This application is based upon and claims the benefit of priority from the prior Japanese Patent Application No. 2008-218743, filed on Aug. 27, 2008; the entire contents of which are incorporated herein by reference.
1. Field of the Invention
This invention relates to a resin-sealed semiconductor device.
2. Background Art
In a power semiconductor device, a semiconductor chip is attached onto a base plate and electrically connected to terminals held on a holder provided above the semiconductor chip, and a resin is filled between the base plate and the terminal holder. When using such a semiconductor device, the base plate is fixed to a heat-dissipating fin, for example, which is separately provided. On the other hand, the terminals are fixed to an electrical circuit section, for example, which is separately provided. Hence, a stress is applied between the base plate and the terminal holder.
In conventional semiconductor devices, this stress causes shear delamination at the interface between the holder and the sealing resin, which results in the problem of deteriorated reliability.
JP-A-11-238821 (Kokai) (1999) discloses a technique for a power semiconductor module in which a ceiling plate for resin sealing is engaged with the upper end portion of a resin casing.
According to an aspect of the invention, there is provided a semiconductor device including: a base plate; a semiconductor element provided on the base plate; a holder provided on an opposite side of the semiconductor element from the base plate and holding terminals electrically connected to the semiconductor element; a casing surrounding the semiconductor element and opposed to a side surface of the holder; and a sealing resin filled among the base plate, the casing, and the holder, the side surface of the holder being provided with a first protrusion protruding toward the casing, the first protrusion being nearer to the base plate than a major surface of the holder on an opposite side from the base plate, and a surface of the first protrusion on an opposite side from the base plate being at least partly buried in the sealing resin.
Embodiments of the invention will now be described in detail with reference to the drawings.
In the present specification and drawings, the same elements as those described previously with reference to earlier figures are labeled with like reference numerals, and the detailed description thereof is omitted as appropriate.
As shown in
The side surface 10a of the holder 10 is provided with a first protrusion 21 which protrudes toward the casing 9. The first protrusion 21 is nearer to the base plate 1 than the major surface 10b of the holder 10 on the opposite side from the base plate 1. The surface 21a of the first protrusion 21 on the opposite side from the base plate 1 is at least partly buried in the sealing resin 7.
Hence, because the upper surface (surface 21a) of the first protrusion 21 of the holder 10 is covered with the sealing resin 7, no delamination fracture occurs between the holder 10 and the sealing resin 7 at the interface between the holder 10 and the sealing resin 7.
Thus, delamination at the interface between the holder 10 and the sealing resin 7 is prevented.
In the following, the semiconductor device 110 illustrated in
As shown in
An insulating substrate 3 is provided on the base plate 1 via a solder 2. The insulating substrate 3 can illustratively include a ceramic plate 3a, a first circuit plate 3c provided on the base plate 1 side of the ceramic plate 3a, and a second circuit plate 3b provided on the opposite side of the ceramic plate 3a from the base plate 1. As illustrated in
A semiconductor element 5 is provided on the insulating substrate 3. The semiconductor element 5 is illustratively any of various power semiconductor elements such as a thyristor, diode, and transistor.
A wire 6 connected to one terminal of the semiconductor element 5, for example, is connected to one of the second circuit plates 3b, which is connected to one terminal 11. Another one of the second circuit plates 3b connected to the semiconductor element 5 is connected to another terminal 11. Although this figure shows two terminals 11, the number of terminals 11 is arbitrary.
The terminal 11 extends upward (away from the base plate 1) from the insulating substrate 3 and is held by the holder 10.
The side surface 10a of the holder 10 is provided with a first protrusion 21. The first protrusion 21 is nearer to the base plate 1 than the major surface 10b of the holder 10 on the opposite side from the base plate 1. The first protrusion 21 protrudes toward the casing 9.
The casing 9 is provided on the periphery of the base plate 1. The casing 9 is opposed to the side surface 10a of the holder 10.
Furthermore, a sealing resin 7 is provided among the base plate 1, the casing 9, and the holder 10. The upper surface and side surface of the insulating substrate 3, and the semiconductor element 5 are buried in the sealing resin 7.
The sealing resin 7 can illustratively include a first sealing resin 7a on the base plate 1 side and a second sealing resin 7b provided thereon. The first sealing resin 7a can be made of a silicone-based resin, which is highly insulative and chemically stable. The second sealing resin 7b can be made of an epoxy-based resin, which has high mechanical strength and moisture-proofness.
The semiconductor device 110 having the configuration as described above can be fabricated illustratively by placing the insulating substrate 3, the semiconductor element 5, the casing 9, and the holder 10 on the base plate 1 and then filling the sealing resin 7 (first sealing resin 7a and second sealing resin 7b) thereon.
In the semiconductor device 110 according to this embodiment, the side surface 10a of the holder 10 is provided with a first protrusion 21, and the surface 21a of the first protrusion 21 on the opposite side from the base plate 1 is covered with the sealing resin 7. Specifically, it is covered with the second sealing resin 7b having high mechanical strength. Hence, the protrusion 21 is caught by the sealing resin 7, avoiding delamination at the interface between the holder 10 and the base plate 1 even if a tensile force is applied between the holder 10 and the base plate 1.
Thus, delamination at the interface between the holder 10 and the sealing resin 7 is prevented.
As shown in
In the semiconductor device 90 having such configuration, application of a tensile stress to the terminal 11 results in application of stress to the holder 10 holding the terminal 11, which causes shear delamination at the interface between the holder 10 and the sealing resin 7 (specifically, the second sealing resin 7b).
More specifically, in tensile limit tests for the base plate 1 and the terminal 11, fracture occurred at one of the interface between the holder 10 and the sealing resin 7 and the interface between the casing 9 and the sealing resin 7. The shear delamination strength was low with large variation.
In the semiconductor device 90 of the comparative example, creep-up of the first sealing resin 7a may deteriorate adhesion between the holder 10 and the other members, which significantly decreases the shear delamination strength. Variation in the amount of creep-up results in increasing the variation in the shear delamination strength.
In contrast, in the semiconductor device 110 according to this embodiment, in tensile limit tests for the base plate 1 and the terminal 11, no fracture occurs at the interface between the holder 10 and the sealing resin 7, but fractures, if any, occur at the interface between the casing 9 and the sealing resin 7, or in the casing 9. In general, the fracture strength is higher at the interface between the casing 9 and the sealing resin 7 than at the interface between the holder 10 and the sealing resin 7, and the casing 9 also has high fracture strength.
Furthermore, in the semiconductor device 110 according to this embodiment, the creep-up prevention effect of the first protrusion 21 prevents the creep-up of the first sealing resin 7a, which otherwise deteriorates adhesion. Hence, the shear delamination strength, and its variation due to the creep-up of the first sealing resin 7a, are improved.
Hence, in the semiconductor device 110 according to this embodiment, as compared with the comparative example, fracture sites are limited, and variation in the shear delamination strength is reduced. The shear delamination strength is improved to a practically sufficient level by preventing fractures at the interface between the holder 10 and the sealing resin 7.
Thus, the semiconductor device 110 according to this embodiment can provide a semiconductor device in which delamination at the interface between the holder and the sealing resin is prevented.
In the case where the sealing resin 7 includes a first sealing resin 7a on the base plate 1 side and a second sealing resin 7b provided thereon, the surface 21a of the first protrusion 21 on the opposite side from the base plate 1 is at least partly buried in the second sealing resin 7b, that is, the resin having higher mechanical strength and moisture-proofness.
On the other hand, as illustrated in
On the other hand, in the technique disclosed in JP-A-11-238821, a ceiling plate for resin sealing is engaged with the upper end portion of a resin casing. However, because the ceiling plate is engaged with the resin casing, this technique requires high processing accuracy and complicates the manufacturing process, which remains to be a problem in practice.
As shown in
More specifically, in the semiconductor device 120 according to this embodiment, the casing 9 has a second protrusion 22 provided on the surface 9c of the casing 9 opposed to the holder 10, and the surface 22a of the second protrusion 22 on the opposite side from the base plate 1 is at least partly buried in the sealing resin 7.
Thus, a semiconductor device having higher mechanical strength can be realized.
For example, in the semiconductor device 120 having such configuration, in tensile limit tests for the base plate 1 and the terminal 11, no fracture occurs at the interface between the holder 10 and the sealing resin 7 and the interface between the casing 9 and the sealing resin 7, but fractures, if any, occur only in the casing 9.
Thus, because fracture sites are limited to only the casing 9, variation in the fracture strength is reduced. Furthermore, although the tensile strength in the comparative example is the shear delamination strength between the components (holder 10, sealing resin 7, and casing 9), the tensile strength in the semiconductor device 120 according to this embodiment is the fracture strength of the casing 9 itself. Hence, the fracture strength can be twice or more as compared with the comparative example.
Furthermore, also in the semiconductor device 120 according to this embodiment, the creep-up prevention effect of the first protrusion 21 and the second protrusion 22 prevents the creep-up of the first sealing resin 7a, which otherwise deteriorates adhesion. Hence, the shear delamination strength, and its variation due to the creep-up of the first sealing resin 7a, are improved.
Thus, the semiconductor device 120 according to this embodiment can provide a semiconductor device in which delamination at the interface between the holder and the sealing resin and delamination at the interface between the casing and the sealing resin are prevented.
In the case where the sealing resin 7 includes a first sealing resin 7a on the base plate 1 side and a second sealing resin 7b provided thereon, the surface 22a of the second protrusion 22 on the opposite side from the base plate 1 is at least partly buried in the second sealing resin 7b, that is, the resin having higher mechanical strength and moisture-proofness.
As shown in
In the semiconductor device 130 according to this embodiment, the first protrusion 21 has a bevel in which the distance between the holder 10 and the casing 9 is narrowed toward the base plate 1. That is, the first protrusion 21 is tapered.
Also in this embodiment, the side surface 10a of the holder 10 is provided with a first protrusion 21 which protrudes toward the casing 9. The first protrusion 21 is nearer to the base plate 1 than the major surface 10b of the holder 10 on the opposite side from the base plate 1. The surface 21a of the first protrusion 21 on the opposite side from the base plate 1 is at least partly buried in the sealing resin 7.
Thus, by a similar effect to that described in the first embodiment, delamination at the interface between the holder and the sealing resin can be prevented.
As shown in
Thus, by a similar effect to that described in the second embodiment, delamination at the interface between the holder and the sealing resin and delamination at the interface between the casing and the sealing resin can be prevented.
As shown in
In the semiconductor device 150 according to this embodiment, the second protrusion 22 has a bevel in which the distance between the holder 10 and the casing 9 is narrowed toward the base plate 1. That is, the second protrusion 22 is tapered.
Also in this embodiment, the casing 9 has a second protrusion 22 provided on the surface 9c of the casing 9 opposed to the holder 10, and the surface 22a of the second protrusion 22 on the opposite side from the base plate 1 is at least partly buried in the sealing resin 7.
Thus, delamination at the interface between the holder and the sealing resin and delamination at the interface between the casing and the sealing resin can be prevented.
In the semiconductor devices 110 to 150 according to the above embodiments, the first protrusion 21 and the second protrusion 22 can have various planar shapes.
This figure illustrates only the holder 10, the casing 9, the first protrusion 21, and the second protrusion 22, showing plan views as viewed in the direction perpendicular to the major surface of the base plate 1.
As shown in
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As shown in
The planar shapes of the above semiconductor devices 101 to 107 are applicable to each of the above semiconductor devices 110, 120, 130, 140, and 150.
In the example illustrated in
Hence, in the case where the distance between the holder 10 and the casing 9 is relatively short, the first protrusion 21 and the second protrusion 22 can be provided so that they are not opposed to each other in plan view as illustrated in
That is, the second protrusion 22 can be provided at a portion of the casing 9 which is not opposed to the first protrusion 21 in plan view in the direction perpendicular to the major surface of the base plate 1.
The embodiments of the invention have been described with reference to examples. However, the invention is not limited to these examples. For instance, various specific configurations of the components constituting the semiconductor device are encompassed within the scope of the invention as long as those skilled in the art can similarly practice the invention and achieve similar effects by suitably selecting such configurations from conventionally known ones.
Furthermore, any two or more components of the examples can be combined with each other as long as technically feasible, and such combinations are also encompassed within the scope of the invention as long as they fall within the spirit of the invention.
Furthermore, those skilled in the art can suitably modify and implement the semiconductor device described above in the embodiments of the invention, and all the semiconductor devices thus modified are also encompassed within the scope of the invention as long as they fall within the spirit of the invention.
Furthermore, those skilled in the art can conceive various modifications and variations within the spirit of the invention, and it is understood that such modifications and variations are also encompassed within the scope of the invention.
Number | Date | Country | Kind |
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2008-218743 | Aug 2008 | JP | national |