Claims
- 1. A process for generation of acid, which process comprises:
- exposing a superacid precursor to actinic radiation effective to generate superacid from the superacid precursor; and
- heating the superacid while the superacid is admixed with an oxalic acid diester capable of undergoing thermal decomposition to produce oxalic acid or an oxalic acid monoester having one carboxyl group, the thermal decomposition of the oxalic acid derivative being catalyzed by the superacid, the heating being continued for a temperature and time sufficient to cause the superacid to produce, from the oxalic acid diester, oxalic acid or said oxalic acid monoester.
- 2. A process for generation of acid, which process comprises:
- exposing a superacid precursor to actinic radiation effective to generate superacid from the superacid precursor; and
- heating the superacid while the superacid is admixed with an oxalic acid diester capable of undergoing thermal decomposition to produce oxalic acid or an oxalic acid monoester having one carboxyl group, the oxalic acid diester being selected from the group consisting of:
- (a) primary and secondary esters of oxalic acid in which the .alpha.-carbon atom bears a non-basic cation-stabilizing group;
- (b) tertiary esters of oxalic acid in which the .alpha.-carbon atom does not have an sp.sup.2 or sp hybridized carbon atom directly bonded thereto;
- (c) tertiary esters of oxalic acid in which the .alpha.-carbon atom does have an sp.sup.2 or sp hybridized carbon atom directly bonded thereto, provided that this sp.sup.2 or sp hybridized carbon atom, or at least one of these sp.sup.2 or sp hybridized carbon atoms, if more than one such atom is bonded directly to the .alpha.-carbon atom, is conjugated with an electron-withdrawing group;
- (d) an ester formed by condensation of two moles of an alcohol with the bis(hemioxalate) of a diol, provided that the ester contains at least one ester grouping of type (a), (b) or (c);
- (e) polymeric oxalates derived from polymerization of oxalate esters having an ethylenically unsaturated group, provided that the ester contains at least one ester grouping of type (a), (b) or (c); and
- (f) condensation polymers of oxalates, provided that the ester contains at least one ester grouping of type (a), (b) or (c) above,
- the thermal decomposition of the oxalic acid derivative being catalyzed by the superacid, the heating being continued for a temperature and time sufficient to cause the superacid to produce, from the oxalic acid diester, oxalic acid or said oxalic acid monoester.
- 3. A process according to claim 2 wherein the oxalic acid diester is one which begins to decompose thermally at a temperature in the range of about 140.degree. to about 180.degree. C., as measured by differential scanning calorimetry in a nitrogen atmosphere at a 10.degree. C./minute temperature ramp, in the absence of any catalyst.
- 4. A process according to claim 2 wherein the superacid precursor comprises an iodonium compound.
- 5. A process according to claim 4 wherein the superacid precursor comprises a diphenyliodonium compound.
- 6. A process according to claim 2 wherein the actinic radiation is ultra-violet radiation.
- 7. A process according to claim 2 wherein both the imagewise exposure and the heating are carried out in an essentially anhydrous medium.
- 8. A process according to claim 2 wherein the superacid precursor and the oxalic acid diester are dispersed in a polymeric binder.
REFERENCE TO PARENT APPLICATION
This application is a continuation-in-part of application Ser. No. 07/965,162, filed Oct. 23, 1992, (now U.S. Pat. No. 5,334,489).
Attention is directed to copending application Ser. No. 07/965,172 (now U.S. Pat. No. 5,278,031), and its divisional application Ser. No. 08/106,353, filed Aug. 13, 1993; these two applications describe and claim a process and imaging medium generally similar to those of the present invention, but in which the breakdown of a squaric acid derivative is initiated thermally.
Attention is also directed to copending application Ser. No. 07/965,161 (now U.S. Pat. No. 5,286,612) and its continuation-in-part, application Ser. No. 08/141,852 of even date herewith and assigned to the same assignee as the present application; these two applications describe and claim a process and imaging medium generally similar to those of the present invention but in which acid is generated using a mixture of an infra-red dye, a superacid precursor and an acid-sensitive acid generator. This mixture is exposed to an imagewise exposure to infra-red radiation, followed by a blanket exposure to ultra-violet radiation.
Finally, attention is directed to copending application Ser. No. 08/084,759, filed Sep. 17, 1993 and assigned to the same assignee as the present application; this application describes and claims a process and imaging medium using a mixture of a diaryl iodonium salt and a squarylium dye capable of absorbing infra-red radiation having a wavelength within the range of about 700 to about 1200 nm, the dye having a squarylium ring the 1- and 3-positions of which are each connected, via a single sp.sup.2 carbon atom, to a pyrylium, thiopyrylium, benzpyrylium or benzthiopyrylium moiety, at least one of the sp.sup.2 carbon atoms having a hydrogen atom attached thereto, and the 2-position of the squarylium ring bearing an O.sup.-, amino or substituted amino, or sulfonamido group. The mixture is irradiated with infra-red radiation having a wavelength within the range of about 700 to about 1200 nm, thereby causing absorption of the radiation by the squarylium dye and formation of acid in the mixture.
US Referenced Citations (13)
Foreign Referenced Citations (3)
Number |
Date |
Country |
824630 |
Oct 1969 |
CAX |
187449 |
Jul 1986 |
EPX |
423446 |
Apr 1991 |
EPX |
Non-Patent Literature Citations (8)
Entry |
Berry et al., Chemically Amplified Resists for I-line and G-line Applications, SPIE 1262, 575 (1990). |
Bou et al., Tetrahedron Letters, 23(3), 361 (1982). |
Cohen S. and Cohen, S. G., J. Am. Chem. Soc., 88, 1533 (1966). |
Dehmlow et al., Chem. Ber. 113(1), 1-8 (1979). |
Dehmlow et al., Chem. Ber. 121(3), 569-71 (1988). |
Islam, N. et al., Tetrahedron 43, 959-970 (1987). |
Pericas et al., Tetrahedron Letters, (1977), 4437-38. |
Reichmanis et al., Chemical Amplification Mechanism for Microlithography, Chem. Mater., 3(3), 394 (1991). |
Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
965162 |
Oct 1992 |
|