This application is a continuation of application Ser. No. 074,113, filed July 16, 1987, now abandoned.
Number | Name | Date | Kind |
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3916822 | Robinson | Nov 1975 | |
4615756 | Tsujii et al. | Oct 1986 | |
4615905 | Ovshinsky et al. | Oct 1986 |
Number | Date | Country |
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0198361 | Oct 1986 | EPX |
57-167631 | Oct 1982 | JPX |
57-202739 | Dec 1982 | JPX |
59-145519 | Aug 1984 | JPX |
114532 | Jun 1986 | JPX |
62-27573 | Feb 1987 | JPX |
Entry |
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Lucovsky et al., "Deposition of Dielectric Films by Remote Plasma Enhanced CVD", Mat. Res. Soc. Symp. Proc., vol. 68, 1986, pp. 323-334. |
Schmolla et al., "Amorphous BN Films Produced in a Double-Plasma Reactor for Semiconductor Applications", 205 Solid-State Electronics, vol. 26 (1983), Oct., No. 10, Exeter, Greate-Britain, pp. 931-939. |
Number | Date | Country | |
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Parent | 74113 | Jul 1987 |