Aqueous alkaline compositions

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G03F7/322

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/322Aqueous alkaline compositions

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Resist composition and pattern forming process
- Patent number 12,174,536
- Issue date Dec 24, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, method for producing resist patte...
- Patent number 12,174,538
- Issue date Dec 24, 2024
- JSR Corporation
- Naoki Nishiguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified positive resist composition and resist pattern...
- Patent number 12,164,231
- Issue date Dec 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaaki Kotake
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film material, patterning process, and method for...
- Patent number 12,147,160
- Issue date Nov 19, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoacid generators, photoresist compositions, and pattern formati...
- Patent number 12,140,866
- Issue date Nov 12, 2024
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium salt, photoacid generator, curable composition and resist...
- Patent number 12,129,240
- Issue date Oct 29, 2024
- San-Apro Ltd.
- Takuto Nakao
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Negative resist formulation for producing undercut pattern profiles
- Patent number 12,124,166
- Issue date Oct 22, 2024
- Merck Patent GmbH
- Anupama Mukherjee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 12,111,573
- Issue date Oct 8, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Ikeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photosensitive resin composition, positive photosensitive...
- Patent number 12,085,856
- Issue date Sep 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masashi Iio
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Water-developable photosensitive resin printing original plate
- Patent number 12,061,417
- Issue date Aug 13, 2024
- TOYOBO MC CORPORATION
- Toshiyuki Kita
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Method of manufacturing flexographic printing plate
- Patent number 12,044,972
- Issue date Jul 23, 2024
- FUJIFILM Corporation
- Hiroshi Tashiro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 12,032,290
- Issue date Jul 9, 2024
- FUJIFILM Corporation
- Daisuke Asakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer brush adhesion promoter with UV cleavable linker
- Patent number 12,019,376
- Issue date Jun 25, 2024
- International Business Machines Corporation
- Jing Guo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coloring composition, color filter, pattern forming method, solid-s...
- Patent number 12,019,369
- Issue date Jun 25, 2024
- FUJIFILM Corporation
- Shoichi Nakamura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for manufacturing electronic device
- Patent number 12,013,644
- Issue date Jun 18, 2024
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organometallic solution based high resolution patterning compositio...
- Patent number 11,988,959
- Issue date May 21, 2024
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 11,988,958
- Issue date May 21, 2024
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 11,988,960
- Issue date May 21, 2024
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate treating apparatus and substrate treating method
- Patent number 11,977,332
- Issue date May 7, 2024
- Semes Co., Ltd.
- Hae-Won Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist developer and method of developing photoresist
- Patent number 11,971,657
- Issue date Apr 30, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 11,966,159
- Issue date Apr 23, 2024
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition, coated substrate including the photoresist...
- Patent number 11,960,206
- Issue date Apr 16, 2024
- Rohm and Hass Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Electronic-sensing and magnetic-modulation (ESMM) biosensor for pha...
- Patent number 11,951,476
- Issue date Apr 9, 2024
- Rutgers, The State University of New Jersey
- Umer Hassan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 11,953,829
- Issue date Apr 9, 2024
- FUJIFILM Corporation
- Kazunari Yagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 11,953,832
- Issue date Apr 9, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developer composition for flexographic printing plate, developer, a...
- Patent number 11,940,735
- Issue date Mar 26, 2024
- TOYOBO MC CORPORATION
- Hiroto Yamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist topcoat compositions and methods of processing photores...
- Patent number 11,940,731
- Issue date Mar 26, 2024
- Rohm and Haas Electronic Materials LLC
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 11,934,100
- Issue date Mar 19, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monomers, polymers and lithographic compositions comprising same
- Patent number 11,932,713
- Issue date Mar 19, 2024
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 11,914,294
- Issue date Feb 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTOSENSITIVE COMPOSITION, TRANSFER FILM, CURED FILM, SEMICONDUCTO...
- Publication number 20240395551
- Publication date Nov 28, 2024
- FUJIFILM CORPORATION
- Keigo YAMAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BOTTOM ANTIREFLECTIVE COATING MATERIALS
