Claims
- 1. A polymer comprising recurring units of each of the following formulae (1-2) and (2-2) and having a weight average molecular weight of 1,000 to 500,000, wherein R1, R2, R3 and R4 each are hydrogen or a straight, branched or cyclic alkyl group of 1 to 15 carbon atoms, or R1 and R2, and/or R3 and R4, taken together, form a ring, in which case each combination of R1 with R2 and of R3 with R4 is a straight, branched or cyclic alkylene group of 2 to 15 carbon atoms,R5 and R6 each are hydrogen, a straight, branched or cyclic alkyl, acyl or alkylsulfonyl group of 1 to 15 carbon atoms or a straight, branched or cyclic alkoxycarbonyl or alkoxyalkyl group of 2 to 15 carbon atoms, in which some or all of the hydrogen atoms on constituent carbon atoms are optionally substituted with halogen atoms, R7 is hydrogen, methyl or CH2CO2R9, R8 is hydrogen, methyl or CO2R9, R9 is a straight, branched or cyclic alkyl group of 1 to 15 carbon atoms, R10 is an acid labile group, R11 is selected from the class consisting of a halogen atom, a hydroxyl group, a straight, branched or cyclic alkoxy, acyloxy or alkylsulfonyloxy group of 1 to 15 carbon atoms, and a straight, branched or cyclic alkoxycarbonyloxy or alkoxyalkoxy group of 2 to 15 carbon atoms, in which some or all of the hydrogen atoms on constituent carbon atoms are optionally substituted with halogen atoms, Z is a single bond or a straight, branched or cyclic (p+2)-valent hydrocarbon group of 1 to 5 carbon atoms in which at least one methylene is optionally substituted with oxygen to form a chain-like or cyclic ether or two hydrogen atoms on a common carbon are optionally substituted with oxygen to form a ketone, k is 0 or 1, and p is 0, 1 or 2, said acid labile groups represented by R10 include at least one selected from the group consisting of groups of the following formulae (L1) to (L4), tertiary alkyl groups of 4 to 20 carbon atoms, trialkylsilyl groups in which each alkyl moiety has 1 to 6 carbon atoms, and oxoalkyl groups of 4 to 20 carbon atoms: wherein the broken line denotes the attaching bond, RL01 and RL02 are hydrogen or straight, branched or cyclic alkyl groups of 1 to 18 carbon atoms, RL03 is a monovalent hydrocarbon group of 1 to 18 carbon atoms, a pair of RL01 and RL02, RL01 and RL03, or RL02 and RL03 optionally form a ring, each of RL01, RL02 and RL03 is a straight or branched alkylene group of 1 to 18 carbon atoms when they form a ring, RL04 is a tertiary alkyl group of 4 to 20 carbon atoms, a trialkylsilyl group in which each alkyl moiety has 1 to 6 carbon atoms, an oxoalkyl group of 4 to 20 carbon atoms, or a group of formula (L1), letter y is an integer of 0 to 6, RL05 is a monovalent hydrocarbon group of 1 to 8 carbon atoms which may contain a hetero atom or a substituted or unsubstituted aryl group of 6 to 20 carbon atoms, letter m is equal to 0 or 1, n is equal to 0, 1, 2 or 3, and 2m+n is equal to 2 or 3, RL06 is a monovalent hydrocarbon group of 1 to 8 carbon atoms, which optionally contains a hetero atom, or a substituted or unsubstituted aryl group of 6 to 20 carbon atoms, and RL07 to RL16 independently represent hydrogen or monovalent hydrocarbon groups of 1 to 15 carbon atoms which optionally contain a hetero atom, a pair of RL07 and RL08, RL07 and RL09, RL08 and RL10, RL09 and RL10, RL11 and RL12, or RL13 and RL14, taken together, optionally form a ring, each of RL07 to RL14 represents a divalent C1-C15 hydrocarbon group which optionally contains a hetero atom when they form a ring, or a pair of RL07 and RL09, RL09 and RL15, or RL13 and RL15 optionally bond together directly to form a double bond.
- 2. A resist composition comprising the polymer of claim 1.
- 3. A process for forming a resist pattern comprising the steps of:applying the resist composition of claim 2 onto a substrate to form a coating, heat treating the coating and then exposing it to high-energy radiation or electron beams through a photo mask, and optionally heat treating the exposed coating and developing it with a developer.
- 4. A polymer of claim 1, wherein the polymer has a weight average molecular weight of 3,000 to 100,000.
- 5. A resist composition of claim 2, which further comprises a photoacid generator and an organic solvent.
- 6. The resist composition of claim 5, wherein the photoacid generator is an onium salt, diazomethane or glyoxime compound or any mixture thereof.
- 7. The process for forming a resist pattern of claim 3, wherein the exposure to high-energy radiation or electron beams through a photo mask is with deep UV-rays having a wavelength of 248-193 nm, an excimer laser, x-rays or an electron beam to provide fine pattern formation.
- 8. The process for forming a resist pattern of claim 3, wherein the exposure to high-energy radiation or electron beams through a photo mask is with deep LTV-rays having a wavelength of 248-193 nm or an electron beam to provide micropatterning.
- 9. The process for forming a resist pattern of claim 3, wherein the exposure to high-energy radiation or electron beams through a photo mask is with an ArF or KrF excimer laser.
Priority Claims (1)
Number |
Date |
Country |
Kind |
2000-368628 |
Dec 2000 |
JP |
|
Parent Case Info
This application is divisional of U.S. Ser. No. 09/998,200, filed Dec. 3, 2001, now U.S. Pat. No. 6,512,067.
US Referenced Citations (1)
Number |
Name |
Date |
Kind |
6372854 |
Sunaga et al. |
Apr 2002 |
B1 |
Non-Patent Literature Citations (3)
Entry |
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Lu et al., “Aqueous ring-opening metathesis polymerisation of 7-oxanorbornene derivatives with oxygen-containing functionalities,” Macromol. Chem. Phys. (1994), 195(4), 1273-88. |
Meyer et al., “New positive resists with cycloaliphatic structures in the main chain,” Eur. Polym. J. (1998), 35(1), 69-76. |