)
Non-Patent Literature Citations (1)
Entry |
SurfaceTech Review, Rodel Products Corporation, vol. 1, Issue 1, pp. 1 and 2, Dec. 1986. |
Continuations (2)
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Date |
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Parent |
09/571920 |
May 2000 |
US |
Child |
09/815090 |
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US |
Parent |
08/814514 |
Mar 1997 |
US |
Child |
09/571920 |
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US |
Continuation in Parts (2)
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Number |
Date |
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08/782717 |
Jan 1997 |
US |
Child |
08/814514 |
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US |
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08/480166 |
Jun 1995 |
US |
Child |
08/782717 |
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US |