- Publication number 20240377743
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien-Chih Chen
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20240377741
- Publication date Nov 14, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIO...
- Publication number 20240337926
- Publication date Oct 10, 2024
- INPRIA CORPORATION
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, ME...
- Publication number 20240319597
- Publication date Sep 26, 2024
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY METHOD BASED ON BILAYER PHOTORESIST
- Publication number 20240295817
- Publication date Sep 5, 2024
- SHANGHAI MICROSTART PHOTOELECTRIC TECHNOLOGY CO., LTD.
- Yijiao GAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
- Publication number 20240295822
- Publication date Sep 5, 2024
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, AND POLYMER
- Publication number 20240295814
- Publication date Sep 5, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Keiichi IBATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, AND COMPOSITION
- Publication number 20240288773
- Publication date Aug 29, 2024
- JSR Corporation
- Masato DOBASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIO...
- Publication number 20240280897
- Publication date Aug 22, 2024
- INPRIA CORPORATION
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240272550
- Publication date Aug 15, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHENOLIC HYDROXY GROUP-CONTAINING RESIN, RESIN COMPOSITION FOR ALKA...
- Publication number 20240270891
- Publication date Aug 15, 2024
- DIC CORPORATION
- Tomoyuki Imada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20240272553
- Publication date Aug 15, 2024
- FUJIFILM CORPORATION
- YUMA KURUMISAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST DEVELOPER AND METHOD OF DEVELOPING PHOTORESIST
- Publication number 20240264526
- Publication date Aug 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren ZI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Conductive Polymer Composition, Coated Product, And Patterning Process
- Publication number 20240219836
- Publication date Jul 4, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takayuki NAGASAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist developer
- Publication number 20240219842
- Publication date Jul 4, 2024
- Manish Chandhok
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER, PHOTOSENSITIVE COMPOSITION, DRY FILM PHOTORESIST, AND LITH...
- Publication number 20240192597
- Publication date Jun 13, 2024
- Industrial Technology Research Institute
- Yu-Ying HSU
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
REGENERATION TREATMENT APPARATUS, WASHOUT PROCESSOR, AND MANUFACTUR...
- Publication number 20240190726
- Publication date Jun 13, 2024
- FUJIFILM CORPORATION
- Seiji TAJIMA
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
ELECTRONIC-SENSING & MAGNETIC-MODULATION (ESMM) BIOSENSOR FOR PHAGO...
- Publication number 20240181448
- Publication date Jun 6, 2024
- Rutgers, The State University of New Jersey
- Umer HASSAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
RESIN MEMBRANE FILTER AND MANUFACTURING METHOD OF RESIN MEMBRANE FI...
- Publication number 20240149197
- Publication date May 9, 2024
- FUJIFILM CORPORATION
- Hiroyuki YONEZAWA
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION
- Publication number 20240142876
- Publication date May 2, 2024
- JSR Corporation
- Hiroyuki MIYAUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST UNDERLAYER COMPOSITION
- Publication number 20240126172
- Publication date Apr 18, 2024
- Rohm and Haas Electronic Materials L.L.C.
- Anton CHAVEZ
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymer, Resist Composition, And Patterning Process
- Publication number 20240118617
- Publication date Apr 11, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro FUKUSHIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TREATMENT LIQUID FOR MANUFACTURING SEMICONDUCTOR, PATTERN FORMING M...
- Publication number 20240103374
- Publication date Mar 28, 2024
- FUJIFILM CORPORATION
- Tetsuya SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COLORED PHOTOSENSITIVE RESIN COMPOSITION AND MUTILAYER CURED FILM P...
- Publication number 20240085791
- Publication date Mar 14, 2024
- ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
- Seung-Keun KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN
- Publication number 20230393464
- Publication date Dec 7, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Li-Po YANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20230393470
- Publication date Dec 7, 2023
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LAMINATE OF NEGATIVE TONE LITHOGRAPHIC PRINTING PLATE PRECURSOR AND...
- Publication number 20230384671
- Publication date Nov 30, 2023
- FUJIFILM CORPORATION
- Shumpei WATANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR DEVELOPING AND METHOD OF FORMING PATTERN USING THE...
- Publication number 20230375936
- Publication date Nov 23, 2023
- SAMSUNG ELECTRONICS CO,. LTD.
- Sangjin KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, RESIST PATTERN FORMING PROCESS AND CHEMICALLY AMPLIFIED...
- Publication number 20230367213
- Publication date Nov 16, 2023
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Aqueous alkaline compositions

