Finishing the coated layer

Industry

CPC
G03F7/168

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/168Finishing the coated layer

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Pattern formation methods
- Patent number 12,228,859
- Issue date Feb 18, 2025
- Rohm and Haas Electronic Materials LLC
- Choong-Bong Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Solution, solution storage body, actinic ray-sensitive or radiation...
- Patent number 12,228,857
- Issue date Feb 18, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating composition for forming resist underlayer film for EUV lith...
- Patent number 12,228,858
- Issue date Feb 18, 2025
- DuPont Specialty Materials Korea Ltd.
- Jae Hwan Sim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming an enhanced unexposed photoresist layer
- Patent number 12,222,644
- Issue date Feb 11, 2025
- ASM IP Holding B.V.
- Jan Willem Maes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing a semiconductor device and pattern formatio...
- Patent number 12,222,643
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Cheng Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photoresist composition and method of forming photoresist pattern
- Patent number 12,222,647
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Chih Ho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Display device and manufacturing method thereof
- Patent number 12,218,153
- Issue date Feb 4, 2025
- Au Optronics Corporation
- Wen-Ching Sung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for drying wafer and method for drying wafer
- Patent number 12,216,408
- Issue date Feb 4, 2025
- Samsung Electronics Co., Ltd.
- Sangjine Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Material for forming organic film, method for forming organic film,...
- Patent number 12,215,221
- Issue date Feb 4, 2025
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Metal-compound-removing solvent and method in lithography
- Patent number 12,210,286
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for preparing pixel define layer
- Patent number 12,207,498
- Issue date Jan 21, 2025
- DUK SAN NEOLUX CO., LTD.
- Hyunsang Cho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal oxide resist patterning with electrical field guided post-exp...
- Patent number 12,204,246
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Huixiong Dai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Adaptive baking method
- Patent number 12,196,491
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzung-Chen Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,198,961
- Issue date Jan 14, 2025
- Tokyo Electron Limited
- Tsuyoshi Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Quantum dot light-emitting device, manufacturing method and display...
- Patent number 12,193,254
- Issue date Jan 7, 2025
- BOE Technology Group Co., Ltd.
- Wenhai Mei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition and method of forming photoresist pattern
- Patent number 12,189,287
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Li-Po Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Planarization method and photocurable composition
- Patent number 12,179,231
- Issue date Dec 31, 2024
- Canon Kabushiki Kaisha
- Toshiki Ito
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Integrated dry processes for patterning radiation photoresist patte...
- Patent number 12,183,604
- Issue date Dec 31, 2024
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 12,174,541
- Issue date Dec 24, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photoresist for semiconductor fabrication
- Patent number 12,153,346
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Cheng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin, photoresist composition, and method of manufacturing semicon...
- Patent number 12,135,502
- Issue date Nov 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Siao-Shan Wang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for measuring critical dimension
- Patent number 12,130,559
- Issue date Oct 29, 2024
- NANYA TECHNOLOGY CORPORATION
- Chia-Chung Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative resist formulation for producing undercut pattern profiles
- Patent number 12,124,166
- Issue date Oct 22, 2024
- Merck Patent GmbH
- Anupama Mukherjee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for measuring critical dimension
- Patent number 12,117,733
- Issue date Oct 15, 2024
- NANYA TECHNOLOGY CORPORATION
- Chia-Chung Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist development with halide chemistries
- Patent number 12,105,422
- Issue date Oct 1, 2024
- Lam Research Corporation
- Samantha Siamhwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and methods for beam processing of substrates
- Patent number 12,105,423
- Issue date Oct 1, 2024
- Tokyo Electron Limited
- Mirko Vukovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stable solutions of monoalkyl tin alkoxides and their hydrolysis an...
- Patent number 12,105,418
- Issue date Oct 1, 2024
- Inpria Corporation
- Kai Jiang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Optical metalens systems
- Patent number 12,092,791
- Issue date Sep 17, 2024
- Imagia, Inc.
- Gregory Kress
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 12,085,857
- Issue date Sep 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of manufacturing semiconductor devices
- Patent number 12,087,580
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Wei Liao
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR PREPARING PIXEL DEFINE LAYER
