Claims
- 1. A polishing pad comprising:a polishing surface having a plurality of sintered thermoplastic particles, the particles comprising a thermoplastic material having a critical surface tension greater than or equal to 34 milliNewtons per meter, a modulus of 1 to 200 megaPascals and an elongation to break in the range of 25% to 1000%.
- 2. A pad in accordance with claim 1, wherein the thermoplastic material comprises urethane, carbonate, amide, sulfone, vinyl chloride, acrylate, methacrylate, vinyl alcohol, ester or acrylamide moieties.
Parent Case Info
This application is a continuation of application Ser. No. 08/814,514 filed Mar. 10, 1997, now U.S. Pat. No. 6,106,754, which is a continuation-in-part of application Ser. No. 08/782,717 filed Jan. 13, 1997, now U.S. Pat. No. 6,017,265, which is a continuation-in-part of application Ser. No. 08/480,166 filed Jun. 7, 1995 now abandoned, which is a divisional of application Ser. No. 08/344,165 filed on Nov. 23, 1994 now abandoned.
US Referenced Citations (11)
Non-Patent Literature Citations (1)
Entry |
Surface Tech Review, Rodel Products Corporation, vol. 1, Issue 1, pp. 1 and 2, Dec. 1986. |
Continuations (1)
|
Number |
Date |
Country |
Parent |
08/814514 |
Mar 1997 |
US |
Child |
09/571920 |
|
US |
Continuation in Parts (2)
|
Number |
Date |
Country |
Parent |
08/782717 |
Jan 1997 |
US |
Child |
08/814514 |
|
US |
Parent |
08/480166 |
Jun 1995 |
US |
Child |
08/782717 |
|
US |