Claims
- 1. A projection electron lithography system, comprising:
a lithography tool for emitting a beam of electrons and producing measurement information; and a processor including,
at least one model for producing predictive information, and an estimator for controlling placement of the beam of electrons based on the predictive information from said at least one model and measurement information from said lithography tool.
- 2. The system of claim 1, wherein said estimator compensates for heating and beam drift effects.
- 3. The system of claim 1, wherein said estimator is a Kalman filter, using least-squares based linear matrix algebra.
- 4. The system of claim 1, wherein said system is a SCALPEL system.
- 5. The system of claim 3, wherein said at least one model includes a plurality of different models and said Kalman filter is an adaptive Kalman filter, wherein said adaptive Kalman filter iteratively selects one of the plurality of different models until a best one of plurality of different models emerges.
- 6. The system of claim 3, wherein said at least one model includes a plurality of different models and said Kalman filter is an adaptive Kalman filter, said adaptive Kalman filter having a tunable strength parameter to determine an optimal adaptation weighting criterion.
- 7. The system of claim 5, wherein the plurality of different models includes three or more models.
- 8. The system of claim 6, wherein the plurality of different models includes three or more models.
- 9. A process for controlling projection electron lithography, comprising:
emitting a beam of electrons; producing measurement information on said emitting step; producing predictive information related to the projection electron lithography process, and controlling placement of the beam of electrons based on the predictive information and the measurement information.
- 10. The process of claim 9, wherein said controlling step is implemented as a Kalman filter using least-squares based linear matrix algebra.
- 11. The process of claim 9, wherein said controlling step compensates for heating and beam drift effects.
- 12. The process of claim 9, wherein said process is a SCALPEL process.
- 13. The process of claim 9, wherein the predictive information is produced by a plurality of different models, wherein said controlling step iteratively selects one of the plurality of different models until a best one of plurality of different models emerges.
- 14. The process of claim 9, wherein the predictive information is produced by a plurality of different models, wherein said controlling step has a tunable strength parameter to determine an optimal adaptation weighting criterion.
- 15. The process of claim 14, wherein the plurality of different models includes three or more models.
- 16. The process of claim 14, wherein the plurality of different models includes three or more models.
Parent Case Info
[0001] This application is related to and claims the benefit of priority to U.S. Provisional patent application Serial No. 60/270,872, filed Feb. 26, 2001, entitled “Projection Electron Beam Lithography Apparatus and Method Employing a Kalman Filter”, in the name of Stuart T. Stanton, the entirety of which is hereby incorporated by reference.
Provisional Applications (1)
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Number |
Date |
Country |
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60270872 |
Feb 2001 |
US |