- Publication number 20250063896
- Publication date Feb 20, 2025
- Hye Jung CHOI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD
- Publication number 20250051501
- Publication date Feb 13, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Minoru Adegawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS
- Publication number 20250051604
- Publication date Feb 13, 2025
- Samsung SDI Co., Ltd.
- Sunghwan KIM
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POST DEVELOPMENT TREATMENT FOR METAL-OXIDE PHOTORESISTS
- Publication number 20250053086
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- MADHUR SACHAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR USING COMPOSITION COMPRISING ORGANIC ACID COMPOUND, LITH...
- Publication number 20250044695
- Publication date Feb 6, 2025
- Merck Patent GmbH
- Tomotsugu YANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR REMOVING EDGE BEAD FROM METAL CONTAINING RESISTS, D...
- Publication number 20250044696
- Publication date Feb 6, 2025
- Samsung SDI Co., Ltd.
- Taeho KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM DEPOSITION METHOD, METHOD FOR MANUFACTURING DEVICE, AND FILM D...
- Publication number 20250044699
- Publication date Feb 6, 2025
- Riken
- Harumi Hayakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICAL-RESISTANT PROTECTIVE FILM-FORMING COMPOSITION HAVING CATEC...
- Publication number 20250034427
- Publication date Jan 30, 2025
- NISSAN CHEMICAL CORPORATION
- Shun KUBODERA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method For Forming Resist Underlayer Film And Patterning Process
- Publication number 20250036029
- Publication date Jan 30, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY COMPOSITIONS AND METHODS FOR FORMING RESIST PATTERNS AN...
- Publication number 20250036023
- Publication date Jan 30, 2025
- The Research Foundation for the State University of New York
- Munsaf Ali
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250036024
- Publication date Jan 30, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition For Forming Resist Underlayer Film, Patterning Process,...
- Publication number 20250028246
- Publication date Jan 23, 2025
- Shin-Etsu Chemical Co., Ltd.
- Kenta ISHIWATA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERNED LOW MELTING GLASS (LMG) PHOTONIC FILM SURFACES BY WET-ETC...
- Publication number 20250019293
- Publication date Jan 16, 2025
- Corning Incorporated
- Leonard Charles Dabich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION
- Publication number 20250021000
- Publication date Jan 16, 2025
- Merck Patent GmbH
- Seishi SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS USIN...
- Publication number 20250021025
- Publication date Jan 16, 2025
- Samsung Electronics Co., Ltd.
- Youngho HWANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SPIN-ON CARBON HARD MASK COMPOSITION WITH HIGH PLANARIZATION PERFOR...
- Publication number 20250013154
- Publication date Jan 9, 2025
- YCCHEM CO., LTD.
- Su Jin LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition For Forming Organic Film, Method For Forming Organic Fi...
- Publication number 20250011623
- Publication date Jan 9, 2025
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD USING T...
- Publication number 20250014915
- Publication date Jan 9, 2025
- Samsung Electronics Co., Ltd.
- SANGJINE PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical Metalens Systems and Methods of Manufacture
- Publication number 20250012944
- Publication date Jan 9, 2025
- Imagia, Inc.
- Gregory Kress
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLOCK COPOLYMER
- Publication number 20250004372
- Publication date Jan 2, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Kazuaki EBISAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20250004367
- Publication date Jan 2, 2025
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING TERMINATED PO...
- Publication number 20240427246
- Publication date Dec 26, 2024
- NISSAN CHEMICAL CORPORATION
- Tomotada HIROHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STABLE SOLUTIONS OF MONOALKYL TIN ALKOXIDES AND THEIR HYDROLYSIS AN...
- Publication number 20240427237
- Publication date Dec 26, 2024
- INPRIA CORPORATION
- Kai Jiang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
LIGHT PATTERNABLE SURFACE MODIFICATION
- Publication number 20240427240
- Publication date Dec 26, 2024
- Brewer Science, Inc.
- Reuben T. Chacko
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
- Publication number 20240419078
- Publication date Dec 19, 2024
- LAM RESEARCH CORPORATION
- Samantha SiamHwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHODS FOR BEAM PROCESSING OF SUBSTRATES
- Publication number 20240419080
- Publication date Dec 19, 2024
- TOKYO ELECTRON LIMITED
- Mirko Vukovic
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNED DARK MIRROR COATINGS FOR MULTI-FUNCTIONAL OPTICS
- Publication number 20240419076
- Publication date Dec 19, 2024
- The Aerospace Corporation
- Sean C. STUART
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY SELECTIVE ADHESION AND STRENGTH PROMOTERS IN SEMICONDUCT...
- Publication number 20240419079
- Publication date Dec 19, 2024
- Geminatio, Inc.
- Brennan Peterson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR D...
- Publication number 20240411227
- Publication date Dec 12, 2024
- Korea Advanced Institute of Science and Technology
- Sung Gap Im
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20240402596
- Publication date Dec 5, 2024
- Shin-Etsu Chemical Co., Ltd.
- Shohei IWAMORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Finishing the coated layer

