Finishing the coated layer

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/168Finishing the coated layer

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Patents Grantslast 30 patents

Information Patent Grant
Photoresist for semiconductor fabrication
- Patent number 12,153,346
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Cheng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin, photoresist composition, and method of manufacturing semicon...
- Patent number 12,135,502
- Issue date Nov 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Siao-Shan Wang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for measuring critical dimension
- Patent number 12,130,559
- Issue date Oct 29, 2024
- NANYA TECHNOLOGY CORPORATION
- Chia-Chung Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative resist formulation for producing undercut pattern profiles
- Patent number 12,124,166
- Issue date Oct 22, 2024
- Merck Patent GmbH
- Anupama Mukherjee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for measuring critical dimension
- Patent number 12,117,733
- Issue date Oct 15, 2024
- NANYA TECHNOLOGY CORPORATION
- Chia-Chung Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist development with halide chemistries
- Patent number 12,105,422
- Issue date Oct 1, 2024
- Lam Research Corporation
- Samantha Siamhwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and methods for beam processing of substrates
- Patent number 12,105,423
- Issue date Oct 1, 2024
- Tokyo Electron Limited
- Mirko Vukovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stable solutions of monoalkyl tin alkoxides and their hydrolysis an...
- Patent number 12,105,418
- Issue date Oct 1, 2024
- Inpria Corporation
- Kai Jiang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Optical metalens systems
- Patent number 12,092,791
- Issue date Sep 17, 2024
- Imagia, Inc.
- Gregory Kress
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 12,085,857
- Issue date Sep 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of manufacturing semiconductor devices
- Patent number 12,087,580
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Wei Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ambient controlled two-step thermal treatment for spin-on coating l...
- Patent number 12,087,592
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chen-Fong Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resin, photoresist composition, and method of manufacturing semicon...
- Patent number 12,085,855
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Siao-Shan Wang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemical-resistant protective film-forming composition containing p...
- Patent number 12,077,633
- Issue date Sep 3, 2024
- NISSAN CHEMICAL CORPORATION
- Takafumi Endo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Laminate, optical filter, solid image pickup element, image display...
- Patent number 12,078,828
- Issue date Sep 3, 2024
- FUJIFILM Corporation
- Shunsuke Kitajima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organometallic radiation patternable coatings with low defectivity...
- Patent number 12,072,626
- Issue date Aug 27, 2024
- Inpria Corporation
- Benjamin L. Clark
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Carboxylate, quencher, resist composition and method for producing...
- Patent number 12,060,316
- Issue date Aug 13, 2024
- Sumitomo Chemical Company, Limited
- Katsuhiro Komuro
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Substrate processing apparatus, estimation method of substrate proc...
- Patent number 12,051,587
- Issue date Jul 30, 2024
- Tokyo Electron Limited
- Hiroshi Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist structure, patterned deposition layer, semiconductor ch...
- Patent number 12,040,188
- Issue date Jul 16, 2024
- Tencent Technology (Shenzhen) Company Limited
- Wenlong Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing a horological component and component prod...
- Patent number 12,037,695
- Issue date Jul 16, 2024
- Nivarox-Far S.A.
- Pierre Cusin
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Abnormality detection device of chemical solution, liquid processin...
- Patent number 12,032,294
- Issue date Jul 9, 2024
- Tokyo Electron Limited
- Masato Hayashi
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Organotin patterning materials with ligands having silicon/germaniu...
- Patent number 12,032,291
- Issue date Jul 9, 2024
- Inpria Corporation
- Robert E. Jilek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist material and patterning process
- Patent number 12,032,287
- Issue date Jul 9, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-morphology block co-polymer films and processes for their pre...
- Patent number 12,024,604
- Issue date Jul 2, 2024
- Yissum Research Development Company of the Hebrew University of Jerusalem Ltd.
- Roy Shenhar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film-forming composition that contains triaryldia...
- Patent number 12,025,916
- Issue date Jul 2, 2024
- NISSAN CHEMICAL CORPORATION
- Hirokazu Nishimaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film manufacturing equipment and method of manufacturing film
- Patent number 12,017,248
- Issue date Jun 25, 2024
- BEYOND MANUFACTURE INC.
- Chun-Hao Luo
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Photosensitive material and method of lithography
- Patent number 12,019,375
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polymer material, composition, and method of manufacturing semicond...
- Patent number 12,018,107
- Issue date Jun 25, 2024
- Kioxia Corporation
- Koji Asakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coloring composition, color filter, pattern forming method, solid-s...
- Patent number 12,019,369
- Issue date Jun 25, 2024
- FUJIFILM Corporation
- Shoichi Nakamura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of reducing undesired light influence in extreme ultraviolet...
