The present invention relates to a prepreg with a metal layer, a laminating manufacturing method, and a method for manufacturing the prepreg with a metal layer.
Hitherto, a copper foil with a carrier is known. For example, JP 2019-31739 A discloses a copper foil with a carrier including a carrier layer, an intermediate layer provided on the carrier layer, a release layer provided on the intermediate layer, and an ultrathin copper layer provided on the release layer.
Such a copper foil with a carrier is placed on a prepreg and heated to make the carrier layer and the intermediate layer peelable from the release layer, and the carrier layer and the intermediate layer are removed to use only the ultrathin copper layer.
As the carrier is provided, handling of the copper foil with a carrier according to the related art is facilitated. Since the ultrathin copper layer itself has a small thickness, it is very difficult to handle and practically impossible to handle the ultrathin copper layer. Therefore, the carrier is provided to enable handling.
The present invention provides a technology for eliminating waste and improving working efficiency as compared with the copper foil with a carrier according to the related art.
A prepreg with a metal layer according to the present invention may comprise:
In the prepreg with the metal layer according to the present invention,
In the prepreg with the metal layer according to the present invention,
The metal layer may have a thickness of 5 μm or less, may have a thickness of 3 μm or less in a thinner case, and may have a thickness of 1 μm or less if a further thinner case.
A laminate may be manufactured by laminating the above prepregs with the metal layers.
A method for manufacturing a prepreg with a metal layer may comprise:
The method may further comprise
By adopting an aspect in which a carrier layer for supporting a metal layer is not provided as in the present invention, waste can be eliminated and working efficiency can be improved as compared with a copper foil with a carrier including a carrier layer.
<<Configuration>>
As illustrated in
The expression “semi-cured state” in the present embodiment means a state of having a certain shape unlike a liquid, being not completely cured, and being deformable by pressing, for example. The metal layer 20 can be embedded by using the prepreg 10 in the semi-cured state. The prepreg 10 does not have to be in the semi-cured state and may be in a cured state.
A resin material can be used as a material of the prepreg 10. For example, an epoxy resin may be used as the resin material. The resin material is not limited thereto, and an unsaturated polyester resin, a vinyl ester resin, a bismaleimide resin, a benzoxazine resin, a triazine resin, a phenol resin, a urea resin, a melamine resin, a polyimide resin, a polyolefin-based resin, an aliphatic polyamide-based resin, a semi-aromatic polyamide-based resin, an aromatic polyester-based resin, a polycarbonate-based resin, a polystyrene-based resin, or the like may be used as the resin material.
In the present embodiment, since the prepreg 10 in the semi-cured state serves to replace a carrier layer according to the related art, it is not necessary to provide the carrier layer. According to the related art, the carrier layer is provided to facilitate handling such as conveyance. In a case where there is no carrier layer, inconvenience such as wrinkling of the copper foil or breakage of the copper foil occurs during conveyance, and thus, the carrier layer is an indispensable constituent element.
Such a carrier layer is finally discarded, and it cannot thus be denied that waste occurs. On the other hand, according to the present embodiment, since such a carrier layer is not provided, and the prepreg 10 in the semi-cured state functions as the carrier layer, it is extremely excellent in that handling such as conveyance becomes possible. The prepreg 10 according to the present embodiment is not necessarily in the semi-cured state, and may be a completely cured solid.
According to the present embodiment, it is extremely advantageous also when manufacturing a multilayer plate (multilayer wiring board) 200 as illustrated in
That is, as illustrated in
As illustrated in
As illustrated in
The reason why the carrier layer is required is that a company that provides the copper foil and a company that manufactures the circuit board are different from each other, but the inventor of the present application has an environment (company) in which these operations can be performed integrally. As a result, the copper foil is provided on the prepreg 10 in the semi-cured state, and then manufacturing of the multilayer plate, circuit design, and the like can be performed in this state in the own company.
As illustrated in
As illustrated in
As the fiber, for example, a glass fiber, a liquid crystal polyester fiber, an aromatic polyamide fiber, a polyparaphenylene benzobisoxazole (PBO) fiber, a polyphenylene sulfide (PPS) fiber, a carbon fiber, and the like can be used. As a glass material of the glass fiber, T glass, S glass, D glass, E glass, NE glass, C glass, H glass, ARG glass, quartz glass, or the like can be used.
The resin layer 160 of the prepreg 100 in the semi-cured state including the fiber layers such as the first fiber layer 170 and the second fiber layer 180 may have a concavo-convex shape on a surface thereof as illustrated in
In X-ray diffraction (XRD) measurement results, it was confirmed that a peak value is high at 120° C. (see
According to the present embodiment, an aspect in which the thickness of the metal layer 20 is small can be adopted, and the thickness of the metal layer 20 may be 10 μm or less, 8 μm or less, 5 μm or less, 3 μm or less, or 1 μm or less. As the thickness of the metal layer 20 decreases, the need for the carrier layer increases. However, in the present embodiment, the necessity of using the carrier layer is eliminated by directly providing the metal layer 20 having no carrier layer on the prepreg 10 in the semi-cured state.
As an example, as illustrated in
In a case where the metal layers 20 are provided on both surfaces, as illustrated in
The configuration may be reversed. While the metal layer is conveyed by the conveyance unit 310 such as a belt conveyor, the resin is provided on the metal layer by the feeding unit 320 such as a feeding roller, whereby the prepreg with a metal layer may be manufactured (see
An oxide layer 15 obtained by oxidizing a part of the metal layer 20 may be provided on a surface of the metal layer 20 that faces the prepreg 10 (see
In the present embodiment, the following aspects can be provided.
