Claims
- 1. A machine comprising:
- a printing member including
- a conductive substrate;
- a non-single-crystal first semiconductor layer formed on said conductive substrate.
- a non-single-crystal second semiconductor layer formed on said first semiconductor layer;
- a substantially intrinsic insulating or semi-insulating layer formed on said second layer with an external surface to permit the passage of charge photo-generated in said second layer so that charge on the external surface can be neutralized;
- where the band gap of the first layer is substantially larger than the band gap of the second layer; and
- where each of said first layer, said second layer and said insulating or semi-insulating layer comprise a material selected from the group consisting of silicon, silicon with nitrogen, silicon with carbon, and silicon with oxygen either in stoichiometric or non-stoichiometric amounts;
- where each of said first layer, said second layer and said insulating or semi-insulating layer includes hydrogen, fluorine or chlorine;
- where said second layer is thicker than any of said first and said insulating or semi-insulating layers;
- means for providing said charge on said external surface of the insulating or semi-insulating layer of the printing member;
- means for projecting a light image onto said external surface of said insulating or semi-insulating layer to thus form an electrostatic charge image; and
- means for developing the electrostatic charge image to form a visible image pattern on the insulating or semi-insulating layer of the printing member.
- 2. A machine comprising:
- a printing member including
- a conductive substrate;
- a non-single-crystal first semiconductor layer formed on said conductive substrate;
- a non-single-crystal first semiconductor layer formed on said first semiconductor layer;
- a substantially intrinsic insulating or semi-insulating layer formed on said second layer with an external surface to permit the passage of charge photo-generated in said second layer so that charge on the external surface can be neutralized;
- where the band gap of the second layer is substantially less than the band gap of the insulating or semi-insulating layer; and
- where each of said first layer, said second layer and said insulating or semi-insulating layer comprises a material selected from the group consisting of silicon, silicon with nitrogen, silicon with carbon, and silicon with oxygen either in stoichiometric or non-stoichiometric amounts;
- where each of said first layer, said layer and said insulating or semi-insulating layer includes hydrogen, fluorine or chlorine;
- where said second layer is thicker than any of said first and said insulating or semi-insulating layers;
- means for providing said charge on said external surface of the insulating or semi-insulating layer of the printing member;
- means for projecting a light image onto said external surface of said insulating or semi-insulating layer to thus form an electrostatic charge image; and
- means for developing the electrostatic charge image to form a visible image pattern on the insulating or semi-insulating layer of the printing member.
- 3. A machine comprising:
- a printing member including
- a conductive substrate;
- a non-single-crystal first semiconductor layer formed on said conductive substrate;
- a non-single crystal second semiconductor layer formed on said first semiconductor layer;
- a substantially intrinsic insulating or semi-insulating layer formed on said second layer with an external surface to permit the passage of charge photo-generated in said external surface can be neutralized;
- where the band gap of the first layer is substantially larger than the band gap of the second layer and the band gap of the second layer is substantially less than the band gap of the insulating or semi-insulating layer;
- where each of said first layer, said second layer and said insulating or semi-insulating layer comprises a material selected from the group consisting of silicon, silicon with nitrogen, silicon with carbon and silicon with oxygen either in stoichiometric or non-stoichiometric amounts;
- where each of said first layer, said second layer and said insulating or semi-insulating layer includes hydrogen, fluorine or chlorine;
- where said second layer is thicker than any of said first and said insulating or semi-insulating layers;
- means for providing said charge on said external surface of the insulating or semi-insulating layer of the printing member;
- means for projecting a light image onto said external surface of said insulating or semi-insulating layer to thus form an electrostatic charge image; and
- means for developing the electrostatic charge image to form a visible image pattern on the insulating or semi-insulating layer of the printing member.
- 4. An electrostatic photocopying machine as in claims 1, 2, or 3 wherein said first semiconductor layer is doped with a p-type impurity.
- 5. An electrostatic photocopying machine as in claim 4 wherein said p-type impurity is boron.
- 6. An electrostatic photocopying machine as in claims 1, 2, or 3 wherein said second semiconductor layer is comprised of a substantially intrinsic semiconductor.
- 7. A machine comprising:
- a conductive substrate;
- a boron-doped silicon-based layer formed on said conductive substrate;
- a non-single-crystal intrinsic silicon-based semiconductor layer formed on said layer, and
- an insulating layer formed on said intrinsic layer,
- wherein said intrinsic layer is thicker than any of said boron-doped layer and said insulating layer, and said insulating layer comprises a silicon compound containing carbon or nitrogen;
- means for providing charge on an external surface of the insulating layer;
- means for projecting a light image onto said external surface of said insulating layer to thus form an electrostatic charge image; and
- means for developing the electrostatic charge image to form a visible image pattern on the insulating layer.
- 8. A machine of claim 7 wherein said boron-doped silicon-based layer contains material selected from the group consisting of hydrogen, chlorine and fluorine.
