This invention relates to MEMS inertial instruments, including gyroscopes and accelerometers.
Micro-electro-mechanical systems (MEMS) gyroscopes and accelerometers, such as disclosed in U.S. Pat. Nos. 6,725,719 and 6,859,751, are generally planar instruments. Due to their very small size, and materials and methods of construction, such MEMS inertial instruments are relatively sensitive to ambient temperature and other environmental factors. These sensitivities makes them relatively unstable. Accordingly, it has been necessary to extensively test such instruments under a variety of conditions in order to develop a priori compensation schemes that can then be built into systems employing such instruments. This testing is time consuming and expensive, and also may not anticipate every possible condition that the instrument may be exposed to, which can lead to errors.
The G2-Gyroscope is a Coriolis gyroscope where the drive and output sense motions are angular oscillations. Its structure is generally planar and composed of two members: a Gyro Member and a Drive Member. The Gyro Member is the gyro. The Drive Member supports the Gyro Member above the substrate and is used to oscillate the Gyro Member about the Drive Axis, without applying direct actuation to the Gyro Member. Under rotation rate input, the Gyro Member responds by oscillating about the Output Axis (orthogonal to the Drive Axis). The Input Axis and Drive Axis are orthogonal to each other and lie in the plane of the gyroscope. The Output Axis is aligned normal to the plane. An attribute of this design is that the Gyro Member can be made symmetric about the Output Axis and therefore reduce sensitivity to cross-axis rotation rate inputs. By using the Drive Member to indirectly drive the Gyro Member, error torques are minimized.
The inventive G2-Gyroscope design is a planar MEMS instrument that is suited for integration into a planar MEMS Inertial Measurement Unit (IMU) whereby gyroscopes and accelerometers, formed onto a single substrate, sense all six-degrees-of-freedom. The G2-Gyroscope is also operational on its own.
This invention relates to designs of the G2-Gyroscope with built-in scale factor measurement capability.
This invention further relates to planar G2-Gyroscope designs with built-in scale factor measurement capability capable of being fabricated with MEMS processing technologies.
This invention further relates to the symmetry of the Gyro Member about the Output Axis to reduce sensitivity to cross-axis rotation rates.
This invention further relates to the indirect drive of the Gyro Member through a Drive Member (DM), to which the Gyro Member is attached. The purpose is to minimize unwanted drive of the Gyro Member about the Output Axis (quadrature source).
This invention further relates to the components of the design and how they provide functionality to operate the gyroscope with built-in scale factor measurement capability.
This invention also relates to the alternate design where the Gyro Member is larger and driven directly to oscillate about the Drive Axis. The larger size of the Gyro Member increases gyroscope sensitivity. In this case, the member that supports the gyro member relative to the substrate is not driven, and thus is not really a “Drive Member.” This member may thus be generally termed, for some preferred embodiments, a “support member.”
This invention also relates to the operation of the G2-Gyroscope with built-in scale factor measurement capability. Although the gyroscope can be operated with any set of Drive Member and Gyro Member (also referred to as Inner Member) natural frequencies, the sensitivity is improved as the difference between them (offset) is reduced. Operation with an offset of zero is the most sensitive and represents a special case.
This invention also relates to the monolithic construction of the gyro with built-in scale factor measurement capability to minimize structural instability. The structure is electrically connected to ground.
This invention relates primarily to the addition of mechanisms to MEMS (Micro-Electro-Mechanical Systems) gyroscopes and accelerometers that enable the measurement of their scale factor (sensitivity). The scale factor measurement can also be referred to as the calibration of the instrument sensitivity.
This invention also relates to the ability to measure scale factor at any time or continuously, including during the period of instrument operation. This capability eliminates the need to conduct extensive testing to fully calibrate the instrument at every state of the environment so that compensation algorithms may be used to correct the instrument during operation. This capability also considers that the calibrations may not remain correct over time.
This invention helps to maintain the accuracy of the MEMS instrument and greatly reduce the cost of calibrations.
