Finishing the coated layer

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/168Finishing the coated layer

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Patents Grantslast 30 patents

Information Patent Grant
Solvent annealing of an organic planarization layer
- Patent number 12,362,168
- Issue date Jul 15, 2025
- International Business Machines Corporation
- Jing Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stabilized interfaces of inorganic radiation patterning composition...
- Patent number 12,360,454
- Issue date Jul 15, 2025
- Inpria Corporation
- Brian J. Cardineau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist system and method
- Patent number 12,353,134
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hung-Jui Kuo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Flow cell coating methods
- Patent number 12,353,136
- Issue date Jul 8, 2025
- Illumina, Inc.
- Neil Brahma
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,347,683
- Issue date Jul 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jing Hong Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a master for a replication process
- Patent number 12,346,024
- Issue date Jul 1, 2025
- AMS-OSRAM ASIA PACIFIC PTE. LTD.
- Ji Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for treating substrate
- Patent number 12,334,386
- Issue date Jun 17, 2025
- Semes Co., Ltd.
- Kiwon Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatment condition setting method, storage medium, and substrate t...
- Patent number 12,314,023
- Issue date May 27, 2025
- Tokyo Electron Limited
- Takuya Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Storage container storing treatment liquid for manufacturing semico...
- Patent number 12,313,976
- Issue date May 27, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer composition, and method of forming patterns using...
- Patent number 12,313,974
- Issue date May 27, 2025
- Samsung SDI Co., Ltd.
- Jaeyeol Baek
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Treatment liquid and pattern forming method
- Patent number 12,306,538
- Issue date May 20, 2025
- FUJIFILM Corporation
- Hideaki Tsubaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organotin patterning materials with ligands having silicon/germaniu...
- Patent number 12,298,666
- Issue date May 13, 2025
- Inpria Corporation
- Robert E. Jilek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition and method of forming photoresist pattern
- Patent number 12,300,487
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chen-Yu Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated dry processes for patterning radiation photoresist patte...
- Patent number 12,278,125
- Issue date Apr 15, 2025
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organotin oxide hydroxide patterning compositions, precursors, and...
- Patent number 12,276,913
- Issue date Apr 15, 2025
- Inpria Corporation
- Stephen T. Meyers
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Bubble defect reduction
- Patent number 12,248,252
- Issue date Mar 11, 2025
- Lam Research Corporation
- Akhil N. Singhal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for treating substrate
- Patent number 12,235,581
- Issue date Feb 25, 2025
- Semes Co., Ltd.
- Min Jung Park
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Pattern formation methods
- Patent number 12,228,859
- Issue date Feb 18, 2025
- Rohm and Haas Electronic Materials LLC
- Choong-Bong Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Solution, solution storage body, actinic ray-sensitive or radiation...
- Patent number 12,228,857
- Issue date Feb 18, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating composition for forming resist underlayer film for EUV lith...
- Patent number 12,228,858
- Issue date Feb 18, 2025
- DuPont Specialty Materials Korea Ltd.
- Jae Hwan Sim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming an enhanced unexposed photoresist layer
- Patent number 12,222,644
- Issue date Feb 11, 2025
- ASM IP Holding B.V.
- Jan Willem Maes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing a semiconductor device and pattern formatio...
- Patent number 12,222,643
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Cheng Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photoresist composition and method of forming photoresist pattern
- Patent number 12,222,647
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Chih Ho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Display device and manufacturing method thereof
- Patent number 12,218,153
- Issue date Feb 4, 2025
- Au Optronics Corporation
- Wen-Ching Sung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for drying wafer and method for drying wafer
- Patent number 12,216,408
- Issue date Feb 4, 2025
- Samsung Electronics Co., Ltd.
- Sangjine Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Material for forming organic film, method for forming organic film,...
- Patent number 12,215,221
- Issue date Feb 4, 2025
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Metal-compound-removing solvent and method in lithography
- Patent number 12,210,286
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for preparing pixel define layer
- Patent number 12,207,498
- Issue date Jan 21, 2025
- DUK SAN NEOLUX CO., LTD.
- Hyunsang Cho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal oxide resist patterning with electrical field guided post-exp...
- Patent number 12,204,246
