SEMICONDUCTOR TOOL HAVING CONTROLLABLE AMBIENT ENVIRONMENT PROCESSING ZONES

Description

BACKGROUND

Integrated circuits (ICs) are formed by complex fabrication processes, such as sol-gel deposition. During sol-gel deposition, a semiconductor workpiece (e.g., a semiconductor wafer) may be subjected to different processing steps. Some of the processing steps may comprise preparing a sol-gel solution (e.g., a colloidal solution), depositing the sol-gel solution onto the semiconductor workpiece (e.g., via a spin-on process), pyrolyzing the sol-gel solution (e.g., via a baking process) to form a gel layer on the semiconductor workpiece, and crystallizing the gel layer (e.g., via an anneal process) to form a sol-gel layer on the semiconductor workpiece. Specialized fabrication tools are needed to perform these processing steps.

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of the present disclosure are best understood from the following detailed description when read with the accompanying figures. It is noted that, in accordance with the standard practice in the industry, various features are not drawn to scale. In fact, the dimensions of the various features may be arbitrarily increased or reduced for clarity of discussion.

FIG. 1 illustrates a view of some embodiments of a semiconductor fabrication tool configured to control an ambient environment at a plurality of processing zones disposed inside a processing chamber.

FIG. 2 illustrates a perspective view of some more detailed embodiments of a region of the processing chamber of FIG. 1 in which the second processing zone is disposed.

FIG. 3 illustrates a view of some other embodiments of the semiconductor fabrication tool of FIG. 1.

FIG. 4 illustrates a view of some other embodiments of the semiconductor fabrication tool of FIG. 1.

FIG. 5 illustrates a view of some other embodiments of the semiconductor fabrication tool of FIG. 1.

FIG. 6 illustrates a view of some other embodiments of the semiconductor fabrication tool of FIG. 4.

FIG. 7 illustrates a flowchart of some embodiments of a method for forming a plurality of layers on a plurality of semiconductor workpieces, respectively, with the semiconductor fabrication tool of FIG. 6.

DETAILED DESCRIPTION

The present disclosure will now be described with reference to the drawings wherein like reference numerals are used to refer to like elements throughout, and wherein the illustrated structures are not necessarily drawn to scale. It will be appreciated that this detailed description and the corresponding figures do not limit the scope of the present disclosure in any way, and that the detailed description and figures merely provide a few examples to illustrate some ways in which the inventive concepts can manifest themselves.

The present disclosure provides many different embodiments, or examples, for implementing different features of this disclosure. Specific examples of components and arrangements are described below to simplify the present disclosure. These are, of course, merely examples and are not intended to be limiting. For example, the formation of a first feature over or on a second feature in the description that follows may include embodiments in which the first and second features are formed in direct contact, and may also include embodiments in which additional features may be formed between the first and second features, such that the first and second features may not be in direct contact. In addition, the present disclosure may repeat reference numerals and/or letters in the various examples. This repetition is for the purpose of simplicity and clarity and does not in itself dictate a relationship between the various embodiments and/or configurations discussed.

Further, spatially relative terms, such as “beneath,” “below,” “lower,” “above,” “upper” and the like, may be used herein for ease of description to describe one element or feature's relationship to another element(s) or feature(s) as illustrated in the figures. The spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. The apparatus may be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein may likewise be interpreted accordingly.

Some integrated chips (ICs) comprise a piezoelectric device. The piezoelectric device comprises a piezoelectric layer that is configured to generate an electric charge in response to a change in a shape of the piezoelectric structure layer, or vice versa. One method to form the piezoelectric layer is a sol-gel process. The sol-gel process may include depositing a sol-gel solution onto a semiconductor workpiece, pyrolyzing the sol-gel solution on the semiconductor workpiece (e.g., via a baking process), and crystallizing the sol-gel solution on the semiconductor workpiece (e.g., via an anneal process). To pyrolyze the sol-gel solution on the semiconductor workpiece, the semiconductor workpiece is heated in a semiconductor fabrication tool.

Typically, the semiconductor fabrication tool performs the pyrolysis process on a plurality of semiconductor workpieces at a same time. To perform the pyrolysis process on the plurality of semiconductor workpieces, the plurality of semiconductor workpieces are placed on a plurality of heating elements, respectively. The plurality of heating elements are typically disposed in a plurality of processing zones inside the semiconductor fabrication tool, respectively. The plurality of heating elements heat the plurality of semiconductor workpieces, respectively, causing by-products to separate from the sol-gel solution and form a processing fluid (e.g., a gas comprising by-products from the sol-gel pyrolysis process) inside the semiconductor fabrication tool. The semiconductor fabrication tool exhausts the processing fluid through a plurality of exhaust ports, where the plurality of exhaust ports are disposed in the plurality of processing zones, respectively. Generally, the plurality of exhaust ports converge to a single common exhaust output (e.g., via a piping system).