The invention contemplates the addition of a gimbal or another structure to MEMS instrument designs that enable the application of a known, reference input motion. The gimbals or the other structures are the mechanisms. For the gyro, the reference motion is a rotation rate about its Input Axis: the motion can be applied with a rotary scale factor gimbal. For the accelerometer, the reference motion is an acceleration along its Input Axis: the motion can be applied with a linear shuttle. The scale factor is the ratio of measured instrument response to the amplitude of the reference input motion.
The reference input motion can be applied as a pulse or as a repetitive waveform of either finite duration or continuous. The repetitive motion/waveform is characterized by its shape, amplitude and repetition frequency. A simple and practical motion is a sinusoid. The frequency selected depends on the dynamics of the vehicle and instrument and the signal processing requirements.
The preferred alignment for the gyro Input Axis and the scale factor gimbal rotation axis is for them to be collinear so that only a rotational reference motion need be applied in order to produce a response in the gyro. This requirement is built-into the designs since the motion mechanisms are integrated with the instrument. Where a separate structure or platform is used, a proper alignment needs to be obtained.
Ultimately the accuracy of the scale factor measurement depends on the stability of the input reference motion. The scale factor measurement will account for changes in output pick-off sensitivity and changes in the mechanical response of the instrument to the input motion.
An embodiment of the invention is described with respect to the G-2 gyroscope design, a planar MEMS instrument. The G2-gyroscope is a single degree of freedom instrument having three orthogonal axes: Input Axis, Output Axis and Drive Axis.
One embodiment of the invention comprises the G2-gyroscope integrated with a rotary gimbal, which when actuated, applies a rotation rate to the gyroscope. The scale factor rotary gimbal can be actuated with capacitive plates located below the gimbal. Its motion can be measured with a second set of capacitive plates. An electronic control circuit can be used to hold the amplitude of the motion constant.
This invention relates to the application of a reference input rotation rate to the G2-Gyroscope.
The invention also relates to the application of a reference rotation rate input to other MEMS and non-MEMS gyroscopes and accelerometers.
This invention also relates to the collinear alignment of the gyro Input Axis with the scale factor rotary gimbal axis of rotation so that only rotary motion is applied.
A preferred sinusoidal reference input rotation rate is applied about the gyroscope Input Axis. The ratio of the gyro response about its Output Axis and the applied reference input rotation rate is the scale factor.
For a linear accelerometer, in which the proof mass moves along the input axis, the scale factor mechanism can be a shuttle integrated with the accelerometer. Preferably, a sinusoidal reference acceleration is applied. The ratio of the response amplitude to the amplitude of the input acceleration is the scale factor.
For a pendulous accelerometer in which the output is a rotation in the plane, a shuttle can also be used. For a pendulous accelerometer in which the output is normal to the plane, a rotary gimbal can be used to apply the reference acceleration.
This invention can accomplish measurement of the scale factor continuously or only in periods of duration, as commanded by the system.
The amplitude of the reference input motion can be increased to increase the response. The amplitude of the reference input motion can be changed to measure the non-linearity of the instrument response to input motion. In the test laboratory, the non-linearity can be measured by adding a fixed reference input motion with increasing rotation rates applied by a test table.
Other objects, features and advantages will occur to those skilled in the art from the following descriptions of the preferred embodiments, and the accompanying drawings, in which:
Design Guidelines
The design of one preferred embodiment of the invention incorporates:
The G2-Gyro structure is based on two nested members that oscillate in angle about orthogonal axes defined by two sets of flexures as shown in
Equation of Motion
Analysis is used to derive the equation of motion for the Gyro Member when the Drive Member is oscillated at some frequency and amplitude as the Case undergoes rotation in inertial space. The resultant equation of motion is given by
where
IGM: GM moment of inertia about the o-axis (Output Axis)
DGM: GM damping
KGM: GM flexure stiffness (spring constant)
θrotation angle of the GM relative to the DM
φ: DM rotation angle relative to the case
Ωa, Ωb, Ωc: rotation rates of the case in inertial space about three axes
ΔI=Ii−Is: difference of GM inertias about the i-axis and s-axis
φ={tilde over (φ)}sin(ωt): DM oscillatory angular motion
{dot over (φ)}=ω{tilde over (φ)}cos(ωt): rate of DM angular motion
To the left of the equals sign are included the torque terms dependent on inertia, damping and stiffness as well as a nonlinear (fourth) term dependent on GM angle squared. The stiffness (third) term is given by
The stiffness term includes a constant flexure stiffness, KGM, and a component dependent on vehicle rotation rates, Ωa,Ωb,Ωc, DM drive frequency, ω, and a factor referred to as the tuning inertia, ΔI.
On the right of the equals sign are given terms that drive the GM. They include a gyroscope torque due to rotation rate about the Input Axis and others due to case rotation about cross-axes that are coupled by the tuning inertia. They are respectively:
From the equation of motion, the gyroscope operation is simplified by making the GM symmetric about the o-axis (Output Axis) so that ΔI=0. The resultant equation of motion becomes
IGM{umlaut over (θ)}+DGM{dot over (θ)}+KGMθ=IGMΩa{tilde over (φ)}ω cos ωt (3)
The interpretation is that of a simple harmonic GM oscillator driven externally by a gyroscopic torque that results from the oscillatory motion of the DM and input rotation rate. Rewriting the GM EOM in the “Standard Form”, we get
where ωGM is the GM natural frequency.
The solution describes the oscillatory motion of the GM in response to gyroscope input rotation rate, and is given by
θ(t)={tilde over (θ)} sin(ωt−εGM) (7)
where {tilde over (θ)} is the GM oscillatory amplitude and εGM is the GM oscillation phase relative to the gyroscopic drive.
These solutions can be plotted to obtain the Transfer Functions or Bode of the GM. Note that the response is also dependent on the DM amplitude, which also varies with angular frequency (the GM is coupled to the DM).
Practical Gyroscope Case—Offset Operation
For the practical gyroscope, the DM is driven at resonance to minimize the drive voltage and to maximize the DM oscillation amplitude. The GM response then depends on the GM and DM natural frequencies (note that the DM comprises the gyro disk for purposes of calculating the DM inertia about the Drive Axis and the DM natural frequency). The maximum DM amplitude and phase at resonance are given by
is the torque applied by the capacitive actuator. The GM responses for amplitude and phase for GM and DM natural frequencies are
Matched Frequency Case: Zero Offset
The maximum sensitivity is obtained for the case in which the DM and GM resonances are matched, ωDM=ωGM. The output per rotation rate input (Scale Factor) then is given by
The output amplitude is dependent directly on the GM inertia, inversely with damping and directly with DM oscillation amplitude. A vacuum is necessary to develop the proper damping. In this case, it can readily be seen that the gyro sensitivity scales with size and inversely with damping.
General Offset Description
Gyro sensitivity is dependent on the separation (offset) between the GM and DM natural frequencies. In
G2-Gyro Requirements
The DM is driven at some frequency and amplitude about the Drive Axis. When the gyro is rotated about the Input Axis (orthogonal to both the Drive Axis and Output Axis), the GM responds with an oscillation amplitude that is proportional to the Input Rotation Rate. Demodulation of the oscillatory output with a reference waveform at the same frequency and with the appropriate phase generates a gyro output DC voltage proportional to the Input Rotation Rate.
G2-Gyro Quadrature
A signal that is in “quadrature” with the gyro signal is an error signal generated by the improper operation of the gyroscope and the gyroscope design. Fortunately it is always out of phase by 90 degrees with the gyro signal and can be separated and filtered by proper demodulation. The phase of the demodulation reference waveform is to be controlled to prevent leakage of the quadrature signal into the gyro signal channel.
