Remover solution composition and use thereof

Abstract

The invention provides a remover solution composition, comprising: (A) 0˜25% by weight of an alkaline compound;(B) 0.1˜20% by weight of an alcohol amine compound;(C) 0.5˜20% by weight of a surfactant;(D) 3˜80% by weight of a water-miscible solvent; and(E) water.

Description

Claims

1. A remover solution composition comprising: (A) 0˜25% by weight of an alkaline compound;(B) 0.1˜20% by weight of an alcohol amine compound;(C) 0.5˜20% by weight of a surfactant;(D) 3˜80% by weight of a water-miscible solvent; and(E) water.

2. The remover solution composition according to claim 1, wherein the alkaline compound is a quaternary ammonium salt.

3. The remover solution composition according to claim 2, wherein the alkaline compound is tetramethyl ammonium hydroxide.

4. The remover solution composition according to claim 1, wherein the alkaline compound is used in an amount of 2 to 10% by weight.

5. The remover solution composition according to claim 1, wherein the alcohol amine compound is selected from the group consisting of ethanolamine, diethanolamine, triethanolamine, 2-(2-aminoethoxy)ethanol, monoisopropanolamine, diisopropanolamine, triisopropanolamine, n-ethylethanolamine, n-butyl ethanolamine and a mixture thereof.

6. The remover solution composition according to claim 1, wherein the alcohol amine compound is used in an amount of 1 to 8% by weight.

7. The remover solution composition according to claim 1, wherein the surfactant is a nonionic surfactant.

8. The remover solution composition according to claim 1, wherein the solvent is N-methylpyrrolidone, methyl ethyl ketone, acetone, cyclohexanone, dimethyl sulfoxide, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol butyl ether, or propylene glycol methyl ether, or a combination thereof.

9. The remover solution composition according to claim 1, wherein the solvent is propylene glycol methyl ether.

10. The remover solution composition according to claim 1, wherein the solvent is used in an amount of 10 to 40% by weight.

11. A method for removing unnecessary photoresist or planarization material on the edge of a substrate of a display panel or color filter, comprising using the remover solution composition according to claim 1.

12. The method according to claim 11, wherein the photoresist is a photo spacer photoresist.