Claims
- 1. A process for forming a positive pattern with a radiation comprising the steps of:
- (1) applying on a substrate a resist comprising a copolymer composed of 100 moles of methyl methacrylate and 1 to 15 moles of methacrylic acid and a cross-linking agent having the following general formula: ##STR8## wherein R is H or CH.sub.3, x is an integer of 1 to 9, and y and z are zero, or an integer of 1, 2 or 3,
- (2) cross-linking the copolymer with the cross-linking agent by heating,
- (3) irradiating the desired area with a radiation and then
- (4) developing the latent image formed in the resist with the radiation with an organic solvent.
- 2. A process according to claim 1 wherein the cross-linking of the copolymer with the cross-linking agent is carried out at a temperature of 100.degree. to 170.degree. C.
Priority Claims (1)
Number |
Date |
Country |
Kind |
52-138574 |
Nov 1977 |
JPX |
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Parent Case Info
This is a continuation, of application Ser. No. 960,770, filed Nov. 15, 1978 now abandoned.
US Referenced Citations (5)
Continuations (1)
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Number |
Date |
Country |
Parent |
960770 |
Nov 1978 |
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