- 9. A machine comprising:
- (a) a printing member including
- a conductive substrate;
- a non-single-crystal p-type or n-type first semiconductor layer formed on said conductive substrate;
- a non-single-crystal intrinsic or substantially intrinsic second semiconductor layer formed on said first semiconductor layer;
- a non-single-crystal intrinsic or substantially intrinsic insulating or semi-insulating third layer formed on said second second layer with an external surface to permit the passage of photo-generated charge so that charge on the external surface can be neutralized;
- where the band gap continuously changes at the interface between said second semiconductor layer and said third layer;
- where said first layer, said second layer, and said insulating or semi-insulating layer are selected from the group consisting of silicon, silicon with nitrogen, silicon with carbon and silicon with oxygen either in stoichiometric or non-stoichiometric amounts;
- (b) means for providing said charge on said external surface of the insulating layer or semi-insulating layer of the printing member;
- (c) means for projecting a light image onto said external surface of said insulating or semi-insulating layer to thus form an electrostatic charge image; and
- means for developing the electrostatic charge image to form a visible image pattern on the insulating layer of the printing member.
- 10. A machine as in claim 9 wherein said printing member is a drum.
- 11. A machine comprising:
- (a) a printing member including
- a conductive substrate;
- a non-single-crystal boron or phosphor doped first semiconductor layer formed on said conductive substrate;
- a non-single-crystal intrinsic or substantially intrinsic second semiconductor layer formed on said first layer;
- a non-single-crystal intrinsic or substantially intrinsic insulating or semi-insulating third layer formed on said second layer with an external surface to permit the passage of charge photo-generated in said second layer so that charge on the external surface can be neutralized;
- where said first layer, said second layer, and said third layer are selected from the group consisting of silicon, silicon with nitrogen, silicon with carbon and silicon with oxygen either in stoichiometric or non-stoichiometric amounts; and
- where the content of the nitrogen, carbon and/or oxygen continuously decreases from said third layer to said second layer;
- (b) means for providing said charge on said external surface of the insulating or semi-insulating layer of the printing member;
- (c) means for projecting a light image onto said external surface of said insulating or semi-insulating layer to thus form and electrostatic charge image, said light image being absorbed by said intrinsic or substantially intrinsic semiconductor layer and forming said photo-generated charge; and
- means for developing the electrostatic charge image to form a visible image pattern on the third layer of the printing member.
- 12. A machine as in claim 11 wherein said printing member is a drum.
Priority Claims (1)
Number |
Date |
Country |
Kind |
55-86801 |
Jun 1980 |
JPX |
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Parent Case Info
This is a divisional application of Ser. No. 07/891,049, filed Jun. 1, 1992, abandoned; which itself was a divisional of Ser. No. 07/606,187, filed Oct. 31, 1990, now U.S. Pat. No. 5,143,808, which itself was a divison of Ser. No. 07/577,006, filed Sep. 4, 1990, now U.S. Pat. No. 5,070,364, which is a division of Ser. No. 07/452,355, filed Dec. 19, 1989, now U.S. Pat. No. 4,999,270, which is a division of Ser. No. 07/116,337, filed Nov. 2, 1987, now U.S. Pat. No. 4,889,783, which, in turn, is a divisional of Ser. No. 06/814,083, filed Dec. 24, 1985, now abandoned, which in turn is a continuation of Ser. No. 06/502,583, filed Jul. 21, 1983 (now abandoned), which in turn is a divisional of Ser. No. 07/276,503 filed Jun. 23, 1981 (now U.S. Pat. No. 4,418,132).
US Referenced Citations (28)
Foreign Referenced Citations (12)
Number |
Date |
Country |
33777 |
Aug 1972 |
JPX |
48-5058 |
Feb 1973 |
JPX |
54-145537 |
Nov 1979 |
JPX |
54-145539 |
Nov 1979 |
JPX |
55-29154 |
Mar 1980 |
JPX |
55-69149 |
May 1980 |
JPX |
55-127561 |
Oct 1980 |
JPX |
56-25743 |
Mar 1981 |
JPX |
56-64347 |
Jun 1981 |
JPX |
56-115573 |
Sep 1981 |
JPX |
57-4053 |
Jan 1982 |
JPX |
1137803 |
Dec 1968 |
GBX |
Non-Patent Literature Citations (7)
Entry |
Japan Society of Applied Physics, Spring Meeting, Apr. 1980. |
Japan Society of Applied Physics, Fall Meeting (Sep. 1979). |
Thompson et al., "Sputtered Amorphous Silicon Solar Cells", Proc. Int'l Photovoltaic Solar Energy Conf., Sep. 1977. |
Moustakas, 23 Solid State Comm., pp. 155-158 (1977). |
Sze, S. M., Physics of Semiconductor Devices, pp. 141-146, Wiley-Interscience. |
RCA Experimenter's Manual, pp. 3 and 4, 1967, RCA Corp. |
Electrophotographic Photosensitive Member Using a GD-Si:H Thin Film (II) Tokyo Institute of Technology Image Information Engineering Laboratory Isamu Shimizu, Shigeru Shirai, Eiichi Inoue, pp. 1-2 w/Japanese copy of p. 404 (1) Eighth Amorphous Semiconductor International Conference, 1979 Aug. |
Divisions (7)
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Number |
Date |
Country |
Parent |
891049 |
Jun 1992 |
|
Parent |
606187 |
Oct 1990 |
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Parent |
577006 |
Sep 1990 |
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Parent |
452355 |
Dec 1989 |
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Parent |
116337 |
Nov 1987 |
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Parent |
814083 |
Dec 1985 |
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Parent |
276503 |
Jun 1981 |
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Continuations (1)
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Number |
Date |
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Parent |
502583 |
Jul 1983 |
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