Finishing the coated layer

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/168Finishing the coated layer

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Patents Grantslast 30 patents

Information Patent Grant
Metal oxide resist patterning with electrical field guided post-exp...
- Patent number 12,204,246
- Issue date Jan 21, 2025
- Applied Materials, Inc.
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Method for preparing pixel define layer
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- Issue date Jan 21, 2025
- DUK SAN NEOLUX CO., LTD.
- Hyunsang Cho
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Adaptive baking method
- Patent number 12,196,491
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzung-Chen Wu
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Substrate processing apparatus and substrate processing method
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- Issue date Jan 14, 2025
- Tokyo Electron Limited
- Tsuyoshi Watanabe
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Quantum dot light-emitting device, manufacturing method and display...
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- Issue date Jan 7, 2025
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- Wenhai Mei
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Photoresist composition and method of forming photoresist pattern
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- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Li-Po Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Planarization method and photocurable composition
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- Issue date Dec 31, 2024
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- Toshiki Ito
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Integrated dry processes for patterning radiation photoresist patte...
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- Issue date Dec 31, 2024
- Lam Research Corporation
- Jengyi Yu
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Composition for forming silicon-containing resist underlayer film a...
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- Tsutomu Ogihara
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Photoresist for semiconductor fabrication
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- Taiwan Semiconductor Manufacturing Company, Ltd
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Information Patent Grant
Resin, photoresist composition, and method of manufacturing semicon...
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Negative resist formulation for producing undercut pattern profiles
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Method for measuring critical dimension
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- NANYA TECHNOLOGY CORPORATION
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- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist development with halide chemistries
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- Issue date Oct 1, 2024
- Lam Research Corporation
- Samantha Siamhwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and methods for beam processing of substrates
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- Issue date Oct 1, 2024
- Tokyo Electron Limited
- Mirko Vukovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stable solutions of monoalkyl tin alkoxides and their hydrolysis an...
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- Inpria Corporation
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Composition for forming silicon-containing resist underlayer film a...
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Method of manufacturing semiconductor devices
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Ambient controlled two-step thermal treatment for spin-on coating l...
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Resin, photoresist composition, and method of manufacturing semicon...
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Chemical-resistant protective film-forming composition containing p...
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- Issue date Sep 3, 2024
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Laminate, optical filter, solid image pickup element, image display...
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Information Patent Grant
Organometallic radiation patternable coatings with low defectivity...
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Carboxylate, quencher, resist composition and method for producing...
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Information Patent Grant
Substrate processing apparatus, estimation method of substrate proc...
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- Issue date Jul 30, 2024
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Photoresist structure, patterned deposition layer, semiconductor ch...
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- Issue date Jul 16, 2024
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Method for manufacturing a horological component and component prod...
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- Issue date Jul 16, 2024
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Abnormality detection device of chemical solution, liquid processin...
- Patent number 12,032,294
- Issue date Jul 9, 2024
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Patents Applicationslast 30 patents

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COMPOSITION
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- Merck Patent GmbH
- Seishi SHIBAYAMA
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SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS USIN...
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- Youngho HWANG
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SPIN-ON CARBON HARD MASK COMPOSITION WITH HIGH PLANARIZATION PERFOR...
- Publication number 20250013154
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- YCCHEM CO., LTD.
- Su Jin LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Composition For Forming Organic Film, Method For Forming Organic Fi...
- Publication number 20250011623
- Publication date Jan 9, 2025
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD USING T...
- Publication number 20250014915
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- Samsung Electronics Co., Ltd.
- SANGJINE PARK
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Optical Metalens Systems and Methods of Manufacture
- Publication number 20250012944
- Publication date Jan 9, 2025
- Imagia, Inc.
- Gregory Kress
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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BLOCK COPOLYMER
- Publication number 20250004372
- Publication date Jan 2, 2025
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- Kazuaki EBISAWA
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RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20250004367
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- NISSAN CHEMICAL CORPORATION
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RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING TERMINATED PO...
- Publication number 20240427246
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- NISSAN CHEMICAL CORPORATION
- Tomotada HIROHARA
- H01 - BASIC ELECTRIC ELEMENTS
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STABLE SOLUTIONS OF MONOALKYL TIN ALKOXIDES AND THEIR HYDROLYSIS AN...
- Publication number 20240427237
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- INPRIA CORPORATION
- Kai Jiang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
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LIGHT PATTERNABLE SURFACE MODIFICATION
- Publication number 20240427240
- Publication date Dec 26, 2024
- Brewer Science, Inc.
- Reuben T. Chacko
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PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
- Publication number 20240419078
- Publication date Dec 19, 2024
- LAM RESEARCH CORPORATION
- Samantha SiamHwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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APPARATUS AND METHODS FOR BEAM PROCESSING OF SUBSTRATES
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- TOKYO ELECTRON LIMITED
- Mirko Vukovic
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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PATTERNED DARK MIRROR COATINGS FOR MULTI-FUNCTIONAL OPTICS
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- The Aerospace Corporation
- Sean C. STUART
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CHEMICALLY SELECTIVE ADHESION AND STRENGTH PROMOTERS IN SEMICONDUCT...
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- Brennan Peterson
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PHOTOLITHOGRAPHY METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR D...
- Publication number 20240411227
- Publication date Dec 12, 2024
- Korea Advanced Institute of Science and Technology
- Sung Gap Im
- H01 - BASIC ELECTRIC ELEMENTS
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Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20240402596
- Publication date Dec 5, 2024
- Shin-Etsu Chemical Co., Ltd.
- Shohei IWAMORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
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- Sumitomo Chemical Company, Limited
- Saki KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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METAL CONTAINING PHOTORESIST DEVELOPER COMPOSITION, AND METHOD OF F...
- Publication number 20240393694
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- Samsung SDI Co., Ltd.
- Hyungrang MOON
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COMPOSITION FOR REMOVING EDGE BEADS FROM METAL-CONTAINING RESISTS,...
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- Samsung SDI Co., Ltd.
- Si-Kyun PARK
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SEMICONDUCTOR DEVICE AND METHODS OF MANUFACTURE
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- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsing-Chieh Lee
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METHOD OF FORMING PATTERNS
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- Samsung SDI Co., Ltd.
- Jongpil HO
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SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD
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- Hee Man AHN
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METHOD OF FORMING PATTERNS
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- Samsung SDI Co., Ltd.
- Gyeonghun PARK
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AMBIENT CONTROLLED TWO-STEP THERMAL TREATMENT FOR SPIN-ON COATING L...
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RESIN, PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING SEMICON...
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POSITIVE TYPE PHOTORESIST COMPOSITION, METHOD OF FORMING PHOTORESIS...
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PHOTORESIST FOR SEMICONDUCTOR FABRICATION
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- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Cheng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BOTTOM ANTIREFLECTIVE COATING MATERIALS
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- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien-Chih Chen
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Finishing the coated layer