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Resist composition and pattern forming process

Photosensitive resin composition, method for producing resist patte...

Chemically amplified positive resist composition and resist pattern...

Resist underlayer film material, patterning process, and method for...

Photoacid generators, photoresist compositions, and pattern formati...

Sulfonium salt, photoacid generator, curable composition and resist...

Negative resist formulation for producing undercut pattern profiles

Resist composition and method of forming resist pattern

Positive photosensitive resin composition, positive photosensitive...

Water-developable photosensitive resin printing original plate

Method of manufacturing flexographic printing plate

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Polymer brush adhesion promoter with UV cleavable linker

Coloring composition, color filter, pattern forming method, solid-s...

Method for manufacturing electronic device

Organometallic solution based high resolution patterning compositio...

Organometallic solution based high resolution patterning compositions

Organometallic solution based high resolution patterning compositions

Substrate treating apparatus and substrate treating method

Photoresist developer and method of developing photoresist

Organometallic solution based high resolution patterning compositions

Photoresist composition, coated substrate including the photoresist...

Electronic-sensing and magnetic-modulation (ESMM) biosensor for pha...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Positive resist composition and pattern forming process

Developer composition for flexographic printing plate, developer, a...

Photoresist topcoat compositions and methods of processing photores...

Composition for forming silicon-containing resist underlayer film a...

Monomers, polymers and lithographic compositions comprising same

Positive resist composition and pattern forming process

Patents Applicationslast 30 patents

PHOTOSENSITIVE COMPOSITION, TRANSFER FILM, CURED FILM, SEMICONDUCTO...

BOTTOM ANTIREFLECTIVE COATING MATERIALS

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIO...

RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, ME...

PHOTOLITHOGRAPHY METHOD BASED ON BILAYER PHOTORESIST

PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, AND POLYMER

METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, AND COMPOSITION

ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIO...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

PHENOLIC HYDROXY GROUP-CONTAINING RESIN, RESIN COMPOSITION FOR ALKA...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

PHOTORESIST DEVELOPER AND METHOD OF DEVELOPING PHOTORESIST

Conductive Polymer Composition, Coated Product, And Patterning Process

Photoresist developer

POLYMER, PHOTOSENSITIVE COMPOSITION, DRY FILM PHOTORESIST, AND LITH...

REGENERATION TREATMENT APPARATUS, WASHOUT PROCESSOR, AND MANUFACTUR...

ELECTRONIC-SENSING & MAGNETIC-MODULATION (ESMM) BIOSENSOR FOR PHAGO...

RESIN MEMBRANE FILTER AND MANUFACTURING METHOD OF RESIN MEMBRANE FI...

SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION

PHOTORESIST UNDERLAYER COMPOSITION

Polymer, Resist Composition, And Patterning Process

TREATMENT LIQUID FOR MANUFACTURING SEMICONDUCTOR, PATTERN FORMING M...

COLORED PHOTOSENSITIVE RESIN COMPOSITION AND MUTILAYER CURED FILM P...

PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...

LAMINATE OF NEGATIVE TONE LITHOGRAPHIC PRINTING PLATE PRECURSOR AND...

COMPOSITION FOR DEVELOPING AND METHOD OF FORMING PATTERN USING THE...

MASK BLANK, RESIST PATTERN FORMING PROCESS AND CHEMICALLY AMPLIFIED...