Claims
- 1. A multicomponent fluid composition monitoring and compositional control system, wherein the multicomponent fluid comprises BTA and is utilized in a semiconductor manufacturing facility, and wherein a real-time component analysis of the multicomponent fluid is effected by titration or other analytical procedure, for BTA, and a computational means is employed to determine and responsively adjust in real time the relative amount or proportion of the BTA in the multicomponent fluid composition, to maintain a predetermined compositional character of the multicomponent fluid composition utilized in said semiconductor manufacturing facility.
- 2. The system of claim 1, comprising a reaction vessel for titration reaction of BTA, and a silver chloride ion selective sensing electrode coupled with a double-junction silver-silver chloride reference electrode (filled with 10% w/v aqueous potassium nitrate electrolyte solution) in the reaction vessel.
- 3. A fluid utilization and management system, comprising a semiconductor manufacturing facility using a multicomponent composition including BTA, and a BTA monitoring and concentration control system for maintaining concentration of BTA in the multicomponent fluid at a desired level for use of the multicomponent composition in the semiconductor manufacturing facility, wherein the BTA monitoring and concentration control system comprises (i) an analyzer unit, constructed and arranged to monitor the concentration of BTA in the multicomponent composition using a real-time methodology, and (ii) a control unit constructed and arranged to compare the results of the analyzer unit to pre-programmed specifications and responsively control dispensing of said BTA and/or aqueous medium into the multicomponent composition as required to maintain a predetermined concentration of said BTA in the multicomponent composition used in the semiconductor manufacturing facility.
- 4. The system of claim 3, wherein BTA is monitored by concentration analysis involving titration of BTA with AgNO3.
- 5. The system of claim 4, wherein the titration is performed in DI water in the presence of sodium acetate buffer.
- 6. The system of claim 3, wherein the analyzer unit comprises computation means storing parameters for conducting a specific analysis sequence, finding the endpoint(s) of the analysis, calculating and reporting analysis results.
- 7. The system of claim 6, wherein the analyzer unit comprises display means for outputting said analysis results.
- 8. The system of claim 6, wherein the analyzer unit comprises a reaction vessel for conducting titration reaction therein, and said analyzer unit and control unit are constructed and arranged to carry out a sequence comprising sampling from multicomponent fluid flowed to the fluid-using processing facility, titrating the sample with titrant reagent, emptying the reaction vessel, and flushing the reaction vessel with flush medium.
- 9. The system of claim 3, wherein the multicomponent composition comprises a chemical mechanical planarization composition.
- 10. A multicomponent fluid composition monitoring and compositional control system, comprising means for performing component analysis of said multicomponent fluid by titration or other analytical procedure, for one or more components of interest including BTA, and computational means constructed and arranged to determine and responsively adjust the relative amount or proportion of BTA in the multicomponent fluid composition, to maintain a predetermined compositional character of the multicomponent fluid composition.
- 11. The system of claim 10, as coupled in multicomponent fluid flow communication with a semiconductor manufacturing facility using said multicomponent fluid of said predetermined compositional character.
- 12. The system of claim 11, wherein the semiconductor manufacturing facility includes a process tool for Cu CMP or Cu post-CMP processing, and means for flowing said multicomponent fluid to said process tool.
- 13. A process of monitoring and compositionally controlling a multicomponent fluid used in a processing facility, said process comprising conducting a real-time component analysis of the multicomponent fluid by titration or other analytical procedure, for one or more components of interest including BTA, and computationally and responsively adjusting in real time the relative amount or proportion of BTA in the multicomponent fluid composition, to maintain a predetermined compositional character of the multicomponent fluid composition utilized in said fluid-using processing facility.
- 14. The process of claim 13, wherein said processing facility comprises a semiconductor manufacturing facility.
- 15. The process of claim 14, wherein the multicomponent fluid is used in the semiconductor manufacturing facility for a chemical mechanical planarization (CMP) process.
- 16. A fluid utilization and management process, comprising providing a fluid-using processing facility using a multicomponent fluid including BTA, and maintaining concentration of BTA in the multicomponent fluid at a desired level for use of the multicomponent fluid in the fluid-using processing facility, by monitoring the concentration of BTA in the multicomponent fluid using a real-time methodology, and comparing the results of the methodology to preestablished specifications and responsively controlling dispensing of said BTA into the multicomponent fluid as required to maintain a predetermined concentration of said BTA in the multicomponent fluid used in the fluid-using processing facility.
- 17. The process of claim 16, comprising controlling the concentration of BTA using a control unit including a sampling system, at least one sensor, a reaction vessel with mixer, and a reagent dispensing system, disposed in a unitary module within a housing.
- 18. The process of claim 17, wherein the fluid-using processing facility comprises a fluid-using semiconductor manufacturing tool.
- 19. The process of claim 18, comprising providing multiple output display units providing redundant function of outputting analytical results, and positioning respective output display units remotely in relation to one another.
- 20. The process of claim 16, wherein the multicomponent fluid comprises a chemical mechanical planarization composition.
- 21. A multicomponent fluid composition monitoring and compositional control process, comprising performing component analysis of said multicomponent fluid by titration or other analytical procedure, for one or more components of interest, and computationally determining and responsively adjusting the relative amount or proportion of the one or more components in the multicomponent fluid composition, to maintain a predetermined compositional character of the multicomponent fluid composition, wherein said one or more components comprises BTA.
CROSS-REFERENCE TO RELATED APPLICATION
[0001] This is a continuation-in-part of U.S. patent application Ser. No. 10/264,408 filed Oct. 4, 2002 in the names of Russell Stevens, Thomas Kloffenstein, Todd Aycock and Joseph W. Evans for “Real-Time Component Monitoring and Replenishment System for Multicomponent Fluids.”
Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
10264408 |
Oct 2002 |
US |
Child |
10278449 |
Oct 2002 |
US |