Claims
- 1. A positive photosensitive composition which, after development, exhibits high resistance to dry etching, consisting essentially of:
- a sensitizing effective amount of a sensitizer component which is solely the photosensitively active tri-ester of 1,2-naphthoquinone-1-diazide-5-sulfonic acid of formula (I): ##STR1## and 2,3,4-trihydroxybenzophenone of formula (II): ##STR2## in admixture with an effectively binding amount of a novolak resin which is the condensation product of an aliphatic aldehyde or aromatic aldehyde with a mixture of 5-70 mole % .beta.-naphthol and 30-95 mole % m-cresol.
- 2. The positive photosensitive composition according to claim 1, wherein the weight-average molecular weight of said novolak resin is in the range of 800 to 1000.
- 3. The positive photosensitive composition according to claim 1, wherein the amount of .beta.-naphthol ranges from 10-40 mole % and the amount of m-cresol ranges from 60-90 mole %.
Priority Claims (2)
Number |
Date |
Country |
Kind |
58-158301 |
Aug 1983 |
JPX |
|
59-30097 |
Feb 1984 |
JPX |
|
Parent Case Info
This is a continuation of application Ser. No. 640,842, filed Aug. 15, 1984.
US Referenced Citations (12)
Continuations (1)
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Number |
Date |
Country |
Parent |
640842 |
Aug 1984 |
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