In a conventional method for reducing roughness of copper foil surface, ceramic particles or powders are used for polishing the copper foil surface. However, the ceramic particle has an acute edge which may easily scratch or break the copper foil to cause short circuit of a circuit board, thereby affecting the production yield and quality of the copper foil.
The present inventor has found this drawback and invented the present process for gently brushing, polishing, and grinding the copper foil surface for efficiently reducing the surface roughness of copper foil.
The object of the present invention is to provide a process for polishing and grinding a copper foil surface by implementing a main roller made of soft, porous, fibrous and compressible materials, and placing a plurality of metallic-glass particles injected, impinged or applied to the peripheral surface of the main roller, whereby upon rotation of the main roller to contact and brush the copper foil surface, each metallic-glass particle as cushioned by the main roller may simultaneously polish and grind the copper foil surface for efficiently reducing roughness of copper foil.
As shown in
It is very essential for the role of each metallic-glass (MG) particle 3 in the present invention as hereinafter described:
1. Each MG particle 3, having high roundness approaching a perfect circle, will be rotatably received in a cavity 21 formed in the main roller 2. So, each MG particle 3 may be rotatable to well polish and grind the copper foil surface, without scratching or breaking the copper foil surface. Also, the metallic-glass particle has a high hardness and strength, better for the polishing and grinding.
2. Each metallic-glass particle 3 may be inferentially considered as a “daughter roller” in cooperation with the main roller 2, which may be considered as a “mother roller”. Both “mother roller” and “daughter rollers” simultaneously brush, polish and grind the copper foil surface to thereby efficiently reduce the roughness of the copper foil surface.
3. The main roller 2, as made of soft, porous, fibrous and compressible materials may allow each metallic-glass particle 3 to be injected, impinged, sprayed or applied into the peripheral surface of the main roller to be forcibly received in a cavity 21 temporarily formed in situ in the main roller 2. The main roller 2 has a plurality of pores, which are provided for “catching” or receiving the metallic-glass particles 3 as injected.
The main roller 2 may be made of: cotton roller, nylon roller, wool roller, sponge roller, foam roller and porous roller made of elastomeric materials.
In
An unwound roller (not shown) may be provided for releasing the copper foil 1 to be polished. A wind-up roller (not shown) may be provided for winding up the polished copper foil 1. This is the Roll-to-Roll process.
The copper foil 1 is pulled forwardly in direction F, while each roller 2 is driven in a direction R as shown in
The rollers 2 may also be arranged on an upper side or a single side of the copper foil 1.
When the main roller 2 is driven and rotated in direction R as shown in
Thanks to the round or circle metallic-glass particle 3. The particle 3 will be rotatably received in and cushioned by the main roller 2, like a universal roller, will thoroughly homogeneously grind and polish the copper foil surface.
The metallic-glass particle 3 is rotatable, not deadly fixed, in main roller 2, allowing its free rotation, and thereby enhancing a smooth grinding and polishing motion on the copper foil surface, without injuring, scratching or breaking the copper foil. Also, each metallic-glass particle 3 is cushioned by the soft, compressible main roller 2. The main roller 2 serves as a shock-absorbing medium to absorb any unexpected impacting force during the grinding and polishing for further preventing injury to the copper foil surface.
An applicator or feeder (not shown) may be provided to inject, impinge or form the metallic-glass particles 3 onto the main roller 2.
A collector or a vacuum sucker (not shown) may be provided to collect or suck the metallic-glass particles 3 from the production line for re-use of the metallic-glass particles.
As shown in
The particle size of MG particle may range from 5 microns to 50 microns, but not limited.
The present invention is superior to the conventional methods, with the following advantages:
1. The process is dry polishing and grinding, without using polishing liquid, to thereby prevent oxidation or corrosion on the copper foil surface.
2. The main roller 2 and the metallic-glass particles 3 are actuated for brushing, polishing ad grinding the copper foil surface simultaneously, thereby efficiently reducing the roughness of the copper foil.
3. Round or circle-like metallic-glass particle 3 with shiny smooth surface is rotatably carried on the main roller 2 to make the polishing and grinding more gentle without scratching or breaking the copper foil, without being influenced by the intrinsic high hardness and high strength of the metallic-glass particle.
Number | Date | Country | Kind |
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112110816 | Mar 2023 | TW | national |