- Patent number 12,013,641
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
- Publication number 20240419078
- Publication date Dec 19, 2024
- LAM RESEARCH CORPORATION
- Samantha SiamHwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHODS FOR BEAM PROCESSING OF SUBSTRATES
- Publication number 20240419080
- Publication date Dec 19, 2024
- TOKYO ELECTRON LIMITED
- Mirko Vukovic
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNED DARK MIRROR COATINGS FOR MULTI-FUNCTIONAL OPTICS
- Publication number 20240419076
- Publication date Dec 19, 2024
- The Aerospace Corporation
- Sean C. STUART
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY SELECTIVE ADHESION AND STRENGTH PROMOTERS IN SEMICONDUCT...
- Publication number 20240419079
- Publication date Dec 19, 2024
- Geminatio, Inc.
- Brennan Peterson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR D...
- Publication number 20240411227
- Publication date Dec 12, 2024
- Korea Advanced Institute of Science and Technology
- Sung Gap Im
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20240402596
- Publication date Dec 5, 2024
- Shin-Etsu Chemical Co., Ltd.
- Shohei IWAMORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20240402600
- Publication date Dec 5, 2024
- Sumitomo Chemical Company, Limited
- Saki KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METAL CONTAINING PHOTORESIST DEVELOPER COMPOSITION, AND METHOD OF F...
- Publication number 20240393694
- Publication date Nov 28, 2024
- Samsung SDI Co., Ltd.
- Hyungrang MOON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR REMOVING EDGE BEADS FROM METAL-CONTAINING RESISTS,...
- Publication number 20240393698
- Publication date Nov 28, 2024
- Samsung SDI Co., Ltd.
- Si-Kyun PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE AND METHODS OF MANUFACTURE
- Publication number 20240393685
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsing-Chieh Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING PATTERNS
- Publication number 20240393684
- Publication date Nov 28, 2024
- Samsung SDI Co., Ltd.
- Jongpil HO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD
- Publication number 20240385524
- Publication date Nov 21, 2024
- SEMES CO., LTD.
- Hee Man AHN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PATTERNS
- Publication number 20240385515
- Publication date Nov 21, 2024
- Samsung SDI Co., Ltd.
- Gyeonghun PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AMBIENT CONTROLLED TWO-STEP THERMAL TREATMENT FOR SPIN-ON COATING L...
- Publication number 20240387188
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chen-Fong Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIN, PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING SEMICON...
- Publication number 20240377739
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Siao-Shan WANG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE TYPE PHOTORESIST COMPOSITION, METHOD OF FORMING PHOTORESIS...
- Publication number 20240377740
- Publication date Nov 14, 2024
- Samsung Electronics Co., Ltd.
- Jooyoung Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST FOR SEMICONDUCTOR FABRICATION
- Publication number 20240377732
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Cheng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BOTTOM ANTIREFLECTIVE COATING MATERIALS
- Publication number 20240377743
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien-Chih Chen
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS
- Publication number 20240376342
- Publication date Nov 14, 2024
- Samsung SDI Co., Ltd.
- Seil CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ORGANOMETALLIC RADIATION PATTERNABLE COATINGS WITH LOW DEFECTIVITY...
- Publication number 20240369923
- Publication date Nov 7, 2024
- INPRIA CORPORATION
- Benjamin L. Clark
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE PHOTORESIST COMPOSITION, NEGATIVE PHOTORESIST PATTERN LITH...
- Publication number 20240369927
- Publication date Nov 7, 2024
- Advanced Echem Materials Company Limited
- Kuo Chu Yeh
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR REMOVING EDGE BEAD FROM METAL-CONTAINING RESISTS, A...
- Publication number 20240369935
- Publication date Nov 7, 2024
- Samsung SDI Co., Ltd.
- Hyungrang MOON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING ETCHING MASK PATTERN, AND RESIN COMPOSITIO...
- Publication number 20240361686
- Publication date Oct 31, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
THINNER COMPOSITION, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICES...
- Publication number 20240361693
- Publication date Oct 31, 2024
- Mitsubishi Gas Chemical Company, Inc.
- Takumi OKADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SELECTING PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR P...
- Publication number 20240361697
- Publication date Oct 31, 2024
- Resonac Corporation
- Yuki IMAZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
- Publication number 20240361696
- Publication date Oct 31, 2024
- LAM RESEARCH CORPORATION
- Samantha SiamHwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, ESTIMATION METHOD OF SUBSTRATE PROC...
- Publication number 20240355617
- Publication date Oct 24, 2024
- TOKYO ELECTRON LIMITED
- Hiroshi Nakamura
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING R...
- Publication number 20240345479
- Publication date Oct 17, 2024
- Sumitomo Chemical Company, Limited
- Yukako ANRYU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOTIN PATTERNING MATERIALS WITH LIGANDS HAVING SILICON/GERMANIU...
- Publication number 20240337941
- Publication date Oct 10, 2024
- INPRIA CORPORATION
- Robert E. Jilek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A Lithographic Printing Plate Precursor
- Publication number 20240337942
- Publication date Oct 10, 2024
- AGFA Offset BV
- Hubertus Van Aert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Finishing the coated layer

