Patent Application
20080296262
The invention relates to a method for cleaning and etching a substrate that has a transparent and conductive oxide layer (TCO), particularly a zinc-oxide layer such as that used when producing solar modules. Furthermore, the invention relates to an device for executing the described method.
The production of silicon thin-film solar modules on the basis of amorphous or microcrystalline silicon and/or alloys thereof makes, among other things, a structuring of the front TCO (“transparency conductive oxide”) contact necessary. Normally, this structuring takes place exclusively with the help of laser ablation, which leaves layer residue on the surface. This must be removed prior to further coating of the entire substrate surface, which ranges around 1 m2 for industrial module production. Consequently, a cleaning step is necessary in any case. The complete separation of the TCO layer is critical for the function of the components and absolutely essential for a high yield.
In industrial module production with substrate sizes of about 1 m2, cleaning is normally a necessary and independent process step that takes place after the laser structuring of the TCO and before the application of further layers. One of the technical constructions used for this purpose is for example a brush-washing device. When using zinc oxide (ZnO) produced by magnetron sputtering as the TCO material, additionally a roughening of the surface layer must take place to ensure sufficient scattering of the incident sunlight. This roughening takes place most simply by means of wet chemical etching in a diluted acid or lye. Textured zinc oxide as the front TCO material is not yet used in the production of silicon thin-film solar modules. Therefore, no industrial solution using wet chemical etching currently exists.
For the production of small-surface solar cells and solar modules on a laboratory scale with typical substrate sizes of 10×10 cm2, wet chemical textured ZnO produced by magnetron sputtering is used as the front TCO material in the Photovoltaic Institute at Forschungszentrum Jülich GmbH. During the production of solar modules on a substrate surface of up to 10×10 cm2, cleaning is carried out after laser structuring in combination with wet chemical texturing as one process step. The substrates coated with ZnO are thereby manually immersed for about 10 seconds in a diluted (approx. 0.5%) hydrochloric acid solution at room temperature. The exact temperature is not controlled at all, the etching time is only controlled manually. The drying process takes place by manually blowing off the substrate with clean and dry nitrogen.
This described manual etching process particularly has following disadvantages:
The object of the invention is to provide a method for cleaning ZnO layers and for permitting the implementation of line separation, after structuring of the layer in conjunction with wet-chemical roughening of the layer, with the least technical and time-related effort in a reproducible homogeneous manner on larger surfaces of usually 1 m2 or greater. The object of the invention is also to provide a particularly advantageous method with which a drying process of the etched disks can immediately follow the described etching and cleaning.
The objects of the invention are achieved with a method according to the main claim and with a device for performing the described method according to the dependent claims. Advantageous embodiments of the method and of the device are explained in the claims to which they refer.
The invention provides an advantageous combination of the cleaning and etching of laser-structured ZnO layers on various rigid or flexible support materials, as for example glass or plastic film, used for extensive substrates in a single process step. In an advantageous modification/extension of the invention, an additional drying process of the substrate is added in such a way that the entire surface of the substrate being coated in the subsequent process steps does not come into contact with any material, such as transport rollers, during the following drying process.
The invention relates to a method that advantageously permits the cleaning and the required etching in a single process step in that a cleaning/etching device in the form of a conveyor-type spray-etching machine is used. The substrate size is therefore not subject to any basic restrictions. The ZnO on a support can be roughened, rinsed and thus also cleaned and advantageously immediately homogeneously dried on the entire substrate surface and with an exact adjustable etching time.
The device according to invention suitable for performing the method is a conveyor-type etching machine, in which a large ZnO-coated substrate is conveyed from an entrance area through etching, rinsing and drying chambers to an exit area. The etching and/or rinsing solutions are applied particularly by spray nozzles. Advantageously, the conveyance can take place by means of a system of transport rollers resistant to acids and lyes.
The process cycle according to invention is systematically described in the following.