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Huixiong Dai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Adaptive baking method
- Patent number 12,196,491
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzung-Chen Wu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION, METHOD FOR MANUFACTURING RESIST FILM, AND METHO...
- Publication number 20250237949
- Publication date Jul 24, 2025
- Merck Patent GmbH
- Tetsumasa Takaichi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN AND METHOD...
- Publication number 20250231484
- Publication date Jul 17, 2025
- Sumitomo Chemical Company, Limited
- Masaru HATABE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SLANTED OPTICAL GRATINGS
- Publication number 20250224548
- Publication date Jul 10, 2025
- NIL TECHNOLOGY APS
- Niklas Hansson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOTIN OXIDE HYDROXIDE PATTERNING COMPOSITIONS, PRECURSORS, AND...
- Publication number 20250224680
- Publication date Jul 10, 2025
- INPRIA CORPORATION
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250226223
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EDGE BEAD REMOVAL METHOD, SUBSTRATE TREATMENT APPARATUS PERFORMING...
- Publication number 20250216787
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Sung Gyu LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BUBBLE DEFECT REDUCTION
- Publication number 20250216788
- Publication date Jul 3, 2025
- LAM RESEARCH CORPORATION
- Akhil N. Singhal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATERIALS AND METHODS FOR FORMING PATTERNED MASK ON SUBSTRATE
- Publication number 20250218775
- Publication date Jul 3, 2025
- TOKYO ELECTRON LIMITED
- Phillip D. Hustad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS THAT UTILIZE PHOTOSENSITIVE ORGANOMETALLIC OXIDES FORMED BY...
- Publication number 20250207247
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Kandabara Tapily
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PAINTING METHOD
- Publication number 20250208515
- Publication date Jun 26, 2025
- ASUSTEK COMPUTER INC.
- Guo-Lin YANG
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250208510
- Publication date Jun 26, 2025
- Shin-Etsu Chemical Co., Ltd.
- Shohei IWAMORI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250208506
- Publication date Jun 26, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250208512
- Publication date Jun 26, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250208509
- Publication date Jun 26, 2025
- Shin-Etsu Chemical Co., Ltd.
- Shohei IWAMORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYIMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITI...
- Publication number 20250188223
- Publication date Jun 12, 2025
- Fujifilm Electronic Materials U.S.A., Inc.
- Binod B. De
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PH...
- Publication number 20250189892
- Publication date Jun 12, 2025
- Fujifilm Electronic Materials U.S.A., Inc.
- Binod B. De
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF SMOOTHENING PROFILE OF PHOTORESIST
- Publication number 20250183034
- Publication date Jun 5, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jia-Lin WEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE COMPOSITION, METH...
- Publication number 20250172872
- Publication date May 29, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Daisuke Ojima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METAL-COMPOUND-REMOVING SOLVENT AND METHOD IN LITHOGRAPHY
- Publication number 20250172879
- Publication date May 29, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PREPARING PIXEL DEFINE LAYER
- Publication number 20250172871
- Publication date May 29, 2025
- DUK SAN NEOLUX CO., LTD.
- Hye Jung CHOI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
DEVELOPER TOLERANCE RESIST UNDERLAYER COMPOSITION AND METHOD FOR MA...
- Publication number 20250172876
- Publication date May 29, 2025
- Merck Patent GmbH
- Hiroshi Yanagita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
REVERSIBLE OVERCOAT COMPOSITIONS
- Publication number 20250172877
- Publication date May 29, 2025
- TOKYO ELECTRON LIMITED
- Charlotte Cutler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN
- Publication number 20250164881
- Publication date May 22, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Chih HO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250155800
- Publication date May 15, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FILM FORMING METHOD, ARTICLE MANUFACTURING METHOD AND FILM FORMING...
- Publication number 20250157817
- Publication date May 15, 2025
- Canon Kabushiki Kaisha
- MASAHIRO TAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROTECTIVE FILM FORMING COMPOSITION
- Publication number 20250155813
- Publication date May 15, 2025
- NISSAN CHEMICAL CORPORATION
- Satoshi KAMIBAYASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
APPARATUS FOR DRYING WAFER AND METHOD FOR DRYING WAFER
- Publication number 20250155816
- Publication date May 15, 2025
- Samsung Electronics Co., Ltd.
- Sangjine PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GENERATE 3D PHOTORESIST PROFILES USING DIGITAL LITHOGRAPHY
- Publication number 20250155797
- Publication date May 15, 2025
- Applied Materials, Inc.
- Chi-Ming TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250155801
- Publication date May 15, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTE...
- Publication number 20250155799
- Publication date May 15, 2025
- Samsung SDI Co., Ltd.
- Soobin LIM
- H01 - BASIC ELECTRIC ELEMENTS