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Photoresist for semiconductor fabrication

Resin, photoresist composition, and method of manufacturing semicon...

Method for measuring critical dimension

Negative resist formulation for producing undercut pattern profiles

Method for measuring critical dimension

Photoresist development with halide chemistries

Apparatus and methods for beam processing of substrates

Stable solutions of monoalkyl tin alkoxides and their hydrolysis an...

Optical metalens systems

Composition for forming silicon-containing resist underlayer film a...

Method of manufacturing semiconductor devices

Ambient controlled two-step thermal treatment for spin-on coating l...

Resin, photoresist composition, and method of manufacturing semicon...

Chemical-resistant protective film-forming composition containing p...

Laminate, optical filter, solid image pickup element, image display...

Organometallic radiation patternable coatings with low defectivity...

Carboxylate, quencher, resist composition and method for producing...

Substrate processing apparatus, estimation method of substrate proc...

Photoresist structure, patterned deposition layer, semiconductor ch...

Method for manufacturing a horological component and component prod...

Abnormality detection device of chemical solution, liquid processin...

Organotin patterning materials with ligands having silicon/germaniu...

Resist material and patterning process

Multi-morphology block co-polymer films and processes for their pre...

Resist underlayer film-forming composition that contains triaryldia...

Film manufacturing equipment and method of manufacturing film

Photosensitive material and method of lithography

Polymer material, composition, and method of manufacturing semicond...

Coloring composition, color filter, pattern forming method, solid-s...

Method of reducing undesired light influence in extreme ultraviolet...

Patents Applicationslast 30 patents

PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES

APPARATUS AND METHODS FOR BEAM PROCESSING OF SUBSTRATES

PATTERNED DARK MIRROR COATINGS FOR MULTI-FUNCTIONAL OPTICS

CHEMICALLY SELECTIVE ADHESION AND STRENGTH PROMOTERS IN SEMICONDUCT...

PHOTOLITHOGRAPHY METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR D...

Compound For Forming Metal-Containing Film, Composition For Forming...

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

METAL CONTAINING PHOTORESIST DEVELOPER COMPOSITION, AND METHOD OF F...

COMPOSITION FOR REMOVING EDGE BEADS FROM METAL-CONTAINING RESISTS,...

SEMICONDUCTOR DEVICE AND METHODS OF MANUFACTURE

METHOD OF FORMING PATTERNS

SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD

METHOD OF FORMING PATTERNS

AMBIENT CONTROLLED TWO-STEP THERMAL TREATMENT FOR SPIN-ON COATING L...

RESIN, PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING SEMICON...

POSITIVE TYPE PHOTORESIST COMPOSITION, METHOD OF FORMING PHOTORESIS...

PHOTORESIST FOR SEMICONDUCTOR FABRICATION

BOTTOM ANTIREFLECTIVE COATING MATERIALS

HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS

ORGANOMETALLIC RADIATION PATTERNABLE COATINGS WITH LOW DEFECTIVITY...

POSITIVE PHOTORESIST COMPOSITION, NEGATIVE PHOTORESIST PATTERN LITH...

COMPOSITION FOR REMOVING EDGE BEAD FROM METAL-CONTAINING RESISTS, A...

METHOD FOR MANUFACTURING ETCHING MASK PATTERN, AND RESIN COMPOSITIO...

THINNER COMPOSITION, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICES...

METHOD FOR SELECTING PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR P...

PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES

SUBSTRATE PROCESSING APPARATUS, ESTIMATION METHOD OF SUBSTRATE PROC...

SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING R...

ORGANOTIN PATTERNING MATERIALS WITH LIGANDS HAVING SILICON/GERMANIU...

A Lithographic Printing Plate Precursor