An advantageous extension/modification of the invention entails a further process step 5, in which the substrate is dried. The objective is a homogeneous, residue-free removal of all residue of the rinsing medium should an immediate coating step directly follow this process.
The temperature of the etching agent can be adjusted and controlled in an advantageous embodiment of the invention. To obtain reproducible etching results, prior to etching the conductivity of the etching medium can additionally be determined and in case of a deviation from the target value it can be readjusted. The etching medium type can be freely selected by a person skilled in the art in the context of the stability of the employed materials and can be adapted to the process requirements. The entire machine is designed to be acid- and lye-resistant and should comprise at least one exhaust opening for the extraction of gases. In an advantageous embodiment of the device, the conveying speed of the substrate is continuously variable and thus serves for exact control of the etching time. The layer characteristics are determined immediately before and immediately after the process. Via a loop, the results of the layer characterization automatically impact the etching conditions, particularly the substrate speed (meaning the etching time), so that a consistent etching result is guaranteed.
The optional drying process of the substrate can also be performed in a conveyor-type machine by using, for example, air curtains positioned very closely above and below the substrate. An air flow angle that has been accordingly adjusted and air pressure above and underneath the substrates ensure that the entire surface to be coated does not come into contact during the drying process with any materials such as the transport rollers, but ensures uninterrupted conveyance.
The object of the invention will be explained in more detail with reference to the figures, however without limiting the invention to them.
An existing etching device from the field of printed-circuit board production was used as an embodiment and was modified for the purpose according to invention (etching of wide substrate surfaces coated with ZnO). In the demonstration machine available at Forschungszentrum Jülich GmbH, substrates with surfaces measuring up to 40×40 cm2 can be used. The modifications of the described embodiment are as follows:
The current demonstration machine is quite flexible and can receive substrate sizes from 10×10 cm2 up to 40×40 cm2. An adaptation to further sizes is possible without difficulty. When using fixed substrate sizes, it is conceivable that the narrow transport rollers are only provided on the edges of the chambers and thus only come into contact with the substrate at the border of the ZnO/glass substrate. This would be of advantage, since consequently the glass does not come into contact with a conveyance system, including with the bottom side, and thus ideally is not subject to any potential contamination and/or other effects.
For the use of flexible substrates, a so-called roll-to-roll process is conceivable, in which a ZnO coated flexible film (metal, synthetic) is used instead of glass substrates, which film is unwound from a reel at the entrance side of the device and rewound at the exit. A dry film would be advantageous here.
The horizontal position of the substrate in the machine is not imperative. A vertical arrangement could even be advantageous, since dripping etching agent, for example, would not land directly on the ZnO/glass substrate. On the other hand, the vertical position has the disadvantage that the etching and rinsing agents run down on the substrate simply due to the force of gravity and therefore possibly impair the homogeneity of the etching process. The etching agent is usually distributed evenly and is also evenly rinsed off in a horizontal position.
The described spraying of the solutions on the substrate is not imperative. Spray nozzles, however, are usually very efficient, simple and economical. The following alternatives are also conceivable and suitable in the context of the invention.
A: The substrate runs through a wide etching and rinsing bath that contains the etching and/or rinsing agents. Disadvantages that should be mentioned here are that the process is difficult to control in terms of the etching time. Shorter etching times within a range of less than 20-40 s are typically more difficult to adjust. Furthermore, such a mount is mechanically more complicated, since the substrate must overcome vertical height differences when driven into or out of the basin.
B: An acid film is allowed to run from above onto the entire width of the substrate. More difficult technical implementation, control and reproducibility are to be expected here.
| Number | Date | Country | Kind |
|---|---|---|---|
| 10 2004 017 680.9 | Apr 2004 | DE | national |
| Filing Document | Filing Date | Country | Kind | 371c Date |
|---|---|---|---|---|
| PCT/DE2005/000563 | 3/31/2005 | WO | 00 | 8/21/2008 |
