Number | Name | Date | Kind |
---|---|---|---|
4498953 | Cook et al. | Feb 1985 | |
4741800 | Yamazaki | May 1988 | |
4871416 | Fukuda | Oct 1989 | |
5022961 | Izumi et al. | Jun 1991 | |
5028560 | Tsukamoto et al. | Jul 1991 | |
5068040 | Jackson | Nov 1991 | |
5094701 | Norman et al. | Mar 1992 | |
5145508 | Fujiura et al. | Sep 1992 | |
5178682 | Tsukamoto | Jan 1993 | |
5178721 | Sugino | Jan 1993 | |
5213621 | Ivankovits et al. | May 1993 | |
5213622 | Bubling et al. | May 1993 | |
5221366 | Roberts et al. | Jun 1993 | |
5221423 | Sugino et al. | Jun 1993 | |
5228206 | Grant | Jul 1993 | |
5234540 | Grant et al. | Aug 1993 | |
5332444 | George et al. | Jul 1994 | |
5368687 | Sandhu et al. | Nov 1994 |
Number | Date | Country |
---|---|---|
7-154004 | Jun 1995 | JPX |
Entry |
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Handbook of Semiconductor Wafer Cleaning Technology, editor W. Kern, Noyes Publications pp. 210-213, 219-224 and 233-273, 1993. |
Lynn R. Allen, et al, "Vacuum ultraviolet substrate cleaning and etching", The Solid State Technology, pp. 77-80, May 1995. |
Jerzy Ruzyllo, "Issues in Dry Cleaning of silicon Wafers", Solid State Technology, pp. S1-S4, Mar. 1990. |