Mechanical Design
The mechanical design of one preferred embodiment of the inventive G2-Gyroscope 10 is shown in
The working gap between the gyro structure and the Pyrex substrate is 10 microns but the gap used depends on several factors: geometry, actuation capacity, sensitivity and fabrication constraints. The gap is fabricated by etching a well in the silicon and a well in the Pyrex.
The use of Pyrex is dependent on the need to anodically bond epitaxial silicon to a substrate as described below in the DWP process. Other processes are possible. It is preferred to use a substrate that has similar thermal characteristics to the device material, which in this case is silicon. An option is to also use silicon as the substrate for a close thermal match and to enable anodic bonding with a deposited Pyrex-equivalent film added to the substrate silicon. This would also preserve the electrical isolation between devices on the same substrate.
It is preferred for the device to be monolithic for mechanical stability and to connect it to electrical ground.
On the inside diameter of the GM is constructed a radial comb 30 for sensing the rotation of the GM. The comb teeth are aligned radially with the GM center of rotation. Four sets of mating combs are constructed on four separate quadrants fixed separately to the substrate that serve as stators for the moving comb rotor on the GM. By connecting the bonding pads to traces, the silicon structure is connected to electrical ground.
The gyro is driven by actuation of the DM about the Drive Axis 4. The Output Axis 5 is normal to the plane of the DM. The Input Axis 6 is orthogonal to the other two.
Rotary Comb Capacitive Sensor
The rotary comb design 30 is illustrated in
Neighboring quadrants 33, 34 are designed symmetrically about the axis that separates them as shown in
Alternate uses of the rotary comb are possible if one set of neighboring quadrants is connected for rotary sensing and the other set for actuation. One use is to test the operation of the Gyro Member separately. The second use is to cancel quadrature error by adding a counter motion of the Gyro Member.
Metallization Design of the G2-Gyroscope
The metallization design 50 is shown in
Trace 57 connects capacitive plates 53, 54 to pad 58, for example.
Stators of the rotary comb are connected to pads with traces 59 that are crimped between the stator structure and the Pyrex substrate during anodic bonding. The monolithic gyro structure containing the GM and DM is connected to pads by traces 63, 64 crimped between the mounting structures 61, 62 and the Pyrex substrate. The preferred electrical connection of the gyro structure is to ground.
Traces are also capacitive sensing plates when they are located beneath the moving structure and this needs to be taken into consideration. A rule is to make the lengths under the moving parts equal and symmetric. Pick-up between plates and traces is also a consideration. The usual design practices apply. Electrical pick-up can be a source of quadrature in the gyro output.
Flexures
The purposes of flexures are to:
The orientational alignment between members is an especially important consideration for the gyroscope because misalignment introduces mechanical coupling between the DM oscillation and the Gyro Member and will generate quadrature error.
The ideal flexure allows only motion about one axis in the dynamic environment.
The support capability is especially important when considering shock capability. It depends on the masses of the members and the spring stiffness of the flexures. Modeling is used to identify the strain on the flexures. A maximum strain level less than one tenth the fracture limit is a good condition to set.
DM Flexure Relief Structure
The stress relief absorbs the tension on the flexure that is due to the differential thermal contraction as the Pyrex and silicon cool from the elevated anodic bonding temperature. The stress can cause a potato-chip deformation of the DM that affects the GM suspended from it.
IM Flexure
The W-flexure enables rotation of the GM about the axis normal to the plane. Four are used in this design. Each W-flexure is composed of two bending U-flexures with a stress relief in each. For cases where the DM applies a tension or compression to the W-flexure, the stress relief can bend and absorb the stress. In this way, the flexure does not kink and inhibit rotation of the GM.
The G2-Out Gyroscope 70,
Mechanical Design of the G2-Out Gyroscope
The mechanical design of the G2-Out gyro embodiment of the invention is described with
The ring structure 73 is connected to the disk 80 with two torsional flexures 82, 83. These flexures allow oscillation of the GM about the Drive Axis.
Metallization Design of the G2-Out Gyroscope
The metallization design is similar to that of the G2-Gyro. Plates located beneath the GM disk are used to actuate and sense the motion of the disk about the Drive Axis. Unlike the G2-Gyro, however, the GM is driven directly by the actuator plates. This can lead to direct drive of the disk about the Output Axis (quadrature error). The benefit is that the disk of the G2-Out Gyro is much larger, allowing for greater sensitivity since the inertia is greater.
The metallization design 90 is shown in
Trace 97 connects capacitive plates 91, 92 to pad 98, for example.
Stators of the rotary comb are connected to pads with traces 99 that are crimped between the stator structure and the Pyrex substrate during anodic bonding. The monolithic gyro structure is connected to pad 66 by trace 67 crimped between the mounting structure 72 and the Pyrex substrate. The preferred electrical connection of the monolithic gyro structure is to ground.
Traces are in themselves capacitive sensing plates when they are located beneath the moving structure and this needs to be taken into consideration. A rule is to make the lengths under the moving parts equal and symmetric. Pick-up between plates is also a consideration. The usual design practices apply. Electrical pick-up can be a source of quadrature in the gyro output.
G2-Out Gyro Operation
For the operation of the G2-Out Gyro, the GM is oscillated about the Drive Axis. With Input Rate applied about the Input Axis, the GM disk also oscillates about the Output Axis. The rotary comb sensor measures the output motion of the GM.
The preferred electronics for the various embodiments of the invention can be described schematically with
Input rotation rate generates an oscillation of the Gyro Member about the Output Axis with an amplitude that is proportional to the rotation rate. By demodulating the AC output signal with a reference waveform, the gyro output is converted to a DC voltage that is proportional to rotation rate. The gyroscope is operated open-loop.
Dissolved Wafer Processing
Dissolved Wafer Processing (DWP) is a MEMS fabrication process for making relatively large parts with good flatness and square profiles. The process requires two wafers: the first Pyrex and the second silicon, with a Boron-doped epitaxial layer. The combination of materials enables the two wafers to be anodically bonded. The thickness of the epitaxy determines the final device thickness, while Boron doping of the epitaxial layer inhibits EDP etching.
Typical dimensions include: device size of about 3 mm in the plane, device thickness of 40 microns, smallest flexure thickness of 5 microns and gaps between comb fingers of 5 microns.
Four process masks are needed: two for processing the silicon and two for the Pyrex. Instrument functions are distributed between the two layers: the mechanical structure and stator comb components are fabricated in the doped silicon layer and the electrical connections and flat capacitive plate components are deposited onto the Pyrex layer.
Process Steps
The process steps are described with
Advantages/Disadvantages of DWP
DWP has several advantages:
A particularly critical requirement is the formation of flexures with precise geometry having a rectangular cross-section. A small variation in the wall verticality can greatly affect the stiffness and hence the dynamics. A conical cross-section would also have the effect of changing the rotation axis of the GM, and perhaps the orthogonality between the DM and GM axes. This misalignment leads to “quadrature error” in gyroscopes.
Derivation of the Equation of Motion
The analysis prescribed by J. S. Ausman (G. R. Pitman, Jr., Editor, Inertial Guidance, University of California Engineering and Physical Sciences Extension Series, J. Wiley and Sons, Inc., New York, 1962, J. S. Ausman, ch. 3) for the gimbal structure of the Single-Degree-of-Freedom Gyroscope is applicable to the common structure of the G2-Gyro.
The fundamental equation applied is that the rate of change of angular momentum is equal to the applied torque:
This is Newton's second law in rotational form. In equation (15) (d
where
is the time derivative of
The GM angular momentum,
where ŝ is a unit vector in the s direction.
Calculate
Since the GM is mounted to the DM, which is mounted to the case, the angular velocity of the GM in inertial space is given by the angular velocity of the GM gimbal, measurable relative to the DM, plus the motion of the DM, measurable relative to the case, plus the motion of the case. This is expressible as a vector sum of the separate angular velocities
where θ, φ, γ are angles of rotation for the GM, DM and case (or vehicle) axes, respectively. {dot over (θ)} relates that the motion of the GM is only about the o-axis. Further, we expect that the motion of the DM will only be about the y-axis, therefore,
The motion of the vehicle is unconstrained in inertial space.
Since we are interested in the motion of the GM in the s,i,o frame, we need to convert the latter terms in equation (19). We know the relationship between the s,i,o and x,y,z frames is a rotation about the o-axis. We apply the rotational transformation:
{circumflex over (x)}=ŝ cos θ−î sin θ≅ŝ−îθ
ŷ=î cos θ+ŝ sin ≅î+ŝθ
{circumflex over (z)}=ô (20)
Since the GM is held at null, only small motions need to be considered, hence the small angle approximation is used.
We also know that the DM can only rotate about the y-axis, therefore the two axes are related by the rotational transformation:
â={circumflex over (x)} cos φ−{circumflex over (z)} sin φ≅{circumflex over (x)}−{circumflex over (z)}φ
{circumflex over (b)}=ŷ
ĉ={circumflex over (x)} sin φ+{circumflex over (z)} cos φ≅{circumflex over (x)}φ+{circumflex over (z)} (21)
The DM motion is also small hence the small angle approximation is again used. Substituting the rotations (20) and (21) into (19), we get
where
ωs=(θ{dot over (φ)}y+{dot over (γ)}a+θ{dot over (γ)}b+φ{dot over (γ)}c), ωi=({dot over (φ)}y−θ{dot over (γ)}a+{dot over (γ)}b−θφ{dot over (γ)}c), ωo=({dot over (θ)}−φ{dot over (γ)}a+{dot over (γ)}c) (23)
Calculate
The moment of inertia tensor for the GM is given by
assuming s, i, o are the principal axes of inertia for the GM. If s, i, o are not principal axes of inertia, it will generally be most convenient first to compute the vector components of
Multiplying equation (22) by the moment of inertia tensor (24), and substituting into equation (17) gives
Calculate
The expression
We will restrict ourselves to the o-axis solution since we will assume that motions of the GM about the other axes do not occur.
Calculate
to get the equation of motion.
Substituting for ωo, ωi, ωs and adding damping and spring terms to the motion of the GM, as well as the pendulous torque, we get the full GM Equation of Motion. The variables for the angles can change in rotational or oscillatory mode or both.
IGMo{umlaut over (θ)}+DGM{dot over (θ)}+└KGM+({dot over (φ)}y2+{dot over (φ)}y{dot over (γ)}b−{dot over (γ)}a2−φ{dot over (γ)}a{dot over (γ)}c+{dot over (φ)}y{dot over (γ)}b+{dot over (γ)}b2−φ{dot over (γ)}a{dot over (γ)}c−φ2{dot over (γ)}c2)ΔI┘θ−({dot over (φ)}y{dot over (γ)}a+φ{dot over (φ)}y{dot over (γ)}c+{dot over (γ)}a{dot over (γ)}b+φ{dot over (γ)}b{dot over (γ)}c)θ2=IGM
Note that: φ=φy, ΔIGM=IGM
θ GM rotation angle relative to the DM,
φ DM rotation angle relative to case,
γa, γb, γc case rotation angles.
Making substitutions for φ and {dot over (φ)}=ω{tilde over (φ)} cos ωt and {dot over (γ)}a=Ωa,{dot over (γ)}b=Ωb,{dot over (γ)}c=Ωc, we get the final form for the equation of motion with all the angular rotation dependences.
One inventive concept as applied to a MEMS gyro such as the G2 gyro described above is to apply a sinusoidal rotation rate about the gyro Input Axis and to measure the corresponding oscillatory output. The ratio of the amplitudes is the scale factor.
