Number | Name | Date | Kind |
---|---|---|---|
4098618 | Crowder et al. | Jul 1978 | |
4728619 | Pfiester et al. | Mar 1988 | |
4743563 | Pfiester et al. | May 1988 | |
4748134 | Holland et al. | May 1988 | |
4847213 | Pfiester | Jul 1989 | |
4954459 | Avanzino et al. | Sep 1990 | |
5151381 | Liu et al. | Sep 1992 | |
5358894 | Fazan et al. | Oct 1994 | |
5707888 | Aronowitz et al. | Jan 1998 |
Number | Date | Country |
---|---|---|
59-104140 | Jun 1984 | JPX |
60-101947 | Jun 1985 | JPX |
63-280438 | Nov 1988 | JPX |
64-744 | Jan 1989 | JPX |
Entry |
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S.B. Felch et al., "Characterization of a Plasma Doping System," Proceedings of the Ninth International Conference on Ion Implantation Technology, Sep. 20-24, 1992. |
P.G. Carey et al., "Fabrication of Submicrometer MOSFET's Using Gas Immersion Laser Doping (GILD)," IEEE Electron Device Letters, vol. EDL-7, No. 7, Jul. 1986, p. 440. |