Number | Name | Date | Kind |
---|---|---|---|
5663893 | Wampler et al. | Sep 1997 | A |
5682323 | Pasch et al. | Oct 1997 | A |
5705301 | Garza et al. | Jan 1998 | A |
5707765 | Chen | Jan 1998 | A |
5821014 | Chen et al. | Oct 1998 | A |
6139994 | Broeke et al. | Oct 2000 | A |
6175953 | Scepanovic et al. | Jan 2001 | B1 |
6210841 | Lin et al. | Apr 2001 | B1 |
6413683 | Liebmann et al. | Jul 2002 | B1 |
6453457 | Pierrat et al. | Sep 2002 | B1 |
Entry |
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Schellenberg, Frank M., “Sub-Wavelength Lithography Using OPC,” Semiconductor Fabtech, 9th Edition, Mar. 1999, pp. 205-209. |
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Liebmann, Lars W., et al., “Optimizing Style Options for Sub-Resolution Assist Features,” distributed at an oral presentation at SPIE Microlithography Conference around Feb., 2001. |