BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a plan view illustrating a structure of an electrostatic discharge protection transistor 50 of Embodiment 1 of the present invention.
FIGS. 2A through 2D are cross sections of the electrostatic discharge protection transistor 50 whose plan view is shown in FIG. 1, wherein FIG. 2A is a cross section taken along the line Ia-Ia′ of FIG. 1, FIG. 2B is a cross section taken along the line Ib-Ib′ of FIG. 1, FIG. 2C is a cross section taken along the line Ic-Ic′ of FIG. 1, and FIG. 2D is a cross section taken along the line Id-Id′ of FIG. 1.
FIGS. 3A through 3E are cross sections with which a fabrication method of a semiconductor device of Embodiment 1 is explained.
FIGS. 4A through 4D are cross sections with which a variation of the fabrication method of the semiconductor device of Embodiment 1.
FIG. 5 is a plan view illustrating a structure of an electrostatic discharge protection transistor 50a of Embodiment 2 of the present invention.
FIGS. 6A and 6B are cross sections of the electrostatic discharge protection transistor 50a whose plan view is shown in FIG. 5, wherein FIG. 6A is a cross section taken along the line Vb-Vb′ of FIG. 5, and FIG. 6B is a cross section taken along the line Vc-Vc′ of FIG. 5.
FIG. 7 is a plan view illustrating a structure of an electrostatic discharge protection transistor 50b of Embodiment 3 of the present invention.
FIG. 8 is a cross section taken along the line VIIb-VIIb′ of the electrostatic discharge protection transistor 50b whose plan view is shown in FIG. 7.
FIG. 9 is a plan view illustrating a structure of an electrostatic discharge protection transistor 50c of Embodiment 4 of the present invention.
FIG. 10 is a cross section taken along the line IXb-IXb′ of the electrostatic discharge protection transistor 50c whose plan view is shown in FIG. 9.
FIG. 11 is a plan view illustrating a structure of an electrostatic discharge protection transistor 50d of Embodiment 5 of the present invention.
FIG. 12 is a cross section taken along the line XIb-XIb′ of the electrostatic discharge protection transistor 50d whose plan view is shown in FIG. 11.
FIG. 13 is a plan view illustrating a structure of a conventional electrostatic discharge protection transistor 100.
FIGS. 14A through 14C are cross sections of the conventional electrostatic discharge protection transistor 100 whose plan view is shown in FIG. 13, wherein FIG. 14A is a cross section taken along the line XIIIa-XIIIa′ of FIG. 13, FIG. 14B is a cross section taken along the line XIIIb-XIIIb′ of FIG. 13, and FIG. 14C is a cross section taken along the line XIIIc-XIIIc′ of FIG. 13.