Finishing the coated layer

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Solvent annealing of an organic planarization layer

Stabilized interfaces of inorganic radiation patterning composition...

Photoresist system and method

Flow cell coating methods

Method of manufacturing a semiconductor device

Method of manufacturing a master for a replication process

Apparatus and method for treating substrate

Treatment condition setting method, storage medium, and substrate t...

Storage container storing treatment liquid for manufacturing semico...

Resist underlayer composition, and method of forming patterns using...

Treatment liquid and pattern forming method

Organotin patterning materials with ligands having silicon/germaniu...

Photoresist composition and method of forming photoresist pattern

Integrated dry processes for patterning radiation photoresist patte...

Organotin oxide hydroxide patterning compositions, precursors, and...

Bubble defect reduction

Method and apparatus for treating substrate

Pattern formation methods

Solution, solution storage body, actinic ray-sensitive or radiation...

Coating composition for forming resist underlayer film for EUV lith...

Method of forming an enhanced unexposed photoresist layer

Method of manufacturing a semiconductor device and pattern formatio...

Photoresist composition and method of forming photoresist pattern

Display device and manufacturing method thereof

Apparatus for drying wafer and method for drying wafer

Material for forming organic film, method for forming organic film,...

Metal-compound-removing solvent and method in lithography

Method for preparing pixel define layer

Metal oxide resist patterning with electrical field guided post-exp...

Adaptive baking method

Patents Applicationslast 30 patents

RESIST COMPOSITION, METHOD FOR MANUFACTURING RESIST FILM, AND METHO...

RESIST COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN AND METHOD...

SLANTED OPTICAL GRATINGS

ORGANOTIN OXIDE HYDROXIDE PATTERNING COMPOSITIONS, PRECURSORS, AND...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

EDGE BEAD REMOVAL METHOD, SUBSTRATE TREATMENT APPARATUS PERFORMING...

BUBBLE DEFECT REDUCTION

MATERIALS AND METHODS FOR FORMING PATTERNED MASK ON SUBSTRATE

METHODS THAT UTILIZE PHOTOSENSITIVE ORGANOMETALLIC OXIDES FORMED BY...

PAINTING METHOD

Compound For Forming Metal-Containing Film, Composition For Forming...

Compound For Forming Metal-Containing Film, Composition For Forming...

Compound For Forming Metal-Containing Film, Composition For Forming...

Compound For Forming Metal-Containing Film, Composition For Forming...

POLYIMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITI...

POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PH...

METHOD OF SMOOTHENING PROFILE OF PHOTORESIST

CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE COMPOSITION, METH...

METAL-COMPOUND-REMOVING SOLVENT AND METHOD IN LITHOGRAPHY

METHOD FOR PREPARING PIXEL DEFINE LAYER

DEVELOPER TOLERANCE RESIST UNDERLAYER COMPOSITION AND METHOD FOR MA...

REVERSIBLE OVERCOAT COMPOSITIONS

PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN

RESIST COMPOSITION AND PATTERN FORMING PROCESS

FILM FORMING METHOD, ARTICLE MANUFACTURING METHOD AND FILM FORMING...

PROTECTIVE FILM FORMING COMPOSITION

APPARATUS FOR DRYING WAFER AND METHOD FOR DRYING WAFER

GENERATE 3D PHOTORESIST PROFILES USING DIGITAL LITHOGRAPHY

RESIST COMPOSITION AND PATTERN FORMING PROCESS

SEMICONDUCTOR PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTE...