The embodiments discussed herein are related to a semiconductor device, a method of manufacturing the same, an electronic device, and an electronic component.
Recently, electronic devices such as servers and personal computers have been remarkably developed in terms of advancements in speed, performance, and the like, and accordingly semiconductor elements such as CPU (Central Processing Unit) used in the electronic devices have been progressively increased in size.
As a mounting technology for semiconductor elements, flip chip mounting is known in which a semiconductor element in the form of bare chip is directly mounted on a wiring board with a solder hump.
Additionally, to scale up the fine electrode arrangement of semiconductor elements to the electrode arrangement of a wiring board, there is also a mounting method in a BGA (Ball Grid Array) approach in which a semiconductor package having a semiconductor element placed on an interposer is fabricated and mounted on a wiring board with a solder bump interposed therebetween. The semiconductor package for BGA approach is also called a BGA semiconductor package.
As illustrated in
On the other hand, the semiconductor package 5 includes second electrode pads 6 on a main surface thereof at positions facing the first electrode pads 2. Further, solder bumps 7 are bonded to the upper surfaces of the second electrode pads 6.
Then, while the solder bumps 7 are in contact with the solder paste 4, these are reflowed by heating. Thereby, the semiconductor package 5 is mounted on the wiring board 1 as illustrated in
Meanwhile, the semiconductor package 5 and wiring board 1 have different thermal expansion coefficients because of the difference in materials. Accordingly, as the semiconductor package 5 generates heat, stress is applied on the solder bumps 7 due to the difference in thermal expansion coefficient. The stress concentrates on portions of the solder bumps 7 where the diameter is the smallest, in other words, around bonded portions A between the electrode pads 2, 6 and the solder bumps 7.
As the power supply of the semiconductor package 5 is turned on and off repeatedly, the stress is repeatedly applied to the solder bumps 7 in the bonded portions A. Thus, metal fatigue gradually progresses at the solder bumps 7. Eventually, a crack is generated in the solder bumps 7, and the bonded. portions A may be fractured.
Patent Literature 1: Japanese Laid-open Patent Publication No. 05-114627
Patent Literature 2: International Publication Pamphlet No. WO 08/114434
Patent Literature 3: Japanese Laid-open Patent Publication No. 2001-118876
Patent Literature 4: Japanese Laid-open Patent Publication No. 08-236898
Patent Literature 5: Japanese National. Publication of International Patent Application No. 2005-510618
Non-patent Literature 1: Morita, Hayashi, Nakanishi, and Yoneda, “High Acceleration Test of Lead-free Solder”, 23rd Spring Lecture Meeting of Japan Institute of Electronics Packaging
According to an aspect of the following disclosure, there is provided a semiconductor device including: a wiring board including a first electrode pad on a surface thereof; a circuit board disposed to stand on the wiring board, and including an interconnection connected to the first electrode pad; and a semiconductor component disposed to face the wiring board with the circuit board interposed therebetween, and including a second electrode pad on a surface thereof, the second electrode pad being connected to the interconnection.
Moreover, according to another aspect of the disclosure, there is provided an electronic device including a semiconductor device mounted thereon, the semiconductor device including: a wiring board including a first electrode pad on a surface thereof; a circuit board disposed to stand on the wiring board, and including an interconnection connected to the first electrode pad; and a semiconductor component disposed. to face the wiring board with the circuit board interposed therebetween, and including a second electrode pad on a surface thereof, the second electrode pad being connected to the interconnection.
Further, according to another aspect of the disclosure, there is provided an electronic component including: a wiring board including a first electrode pad on a surface thereof; and a circuit board. disposed to stand. on the wiring board, and including an interconnection for connecting the first electrode pad to a second electrode pad of a semiconductor element to be mounted on the wiring board.
In addition, according to still another aspect of the disclosure, there is provided. a method. of manufacturing a semiconductor device, the method including: standing a circuit board on a wiring board including a first electrode pad on a surface thereof; connecting the first electrode pad to an interconnection of the circuit board; mounting a semiconductor component on the circuit board in such a manner that the semiconductor component faces the wiring board with the circuit board interposed therebetween; and connecting the interconnection of the circuit board to a second electrode pad disposed on a surface of the semiconductor component.
The object and advantages of the embodiments will be realized and attained by means of the elements and combinations particularly pointed out in the claims.
It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory and are not restrictive of the embodiments, as claimed.
Hereinafter, the present embodiments will be described in detail with reference to the attached drawings.
The flexible circuit board 30 has a flexible band-shaped resin base material 32 and interconnections 31 buried in the resin base material 32. The size of the resin base material 32 is not particularly limited. However, in this embodiment, the length L is approximately 40 mm and the width W is approximately 2 mm.
The interconnections 31 are formed to extend. in a short-side direction of the band-shaped resin base material 32. As the material of the interconnections 31, for example, copper is used.
A plurality of such interconnections 31 are formed in the resin base material 32 at intervals of approximately 1.27 mm. A slit 32b is formed in the resin base material 32 at a position between each adjacent two of the interconnections 31.
As illustrated in
The thickness T of the resin base material 32 combining these resin films 38, 39 is not particularly limited, but is approximately 0.1 mm in this embodiment.
Moreover, the resin base material 32 has openings 32a formed at portions approximately 0.5 mm from both ends of the interconnection 31, and end portions of the interconnection 31 are exposed from the openings 32a. Incidentally, surface treatment such as gold plating may be performed on the portions of the interconnection 31 exposed from the openings 32a to prevent oxidation and to improve bonding.
As illustrated in
Thereby, as illustrated in
Here, to prevent the flexible circuit boards 30 from varying in height, the depths of the slits 32b are preferably approximately half the width W of each flexible circuit board 30 (see
This semiconductor device 10 has a wiring board 11 and a semiconductor package 20 as a semiconductor component facing the wiring board 11 with the flexible circuit boards 30 interposed therebetween.
Among them, the wiring board 11 is a multilayer wiring board including interconnections 12 made of copper and insulating layers 13 made of a glass epoxy resin which. are alternately stacked. First electrode pads 14 made of copper are disposed on the surface of the uppermost layer of the wiring board 11.
Moreover, the semiconductor package 20 includes a semiconductor element 21 such as CPU mounted on an interposer 16, and a sealing resin 22 sealing the semiconductor element 21 and the interposer 16.
Among them, the interposer 16 is a multilayer wiring board including a plurality of interconnections 17 made of copper and insulating layers 18 made of a glass epoxy resin which are alternately stacked. The interposer 16 has second and third electrode pads 19, 24 made of copper on the surfaces of the lowermost layer and the uppermost layer thereof, respectively.
In addition, the semiconductor element 21 includes fourth electrode pads 25 made of copper. The fourth electrode pads 25 and the third electrode pads 24 of the interposer 16 are electrically and mechanically connected to each other with solder bumps 26.
Further, a heat sink 23 for efficiently dissipating heat generated from the semiconductor element 21 firmly adheres to the surface of the sealing resin 22. The heat sink 23 is made of a metal having a favorable thermal conductivity, for example, aluminum.
As illustrated in
Meanwhile,
As illustrated in
As illustrated in
Moreover, the portions of the interconnection 31 of the flexible circuit board 30 exposed from the openings 32a of the resin base material 32 are mechanically and electrically connected to the first and second electrode pads 14, 19 respectively with first and second connection media 41, 42 such as Sn-3Ag-0.5Cu solder interposed therebetween.
Such connections between the interconnection 31 and the connection media 41, 42 at the openings 32a increase the contact area between the interconnection 31 and the connection media 41, 42, and improve the connection reliability between the wiring board 11 and the semiconductor package 20 with the circuit boards 30 interposed therebetween, in comparison with a case where no opening 32a is provided.
Note that the connection media 41, 42 are not limited to solder and may be a conductive adhesive. Such a conductive adhesive is obtained by, for example, kneading a binder such as an epoxy resin, a urethane resin, a silicone resin, an acrylic resin, and a polyimide resin. with a conductive filler such as silver and copper.
By standing the flexible circuit boards 30 on the wiring board 11 in this manner, it may be possible to urge the flexible circuit boards 30 to deform in in-plane directions D of the wiring board 11 when the wiring board 11 or the semiconductor package 20 thermally expands as illustrated in
As illustrated in
In the semiconductor device 10 described above, the flexible circuit boards 30 are disposed between the wiring board 11 and the semiconductor package 20 as illustrated in
Accordingly, the flexible circuit boards 30 themselves deform to absorb the difference in thermal expansion between. the wiring board 11 and the semiconductor package 20 caused by heat generated from the semiconductor package 20. This may enable prevention of stress from concentrating on bonded portions between the flexible circuit boards 30 and the first and second electrode pads 14, 19. Hence, a risk of fracturing bonding between the interconnections 31 of the circuit boards 30 and the first and second electrode pads 14, 19 due to the concentration of stress is reduced. Thus, improvement in connection reliability between the circuit boards 30 and the semiconductor package 20 may be possible.
Particularly, in this embodiment, since the flexible circuit boards 30 are disposed. to stand on the wiring board 11, the flexible circuit boards 30 may be deformed in the in-plane directions D of the wiring board 11 as illustrated in
Next, a method of fabricating the flexible circuit board 30 will be described.
To fabricate the flexible circuit board 30, firstly, as illustrated in
Incidentally, as the material of the first resin film 38, a material other than polyimide, for example, epoxy, acrylic, phenol, or the like may be used.
Then, as illustrated in
Subsequently, the second resin film 39 having the openings 32a formed in advance is prepared as illustrated in
The material of the second resin film 39 is not particularly limited, and a film made of any one of polyimide, epoxy, acrylic, and phenol may be used as the second resin film.
In a case where the resin films 38, 39 are pasted on each other at low temperature, any one of epoxy, acrylic, and phenol described above is preferably used as the material of these resin films.
Moreover, the thickness of the second resin film 39 is not particularly limited, but is approximately 0.25 mm in this embodiment.
Thereafter, as illustrated in
As described with reference to
Note that, although the openings 32a are formed in both of the resin films 38, 39 in this example, the contact area between the interconnections 31 and the connection media 41, 42 may be increased even if the openings 32a are formed only in one of these resin films 38, 39.
After that, as illustrated in
Thereby, a basic structure of the stress-relaxing flexible circuit board 30 is completed.
In manufacturing the semiconductor device, a plurality of such flexible circuit boards 30 are fabricated, each of which is assembled into a lattice pattern as illustrated in
To manufacture the semiconductor device 10, firstly, as illustrated in
Incidentally, instead of such a printing method, solder balls may be mounted in advance as the first connection media 41 on the first electrode pads 14.
Then, as illustrated in
Thereafter, the solder in the first connection media 41 is reflowed by heating to a temperature at its melting point of 220° C. or higher.
After that, the first connection media 41 are cooled and solidified. Thereby, the interconnections 31 of the flexible circuit boards 30 are connected to the first electrode pads 14 with the first connection media 41 interposed therebetween. In addition, the flexible circuit boards 30 are temporarily fixed. onto the wiring board 11 by the first connection media 41.
Thus, an electronic component 40 is obtained in which the flexible circuit boards 30 are disposed to stand on the wiring board 11.
Subsequently, as illustrated in
Incidentally, instead of forming the second connection media 42 by the printing method, solder balls may be mounted as the second connection media 42 on the second electrode pads 19.
Thereafter, the solder in the second connection media 42 in this state is reflowed by heating to a temperature at its melting point of 220° C. or higher.
After that, the second connection media 42 are cooled and solidified. Thereby, the interconnections 31 of the flexible circuit boards 30 are connected to the second electrode pads 19 with the second connection media 42 interposed therebetween. In addition, the semiconductor package 20 is fixed onto the flexible circuit boards 30 by the second connection media 42.
Thereby, a basic structure of the semiconductor device according to the present embodiment is obtained.
Incidentally, although solder is used as the first and second connection media 41, 42 in the above description, a conductive adhesive may be used instead.
Further, in the above description, stress-absorbing flexible circuit boards 30 are placed between the semiconductor package 20 and the wiring board 11.
The positions where the circuit boards 30 are disposed are not limited thereto.
For example, as illustrated in an enlarged cross-sectional view of
In this case, solder or a conductive adhesive is provided in advance as the first and second connection media 41, 42 on the third and fourth electrode pads 24, 25. The circuit boards 30 are electrically and mechanically connected to the third and fourth electrode pads 24, 25 by the connection media 41, 42.
Thereby, the flexible circuit boards 30 may absorb the difference in thermal expansion between the semiconductor element 21 and the interposer 16, and the connection reliability between the semiconductor element 21 and the interposer 16 may be improved.
By standing the flexible circuit boards 30 on the semiconductor board 11 as described above in this embodiment, it may be possible to provide a semiconductor device having improved connection reliability between the wiring board 11 and the semiconductor component such as the semiconductor package 20 and the semiconductor element 21. Moreover, by mounting the semiconductor device on an electronic device such as a server or a personal computer, it may be possible to urge further advancement in performance of the electronic device.
The present embodiment is different from the first embodiment in how to assemble the flexible circuit board 30, and is the same as the first embodiment in the other points.
As illustrated in
As illustrated in
While formed spirally in this manner, even the single flexible circuit board 30 alone may crawl on all the first electrode pads 14. Thus, it may be no longer necessary to prepare a plurality of flexible circuit boards 30 nor to form slits 32b therein to assemble the circuit boards 30 as in the first embodiment. This facilitates processing of the flexible circuit board 30.
Furthermore, by bending the flexible circuit board 30 at appropriate positions, the flexible circuit board 30 may be allowed to crawl on the electrode pads 14 regardless of the planar layout of the first electrode pads 14. Thus, the versatility of the flexible circuit board 30 is enhanced.
The present embodiment is different from the first embodiment in how to assemble the flexible circuit board 30, and is the same as the first embodiment in the other points.
As illustrated in
When in use, these three flexible circuit boards 30 are assembled in directions of the arrows in the drawing.
In this embodiment, the slits 32b of the three flexible circuit boards 30 illustrated in
As illustrated in
Even in such a radial form, the flexible circuit boards 30 deform as in the first embodiment. Thereby, the flexible circuit boards 30 may absorb the difference in thermal expansion between the wiring board 11 and the semiconductor package 20, and the connection reliability between the wiring board 11 and the semiconductor package 20 may be improved.
In this embodiment, a study carried out by the inventors of the present application will be described. In the study, the flexible circuit boards 30 are disposed between the wiring board and the semiconductor package as in the first embodiment, and then it is examined that to what extent the connection reliability between the wiring board and the semiconductor package has been improved.
To fabricate the sample, firstly, as illustrated in
Among them, the package board 70 functions as a pseudo-semiconductor package in the study, and has first electrode pads 71 and second electrode pads 72 on the respective surfaces of a resin base material 74.
Moreover, the first and second electrode pads 71, 72 are connected to each other through via holes 74a formed in the resin base material 74.
Further, the flexible circuit boards 30 and the package board 70 are electrically and mechanically connected to each other with first connection media 75 such as solder interposed therebetween.
Here, in the study, among the plurality of interconnections 31 of the flexible circuit boards 30, interconnections 31 at right and left ends are connected to the first electrode pads 71, while the remaining interconnections 31 are not connected to the package board 70.
Then, as illustrated in
Next, as illustrated in
Thereafter, as illustrated in
Note that Sm-37Pb solder is used as the connection media 75, 87.
Thereby, a basic structure of a sample S is completed.
As illustrated in
Among these flexible circuit boards 30, two flexible circuit boards 30 disposed opposite to each other at upper and lower portions of the drawing are electrically and mechanically connected to both the package board 70 and the wiring board 80. The two flexible circuit boards 30 are connected to the package board 70 and the wiring board 80 at connection portions B respectively with the first and second connection media 75, 87 interposed therebetween as already mentioned.
Using such a sample S, the inventors of the present application examine the connection reliability in the following way.
In the study, the sample S is mounted on a support 90 with the package board 70 at the lower side of the sample S. The support 90 is provided with a recessed portion 90a. The flexible circuit boards 30 and the package board 70 are housed in the recessed portion 90a.
Then, using a piston 91 as in
The bending test is expected to be a method in which the lifetime of a bonded portion with respect to fatigue may be measured within a short period, in comparison with a temperature cycle test.
As illustrated in
In measuring the resistance value R, a voltage V generated between the third. and second electrode pads 83 and 72 is measured with a voltmeter 95, while a constant current I is caused to flow between one of the two first test pads 79 and one of the two second test pads 89 by a direct current generator 96. The resistance value R is obtained from R=V/I.
In the study, at the time when the resistance value R is increased higher than the initial value by 1% after the test is started, the connection portion B (see
Thus, it is supported that connecting the package board 70 and the wiring board 80 with the flexible boards 30 as in the sample S is effective in improving the connection reliability between the boards 70, 80.
All examples and conditional language recited herein are intended for pedagogical purposes to add the reader in understanding the invention and the concepts contributed by the inventor to furthering the art, and are to be construed as being without limitation to such specifically recited examples and conditions, nor does the organization of such examples in the specification relate to a showing of the superiority and inferiority of the invention. Although the embodiments of the present inventions have been described in detail, it should be understood that the various changes, substitutions, and alterations could be made hereto without departing from the spirit and scope of the invention.
Number | Date | Country | Kind |
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2009-069091 | Mar 2009 | JP | national |
This application is a continuation of the prior International Patent Application No. PCT/JP2009/067856, filed Oct. 15, 2009, the entire contents of which are incorporated herein by reference.
Number | Date | Country | |
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Parent | 13212467 | Aug 2011 | US |
Child | 15062477 | US |
Number | Date | Country | |
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Parent | PCT/JP2009/067856 | Oct 2009 | US |
Child | 13212467 | US |