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Pattern formation methods

Solution, solution storage body, actinic ray-sensitive or radiation...

Coating composition for forming resist underlayer film for EUV lith...

Method of forming an enhanced unexposed photoresist layer

Method of manufacturing a semiconductor device and pattern formatio...

Photoresist composition and method of forming photoresist pattern

Display device and manufacturing method thereof

Apparatus for drying wafer and method for drying wafer

Material for forming organic film, method for forming organic film,...

Metal-compound-removing solvent and method in lithography

Method for preparing pixel define layer

Metal oxide resist patterning with electrical field guided post-exp...

Adaptive baking method

Substrate processing apparatus and substrate processing method

Quantum dot light-emitting device, manufacturing method and display...

Photoresist composition and method of forming photoresist pattern

Planarization method and photocurable composition

Integrated dry processes for patterning radiation photoresist patte...

Composition for forming silicon-containing resist underlayer film a...

Photoresist for semiconductor fabrication

Resin, photoresist composition, and method of manufacturing semicon...

Method for measuring critical dimension

Negative resist formulation for producing undercut pattern profiles

Method for measuring critical dimension

Photoresist development with halide chemistries

Apparatus and methods for beam processing of substrates

Stable solutions of monoalkyl tin alkoxides and their hydrolysis an...

Optical metalens systems

Composition for forming silicon-containing resist underlayer film a...

Method of manufacturing semiconductor devices

Patents Applicationslast 30 patents

METHOD FOR PREPARING PIXEL DEFINE LAYER

RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD

HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS

POST DEVELOPMENT TREATMENT FOR METAL-OXIDE PHOTORESISTS

METHOD FOR USING COMPOSITION COMPRISING ORGANIC ACID COMPOUND, LITH...

COMPOSITION FOR REMOVING EDGE BEAD FROM METAL CONTAINING RESISTS, D...

FILM DEPOSITION METHOD, METHOD FOR MANUFACTURING DEVICE, AND FILM D...

CHEMICAL-RESISTANT PROTECTIVE FILM-FORMING COMPOSITION HAVING CATEC...

Method For Forming Resist Underlayer Film And Patterning Process

LITHOGRAPHY COMPOSITIONS AND METHODS FOR FORMING RESIST PATTERNS AN...

Compound For Forming Metal-Containing Film, Composition For Forming...

Composition For Forming Resist Underlayer Film, Patterning Process,...

PATTERNED LOW MELTING GLASS (LMG) PHOTONIC FILM SURFACES BY WET-ETC...

COMPOSITION

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS USIN...

SPIN-ON CARBON HARD MASK COMPOSITION WITH HIGH PLANARIZATION PERFOR...

Composition For Forming Organic Film, Method For Forming Organic Fi...

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD USING T...

Optical Metalens Systems and Methods of Manufacture

BLOCK COPOLYMER

RESIST UNDERLAYER FILM-FORMING COMPOSITION

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING TERMINATED PO...

STABLE SOLUTIONS OF MONOALKYL TIN ALKOXIDES AND THEIR HYDROLYSIS AN...

LIGHT PATTERNABLE SURFACE MODIFICATION

PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES

APPARATUS AND METHODS FOR BEAM PROCESSING OF SUBSTRATES

PATTERNED DARK MIRROR COATINGS FOR MULTI-FUNCTIONAL OPTICS

CHEMICALLY SELECTIVE ADHESION AND STRENGTH PROMOTERS IN SEMICONDUCT...

PHOTOLITHOGRAPHY METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR D...

Compound For Forming Metal-Containing Film, Composition For Forming...