Claims
- 1. A positive resist composition which comprises, in admixture, (1) a photosensitive 1,2-quinone diazide compound, (2) an alkali-soluble resin to bind ingredients and (3) a polyphenol compound selected from the group consisting of: ##STR12## wherein: (A) the amount of said 1,2-quinone diazide compound is from 5 to 100% by weight and
- (B) the amount of said polyphenol compound is from 4 to 40% by weight based on the total weight of said alkali-soluble resin and said polyphenol compound.
- 2. The positive resist composition according to claim 1 wherein the polyphenol compound is the compound of the formula: ##STR13##
- 3. The positive resist composition according to claim 1, wherein said polyphenol compound is selected from the group consisting of ##STR14##
Priority Claims (2)
Number |
Date |
Country |
Kind |
169477/1988 |
Jul 1988 |
JPX |
|
331074/1988 |
Dec 1988 |
JPX |
|
Parent Case Info
This application is a continuation of application Ser. No. 07/466,657 filed on Jan. 17, 1990, now abandoned, which is a continuation-in-part of application Ser. No. 07/375,999 filed on Jul. 6, 1989, now abandoned.
US Referenced Citations (13)
Continuations (1)
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Number |
Date |
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Parent |
466657 |
Jan 1990 |
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Continuation in Parts (1)
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Number |
Date |
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Parent |
375999 |
Jul 1989 |
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