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Metal oxide resist patterning with electrical field guided post-exp...

Method for preparing pixel define layer

Adaptive baking method

Substrate processing apparatus and substrate processing method

Quantum dot light-emitting device, manufacturing method and display...

Photoresist composition and method of forming photoresist pattern

Planarization method and photocurable composition

Integrated dry processes for patterning radiation photoresist patte...

Composition for forming silicon-containing resist underlayer film a...

Photoresist for semiconductor fabrication

Resin, photoresist composition, and method of manufacturing semicon...

Method for measuring critical dimension

Negative resist formulation for producing undercut pattern profiles

Method for measuring critical dimension

Photoresist development with halide chemistries

Apparatus and methods for beam processing of substrates

Stable solutions of monoalkyl tin alkoxides and their hydrolysis an...

Optical metalens systems

Composition for forming silicon-containing resist underlayer film a...

Method of manufacturing semiconductor devices

Ambient controlled two-step thermal treatment for spin-on coating l...

Resin, photoresist composition, and method of manufacturing semicon...

Chemical-resistant protective film-forming composition containing p...

Laminate, optical filter, solid image pickup element, image display...

Organometallic radiation patternable coatings with low defectivity...

Carboxylate, quencher, resist composition and method for producing...

Substrate processing apparatus, estimation method of substrate proc...

Photoresist structure, patterned deposition layer, semiconductor ch...

Method for manufacturing a horological component and component prod...

Abnormality detection device of chemical solution, liquid processin...

Patents Applicationslast 30 patents

PATTERNED LOW MELTING GLASS (LMG) PHOTONIC FILM SURFACES BY WET-ETC...

COMPOSITION

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS USIN...

SPIN-ON CARBON HARD MASK COMPOSITION WITH HIGH PLANARIZATION PERFOR...

Composition For Forming Organic Film, Method For Forming Organic Fi...

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD USING T...

Optical Metalens Systems and Methods of Manufacture

BLOCK COPOLYMER

RESIST UNDERLAYER FILM-FORMING COMPOSITION

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING TERMINATED PO...

STABLE SOLUTIONS OF MONOALKYL TIN ALKOXIDES AND THEIR HYDROLYSIS AN...

LIGHT PATTERNABLE SURFACE MODIFICATION

PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES

APPARATUS AND METHODS FOR BEAM PROCESSING OF SUBSTRATES

PATTERNED DARK MIRROR COATINGS FOR MULTI-FUNCTIONAL OPTICS

CHEMICALLY SELECTIVE ADHESION AND STRENGTH PROMOTERS IN SEMICONDUCT...

PHOTOLITHOGRAPHY METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR D...

Compound For Forming Metal-Containing Film, Composition For Forming...

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

METAL CONTAINING PHOTORESIST DEVELOPER COMPOSITION, AND METHOD OF F...

COMPOSITION FOR REMOVING EDGE BEADS FROM METAL-CONTAINING RESISTS,...

SEMICONDUCTOR DEVICE AND METHODS OF MANUFACTURE

METHOD OF FORMING PATTERNS

SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD

METHOD OF FORMING PATTERNS

AMBIENT CONTROLLED TWO-STEP THERMAL TREATMENT FOR SPIN-ON COATING L...

RESIN, PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING SEMICON...

POSITIVE TYPE PHOTORESIST COMPOSITION, METHOD OF FORMING PHOTORESIS...

PHOTORESIST FOR SEMICONDUCTOR FABRICATION

BOTTOM ANTIREFLECTIVE COATING MATERIALS