Claims
- 1. A process for fabricating a device, said process comprising the steps of forming a resist layer on a substrate, exposing said resist to actinic radiation in a desired pattern, and developing said pattern after said exposure, wherein said resist comprises an acid generating material that generates an acid upon said exposure to induce a solubility change in said resist characterized in that said acid generating material comprises a material represented by the formula: ##STR10## where x is either zero or one; A is an aromatic cyclic, a carbonyl containing moiety, or cyano moiety, and R.sub.1, R.sub.2, R.sub.3, and R.sub.5 are chosen so that said acid is stable and where R.sub.1, R.sub.2, R.sub.3, and R.sub.5 are individually either hydrogen or lower alkyl or substituted lower alkyl.
- 2. The process of claim 1 wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.5 are all hydrogen.
- 3. The process of claim 1 wherein A is phenyl or naphthyl.
- 4. The process of claim 3 wherein A is substituted with a halogen.
- 5. The process of claim 3 wherein A is substituted with methoxy.
- 6. The process of claim 1 wherein said acid interacts with an acid sensitive material.
- 7. The process of claim 1 wherein A is substituted by a moiety chosen to be acid labile so that said acid generating material also functions as an acid sensitive material.
Parent Case Info
This application is a continuation of application Ser. No. 07/702,564, filed on May 20, 1991 now abandoned.
US Referenced Citations (4)
Non-Patent Literature Citations (1)
Entry |
Lin, B. J., Journal of Vacuum Science and Technology, vol. 12, p. 1317 (1975). |
Continuations (1)
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Number |
Date |
Country |
Parent |
702564 |
May 1991 |
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