G2-Gyroscope with Scale Factor Rotary Gimbal:
The device design shown in
G2 gyroscope with scale factor rotary gimbal 102 according to the invention is attached with bonding pads 104, 105 to Pyrex substrate 106. A gap between gyroscope 102 and substrate 106 allows the gyroscope members to move. Scale factor rotary gimbal 108 is attached with two in-line torsional flexures 111, 112 to bonding pads 104 and 105, respectively: these two flexures are aligned with Gyro Input Axis 131. Gyro 114 is connected by way of gyro outer drive member 121 to scale factor rotary gimbal 108 with two in-line torsional flexures 115, 116: these two flexures are aligned with Drive Axis 141 of gyroscope 102. Inner member 118 is connected with four radial flexures 124, 125, 126, 127 to outer drive member 121. Inner member 118 oscillates about the Gyro Output Axis 51, which is normal to the plane. Radial comb pick-off 132 measures the gyro output response to input rotation rate.
Scale factor gimbal 108 is actuated to apply a reference input motion with a set of capacitive plates 134, 135. A second set of capacitive plates 136, 137 is part of the pick-off for sensing the motion of gimbal 108. The gimbal oscillation amplitude is kept constant with control circuitry.
A third set of capacitive plates 143, 144 is used to drive outer drive member 121. A fourth set of capacitive plates 146, 147 is part of the pick-off for sensing the motion of member 121.
G1-Gyroscope with Scale Factor Rotary Gimbal:
The structure is identical to the G2 gyroscope with scale factor rotary gimbal. The functionality of the scale factor rotary gimbal is the same. The roles of the innermost members are reversed. For the G1 gyroscope, the inner member is driven into oscillation by the rotary combs and the amplitude of the oscillation sensed and held constant with control circuitry. The gyroscope response to the same Input Axis is given by the oscillation of the gyro outer member. The axes of the oscillations are defined by the flexures. The inner member oscillates about the Drive Axis which is normal to the plane. The gyro outer member oscillates about the Output Axis, which is in the plane.
Other Planar Gyroscopes:
In addition to the G1 gyroscope and G2 gyroscope, the use of the scale factor rotary gimbal applies to other planar gyroscopes having the Input Axis in the plane. For those having the Input Axis normal to the plane, an in-plane rotary gimbal is used.
Linear Accelerometer with a Scale Factor Shuttle:
The linear accelerometer with shuttle 150 is shown in
The linear accelerometer 152 is flexurally mounted with its four flexures 172, 173, 174, 175 to the shuttle instead of to the substrate. The shuttle is then flexurally-mounted to the substrate with four flexures 176, 177, 178, 179 and four bonding pads 153, 154, 155, 156. Actuator comb drives 166, 167 mounted to the substrate and the shuttle are used to apply an oscillatory drive to the shuttle. Pick-off combs 168, 169 are used to sense the amplitude of the oscillatory motion applied to the shuttle. Accelerometer capacitive combs 162, 163, 164, 165 are used to measure the accelerometer response to the drive for obtaining the scale factor and the acceleration input.
Specific features of the invention are shown in some drawings and not others, but this is not a limitation of the invention, the scope of which is set forth in the following claims.
This application is a continuation in part of application Ser. No. 11/426,368 filed on Jun. 26, 2006, now U.S. Pat. No. 7,406,867 the disclosure of which is incorporated herein by reference. This application also claims priority of Provisional patent application Ser. No. 60/745,433, with a filing date of Apr. 24, 2006, the disclosure of which is incorporated herein by reference.
Number | Name | Date | Kind |
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5650568 | Greiff et al. | Jul 1997 | A |
6584864 | Greenwood | Jul 2003 | B2 |
6725719 | Cardarelli | Apr 2004 | B2 |
6859751 | Cardarelli | Feb 2005 | B2 |
7152474 | Deb et al. | Dec 2006 | B2 |
7549334 | Cardarelli | Jun 2009 | B2 |
Number | Date | Country | |
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20100024548 A1 | Feb 2010 | US |
Number | Date | Country | |
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60745433 | Apr 2006 | US |
Number | Date | Country | |
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Parent | 11426368 | Jun 2006 | US |
Child | 11739455 | US |