According to the present embodiment, for example, the following effects can be obtained.
Since it is not necessary to separately procure and use an uncured prepreg (raw material) and a metal foil, the cost for cutting each material (the prepreg and the metal foil), the burden of processing an end part of the prepreg, and the burden of temperature and humidity management requiring a refrigerator, corrosion prevention management, and the like are eliminated, and the cost can be significantly suppressed. In addition, damage due to a defective product in these processes does not occur.
Furthermore, a process of handling these and a carrier material used at that time are also unnecessary. Therefore, it is also possible to eliminate the need for a layup operation of overlapping these.
In addition, it is possible to reduce circuit misalignment between an inner layer and an outer layer occurring in the method according to the related art, and leakage from both ends of the resin at the time of pressurization and heating, that is, resin sagging, and the quality stability in the process is improved.
In addition, in a case where a CCL with a thin metal foil is adopted, it is not necessary to use an expensive metal foil with a carrier, and various processes at that time can be omitted.
In addition, according to the related art, it is very difficult to manufacture a CCL using a thin copper foil having a thickness of 12 μm or less, and a CCL obtained by stacking a metal having a thickness of 10 μm or less does not exist as a product. Even if such a CCL is formed, it is necessary to employ an electroless plating method, and there is a problem that a technology for forming an anchor exhibiting a sufficient peel strength has not been established in this method. In addition, there is a palladium residue at the time of electroless plating, and there has been a possibility of causing serious defects such as migration when the CCL is circuited later. However, according to an aspect of the present embodiment, such a problem can be solved.
In the present embodiment, as an example, the following manufacturing method is provided (see
A carrier plate 130 that constitutes a planar carrier layer is prepared, and an adhesive 140 that is thermally degraded (that is, an adhesive force is weakened by application of heat) is applied (see S1 of
For example, the plating layer 110 made of a copper foil is brought into contact with a prepreg (a soft thermosetting resin sheet called a raw material) 120, and pressurized and heated (see S3 in
In the present embodiment, as another example, the following manufacturing method is provided (see
The carrier plate 130 that constitutes a carrier layer having a surface that is easily peeled off, such as a mirror surface, is prepared. The plating layer 110 is formed on the mirror surface of the carrier plate 130 by electrolytic plating or electroless plating (see S11 in
At this time, when an upper surface of the plating layer 110 is oxidized and an oxide is precipitated on the upper surface of the plating layer 110, a convexoconcave and a cavity are formed on the upper surface. In this way, the oxide layer 115 is formed (see S12 in
For example, the plating layer 110 made of a copper foil is brought into contact with the prepreg (a soft thermosetting resin sheet called a raw material) 120, and pressurized and heated (see S13 in
The CCL thus obtained is advantageous not only for a CCL of a copper foil having a thickness of more than 11 μm but also for a metal-clad laminate having a thickness of 11 μm or less. It is possible to manufacture a CCL using a thin copper foil in which defects such as migration, in particular, of palladium do not occur and a sufficient peel strength is achieved even when the copper foil has a thickness of several μm. When an aspect in which a copper foil is oxidized (an aspect in which the oxide layer 115 is provided) is used, an anchor surface is formed by a convexoconcave of an insulator such as a precipitated oxide, and a cross section of the copper foil that is not oxidized does not substantially have a concavo-convex shape. Therefore, since a conductor layer side is a smooth plane, an electrical resistance is reduced, and a high frequency characteristic is also improved. In addition, by providing such an oxide layer 115, when etching is performed, it is possible to form a circuit having a cross section whose shape is different from a trapezoidal shape and is close to a square shape or a rectangular shape unlike the related art (cutting can be cleanly performed). Therefore, it is also possible to cause a current close to a design value to flow in the formed circuit.
In addition, it is possible to form a metal-clad laminate without leaving a plating inducing material layer such as silver or palladium anywhere in the CCL, which has been required for electroless plating and has been a problem of the related art, and without using a thin metal foil which can form a CCL having a peel strength sufficient to make an oxide precipitate surface serve as the anchor, and is particularly difficult to handle.
As a result of forming the anchor by precipitation of an insulating material such as an oxide, the conductor layer side becomes a smooth plane, so that it is possible to manufacture a CCL with an increased electrical resistance on the anchor surface of the conductor layer and an improved frequency characteristic. It is a matter of course that a metal-clad laminate having a thickness of 10 μm or more may be used. The present invention is applicable to manufacturing of a metal layer having any thickness and a substrate having any thickness and any number of layers.
The prepreg with a metal layer in the above-described embodiment may be provided with an electronic component such as a semiconductor element, a capacitor, or a resistor. The electronic component may be sealed by a sealing part to provide an electronic apparatus (including a package) such as an IC package or an electronic device. Such an electronic apparatus may be incorporated into any mounting apparatus such as an automobile, an airplane, a ship, a helicopter, a personal computer, or a home appliance. The product of the present embodiment may include any object such as an electronic component, a device, an electrical product, a communication device, or a vehicle.
The description of embodiment and variation, and the disclosure of the figures described above are merely examples for describing the invention described in the claims, and the invention described in the claims is not limited by the description of the embodiments or the disclosure of the figures described above.
Number | Date | Country | Kind |
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2021-006594 | Jan 2021 | JP | national |
Filing Document | Filing Date | Country | Kind |
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PCT/JP2022/001732 | 1/19/2022 | WO |