Claims
- 1. A radiation-sensitive recording material, consisting essentially of a support, a radiation-sensitive recording layer and a radiation-sensitive, rough, discontinuous covering layer which is distinct from said radiation-sensitive recording layer, said covering layer being sprayed on said recording layer in the form of a solution which contains an organic solvent, said solvent partially dissolving the surface of said recording layer, wherein (A) said rough covering layer and said recording layer comprise substantially the same composition, said composition being an admixture suited for the preparation of a planographic printing plate that presents a roughened outer surface; and (B) said rough covering layer comprises a plurality of discrete particles formed by drying at least a portion of the liquid droplets of said solution.
- 2. A recording material as claimed in claim 1, wherein the layer weight of said rough covering layer is in the range from about 0.05 to 1 g/m.sup.2.
- 3. A recording material as claimed in claim 1, wherein said discrete particles have average heights in the range from about 0.1 to 10 .mu.m.
- 4. A recording material as claimed in claim 1, wherein the particles have average diameters in the range from about 1 to 400 .mu.m.
- 5. A recording material as claimed in claim 1, wherein said covering layer comprises from about 2 to b 1,000 particles per mm.sup.2.
- 6. A planographic printing plate comprising a radiation-sensitive recording material as claimed in claim 1.
- 7. A recording material as claimed in claim 1, wherein said recording layer has a layer weight in the range from about 0.2 to 10 g/m.sup.2.
Priority Claims (1)
Number |
Date |
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3433247 |
Sep 1984 |
DEX |
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Parent Case Info
This application is a continuation of application Ser. No. 772,704 filed Sept. 5, 1985 now abandoned.
US Referenced Citations (13)
Foreign Referenced Citations (5)
Number |
Date |
Country |
1148014 |
Jun 1983 |
CAX |
1512080 |
May 1978 |
GBX |
1542131 |
Mar 1979 |
GBX |
2081919 |
Feb 1982 |
GBX |
2118862 |
Nov 1983 |
GBX |
Non-Patent Literature Citations (3)
Entry |
Suwa Seikosha, Forming Method of Photo Resist Patterns, May 18, '79, vol. 3 No. 85 (E-124). |
Daicel K. K., Exposed Photosensitive Diazo Film for Making Screen Plate, May 27, 1982, vol. 6, No. 168 (P-139). |
English Language Abstract of Japanese Patent 58-11943, Published 1/1983. |
Continuations (1)
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Number |
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772704 |
Sep 1985 |
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