Claims
- 1. A process for producing a pattern with a negative-type photosensitive composition which comprises coating a negative-type photosensitive composition on a semiconductor substrate; drying the coating to provide a photosensitive film; subjecting the film to small light exposure to effect curing of selected portions thereof; and developing the film by contacting with a developing solution which comprises at least two compounds selected from the group consisting of a compound of the formula:
- (CH.sub.3).sub.3 (CH.sub.2 CH.sub.2 OH)NOH
- and compounds of the formula:
- (C.sub.n H.sub.2n+1).sub.4 NX (I)
- wherein X is OH, Cl, I or Br; and n is an integer of 1 to 5.
- 2. A process according to claim 1, wherein the exposure time required for curing one-half of the coating film with said developing solution is 1/3 or less and preferably 1/4 or less the time required by another developing solution containing only one of said compounds.
- 3. A process according to claim 1, wherein said at least two compounds comprise a first compound and a second compound, said first compound having a smaller molecular weight than the second compound, and wherein the weight ratio of said first compound to said second compound is in the range of 1:1 to 1:1.times.10.sup.-4.
- 4. A process according to claim 1, wherein said developing solution further comprises a solvent selected from the group consisting of water and alcohol.
- 5. A process according to claim 1, wherein said at least two compounds are a combination of tetramethylammonium hydroxide and tetrapentylammonium chloride.
- 6. A process according to claim 1, wherein said at least two compounds are a combination of choline and tetrapentylammonium chloride.
- 7. A process according to claim 4, wherein said at least two compounds are dissolved in said solvent at a concentration of 10% by weight or less.
- 8. A process according to claim 4, wherein said developing solution further comprises surface active agents and stabilizers.
- 9. A process according to claim 1, wherein said negative-type photosensitive composition comprises a polymer component soluble in aqueous alkali solutions and a photopolymerization initiator comprising an aromatic azide compound.
Parent Case Info
This is a continuation of application Ser. No. 855,459, filed Apr. 24, 1986 abandoned.
US Referenced Citations (3)
Number |
Name |
Date |
Kind |
4423138 |
Guild |
Dec 1983 |
|
4556629 |
Poulin et al. |
Dec 1985 |
|
4610953 |
Hashimoto et al. |
Sep 1986 |
|
Foreign Referenced Citations (1)
Number |
Date |
Country |
0219743 |
Dec 1984 |
JPX |
Continuations (1)
|
Number |
Date |
Country |
Parent |
855459 |
Apr 1986 |
|