Claims
- 1. A compound of the formula I ##STR3## where R.sup.1 is an alkyl radical, which is unsubstituted or substituted with at least one member selected from the group consisting of a halogen atom, an alkoxy group and a phenyl group,
- R.sup.2 is a hydrogen atom or an optionally substituted alkyl radical containing 1 to 4 carbon atoms,
- R.sup.3 is a low-molecular weight, non-polymeric n-valent, aliphatic, cycloaliphatic, or aromatic radical, and
- n is an integer from 1 to 4.
- 2. A compound of the formula I ##STR4## where R.sup.1 is an optionally substituted alkyl radical,
- R.sup.2 is a hydrogen atom or an optionally substituted alkyl radical containing 1 to 4 carbon atoms,
- n is an integer from 1 to 4, and
- R.sup.3 is a radical containing 1 to 3 aromatic nuclei.
- 3. A compound as claimed in claim 1, wherein R.sup.1 is an alkyl radical containing 1 to 6 carbon atoms.
- 4. A compound as claimed in claim 1, wherein R.sup.2 is a hydrogen atom or a methyl group.
- 5. A compound as claimed in claim 1, wherein R.sup.3 is an aliphatic group.
- 6. A compound as claimed in claim 5, wherein the aliphatic group of R.sup.3 has 1 to 10 carbon atoms.
- 7. A compound as claimed in claim 1, wherein R.sup.3 is an aliphatic group interrupted by an ethereal oxygen atom or phenylene group.
- 8. A compound as claimed in claim 1, wherein R.sup.3 is an aliphatic group containing a double bond.
- 9. A compound as claimed in claim 1, wherein R.sup.3 is a cycloaliphatic group.
- 10. A compound as claimed in claim 9, wherein the cycloaliphatic group contains 5 or 6 ring members.
- 11. A compound as claimed in claim 9, wherein the cycloaliphatic group contains one or two rings, which are optionally linked.
- 12. A compound as claimed in claim 1, wherein R.sup.2 is a hydrogen atom.
- 13. A compound as claimed in claim 1, wherein R.sup.2 is an unsubstituted alkyl radical containing 1 to 4 carbon atoms.
- 14. A compound as claimed in claim 1, wherein R.sup.3 is an aromatic radical.
- 15. A compound as claimed in claim 14, wherein the aromatic radical contains 1 to 3 aromatic nuclei which are joined to one another by fusing or by a linking intermediate member.
- 16. A compound as claimed in claim 1, wherein R.sup.3 is selected from the group consisting of 4,4'-oxydiphenyl, 1,3,5-benzenetriyl, 1,4-phenylene, 4-benzoylphenyl, 4,4'-sulfonyldiphenyl, 4,4'-sulfonyloxydiphenyl, and biphenyl-4-4'-diyl.
Priority Claims (1)
Number |
Date |
Country |
Kind |
44 44 669 |
Dec 1994 |
DEX |
|
Parent Case Info
This application is a division of application Ser. No. 08/567,775, filed Dec. 5, 1995 now U.S. Pat. No. 5,705,317.
US Referenced Citations (23)
Foreign Referenced Citations (8)
Number |
Date |
Country |
0 022 571 |
Jan 1981 |
EPX |
0 102 450 |
Mar 1984 |
EPX |
0 249 139 |
Dec 1987 |
EPX |
0 366 590 |
May 1990 |
EPX |
0 448 006 A3 |
Sep 1991 |
EPX |
0 525 626 A1 |
Feb 1993 |
EPX |
26 10 842 |
Sep 1976 |
DEX |
27 18 254 |
Nov 1978 |
DEX |
Non-Patent Literature Citations (4)
Entry |
Chem Abstracts: 127: 328694 Contrast agents comprising gas containing or gas generations. |
Polymer particles or microballoons "felleveness et al" 125: 53054 "Contrast agents comprising gas containing polymer microparticles and/or microballons for diagnostic applications "Flaveness et al. " 126: 162263 "Pharmaceutical particles comprising water soluble adhesive sheet"Textshito et al" 121: 2L7553: Liquid electrostat graphic developer containing. |
Dispersion resin grains "Eiichi et al." 117: 198512 Polymers containing sluster units for mosthetics and dosage forms "Flaveness et al" 112: 45672 "Carrier for electrostatic image development" "Masalxi et al. " . |
Ban et al., "Metal-Free Chemically Amplified Positive Resist Resolving 0.2 Micron in X-ray Lithography". |
Divisions (1)
|
Number |
Date |
Country |
Parent |
567775 |
Dec 1995 |
|