Semiconductor device fabrication equipment and method of using the same

Abstract

Semiconductor device fabrication equipment and a method of using the same minimize the total time that a wafer spends being transferred through the equipment and the number of times the wafer is transferred between respective parts of the equipment. The semiconductor fabrication equipment includes a first apparatus used for performing a first process on a wafer, a second apparatus linked in-line to the first apparatus and used for performing a second process consecutive to the first process with respect to the fabrication of a semiconductor device from the wafer, and a speed regulator connected to the first and second apparatuses. The speed regulator detects durations of the first and second processes, respectively, compares the durations, and makes a determination as to whether the duration of the first process is shorter than the duration of the second process. The speed regulator is also configured to adjust the speed at which the first process is executed when the duration of the first process is shorter than the duration of the second process.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

The foregoing and other objects, features and advantages of the invention will be apparent from the following detailed description of the preferred embodiments of the invention, as illustrated in the accompanying drawings. The drawings are not necessarily to scale, emphasis instead being placed upon illustrating the principles of the invention.

FIG. 1 is a schematic diagram of an embodiment of semiconductor device fabrication equipment in accordance with the present invention.

FIG. 2 is a block diagram of the semiconductor device fabrication equipment shown in FIG. 1.

FIG. 3 is a flowchart showing a fabrication method in accordance with the present invention.

FIG. 4 is a flowchart showing a fabrication method comprising photolithography in accordance with the present invention.

Claims

1. Fabrication equipment comprising: a first apparatus having a first process execution part that carries out a first process on a substrate;a second apparatus linked in-line to the first apparatus and comprising a unit that carries out a second process on the substrate, wherein the first and second processes are consecutive processes in the fabrication of a device from the substrate; anda speed regulator operatively connected to the first and second apparatuses to detect durations of the first and second processes, respectively, and configured to compare the durations and issue a control signal to the first apparatus that adjusts the speed at which the first process is executed when the duration of the first process is shorter than the duration of the second process.

2. The fabrication equipment according to claim 1, wherein the first process execution part comprises at least two units which each perform a step in the execution of the first process, and a robot having a working envelope that encompasses at least the two units and transfers a substrate from one of the two units to the other of the two units, and the speed regulator is operatively connected to the robot so as to control the timing by which the robot transfers a substrate.

3. The fabrication equipment according to claim 1, wherein the first apparatus is a spin-coating apparatus and first process execution part comprises a spin-coating unit having a rotary chuck, a source of photoresist, and a supply nozzle connected to the source of photoresist, and the second apparatus is an exposure apparatus and the unit of said exposure apparatus is an exposure unit that includes a light source, a substrate stage dedicated to support a substrate that is to be exposed, and a reticle stage dedicated to support a reticle bearing a pattern the image of which is to be transferred to a substrate supported by the substrate stage.

4. The fabrication equipment according to claim 3, wherein the first apparatus comprises a second process execution part that carries out a third process on the substrate, the second process execution part comprising a spin-coating unit having a rotary chuck, a source of a developing solution, and a supply nozzle connected to the source of developing solution.

5. The fabrication equipment according to claim 4, wherein the speed regulator is also operatively connected to the third apparatus to detect a duration of the third process, and is configured to compare the durations of the second and third processes and issue a control signal to the second apparatus that adjusts the speed at which the second process is executed when the duration of the second process is shorter than the duration of the third process.

6. Fabrication equipment comprising: a plurality of apparatuses linked in-line to one another to thereby form an automated production line, the apparatuses comprising at least three units in which consecutive processes are performed, respectively, on a substrate; anda speed regulator operatively connected to the apparatuses to detect durations of the consecutive processes, respectively, and configured to compare the durations and issue a control signal to the apparatus in which one of the processes is performed to adjust the speed at which said one of the processes is executed when the duration of said one of the processes is shorter than the duration of the process that is performed consecutively to said one of the processes.

7. The fabrication equipment according to claim 6, wherein the apparatuses each comprises at least two units which each perform a step in the execution of a respective one of the processes, and a robot having a working envelope that encompasses the at least the two units and transfers a substrate from at least one of the two units to another of the at least two units, and the speed regulator is operatively connected to the robots so as to control the timing by which the robots transfer substrates.

8. A fabrication method comprising: performing a first process on a substrate using a first processing apparatus;performing a second process, consecutive to the first process, on the substrate using a second processing apparatus linked to the first apparatus such that first and second processing apparatus are disposed in-line;detecting durations of the first and second processes, respectively, and comparing the durations; andmaking a determination as to whether the duration of the first process is shorter than the duration of the second process, and adjusting the speed at which the first process is executed when the duration of the first process is shorter than the duration of the second process.

9. The fabrication method according to claim 8, wherein the performing of the first process comprises performing respective steps of the first process in at least two units, and transferring the substrate from at least one of the units to another of the units, and and the adjusting of the speed at which the first process is executed comprises delaying the transfer of the substrate from said one of the units to the other of units

10. The fabrication method according to claim 8, wherein the adjusting of the speed at which the first process is executed comprises delaying the transfer of the substrate from one of the units of the first processing apparatus to the second processing apparatus.

11. The fabrication method according to claim 8, wherein the adjusting of the speed at which the first process is executed comprises controlling the first processing apparatus such that the duration of the first process is equal to the duration of the second process.

12. The fabrication method according to claim 8, wherein the first process comprises coating a wafer with photoresist, and the second process comprises exposing the wafer to light directed through a reticle.

13. The fabrication method according to claim 12, and further comprising a third process of developing the exposed wafer, detecting a duration of the third process, comparing the durations of the second and third processes, making a determination as to whether the duration of the second process is shorter than the duration of the third process, and adjusting the speed at which the second process is executed when the duration of the second process is shorter than the duration of the third process.

14. The fabrication method according to claim 13, wherein the adjusting of the speed at which the second process is executed comprises controlling the second processing apparatus such that the duration of the second process is equal to the duration of the third process.