A challenge with the above sol-gel process is controlling an ambient environment (e.g., an amount of sol-gel by-products in the processing fluid) at each of the plurality of processing zones. The semiconductor fabrication tool may not be able to individually control the ambient environment at each of the plurality of processing zones due to the exhaust ports being disposed in the plurality of processing zones and converging to the single common exhaust output. Thus, during the sol-gel process, there may be undesirable variations between the ambient environments of the plurality of processing zones. Accordingly, the varying ambient environments may cause negative effects in the formation of the piezoelectric layers on the plurality of semiconductor workpieces (e.g., permittivity variations between piezoelectric layers formed on different semiconductor workpieces, permittivity variations across a piezoelectric layer formed on a semiconductor workpiece, etc.).

In various embodiments, the present application is directed toward a semiconductor fabrication tool. The semiconductor fabrication tool includes a processing chamber. A first processing zone having a first ambient environment and a second processing zone having a second ambient environment are disposed at different locations inside the processing chamber, where gas-phase particles (e.g., sol-gel by-products) are disposed throughout the first and second ambient environments. A first exhaust port is disposed in the first processing zone. A first exhaust pipe is coupled to the first exhaust port and a first individual exhaust output. A first adjustable fluid control element is configured to control the first ambient environment by adjusting a first fluid flow rate corresponding to a rate in which the gas-phase particles flow through the first exhaust port. A second exhaust port is disposed in the second processing zone. A second exhaust pipe is coupled to the second exhaust port and a second individual exhaust output. A second adjustable fluid control element is configured to control the second ambient environment by adjusting a second fluid flow rate corresponding to a rate in which the gas-phase particles flow through the second exhaust port, where the first adjustable fluid control element and the second adjustable fluid control element are independently adjustable.

Because the first adjustable fluid control element and the second adjustable fluid control element are independently adjustable, the first ambient environment and the second ambient environment may be independently controlled. Because the first and second ambient environments may be independently controlled, an amount of gas-phase particles in the first ambient environment and an amount of gas-phase particles in the second ambient environment may be substantially the same. Accordingly, fabrication process(es) performed in the semiconductor fabrication tool (e.g., forming a piezoelectric layer via a sol-gel process) may be improved between the first processing zone and second processing zone (e.g., improved permittivity uniformity between the piezoelectric layers formed in the first and second processing zones).

FIG. 1 illustrates a view of some embodiments of a semiconductor fabrication tool 100 configured to control an ambient environment at a plurality of processing zones 104a-d disposed inside a processing chamber 102.

As shown in FIG. 1, the semiconductor fabrication tool 100 comprises a processing chamber 102. A plurality of processing zones 104a-d are disposed in the processing chamber 102. For example, in some embodiments, the plurality of processing zones 104a-d comprise a first processing zone 104a, a second processing zone 104b, a third processing zone 104c, and a fourth processing zone 104d. In further embodiments, the plurality of processing zones 104a-d may be stacked vertically in the processing chamber 102. In yet further embodiments, the plurality of processing zones 104a-d have a plurality of ambient environments 105a-d, respectively. For example, the first processing zone 104a has a first ambient environment 105a, the second processing zone 104b has a second ambient environment 105b, the third processing zone 104c has a third ambient environment 105c, and the fourth processing zone 104d has a fourth ambient environment 105d.

The plurality of processing zones 104a-d comprise a plurality of heating elements 106, respectively. The plurality of heating elements 106 are configured to heat a plurality of semiconductor workpieces 108, respectively. For example, each of the plurality of heating elements 106 are configured to heat one of the plurality of semiconductor workpieces 108 to a processing temperature (e.g., between about 200° C. and 600° C.). In some embodiments, the plurality of heating elements 106 may heat the plurality of semiconductor workpieces 108 by, for example, resistive heating (e.g., passing current through a conductor), water heating (e.g., heating water to an elevated temperature), or the like. In further embodiments, the processing temperature may be about 300° C. In further embodiments, the processing temperature is a sol-gel pyrolysis temperature (e.g., a temperature that pyrolyzes a sol-gel solution).

In some embodiments, the plurality of heating elements 106 are configured to hold the plurality of semiconductor workpieces 108, respectively. Each of the plurality of semiconductor workpieces 108 may be a semiconductor wafer comprising a semiconductor body (e.g., monocrystalline silicon/CMOS bulk, silicon-germanium (SiGe), silicon on insulator (SOI), etc.). In some embodiments, each of the plurality of semiconductor workpieces 108 may be a semiconductor wafer having one or more layers (e.g., an oxide (e.g., silicon dioxide (SiO₂)), a metal (e.g., platinum), a nitride (e.g., silicon nitride (SiN)), an oxy-nitride (e.g., silicon oxy-nitride (SiO_xN_y)), or the like) disposed on the semiconductor wafer.

One or more exhaust ports 110 are disposed in each of the plurality of processing zones 104a-d. For example, the first processing zone 104a may comprise four exhaust ports. In such embodiments, two exhaust ports may be disposed on a first side of the one of the plurality of heating elements 106 of the first processing zone 104a, and two other exhaust ports may be disposed on a second side of the one of the plurality of heating elements 106 of the first processing zone 104a opposite the first side.

The one or more exhaust ports 110 comprise openings 112 that provide passages for a processing fluid (not shown) to flow through the one or more exhaust ports 110, respectively, such that the processing fluid exhausts from the plurality of processing zones 104a-d to a plurality of exhaust tubes 114a-d, respectively. For example, the one or more exhaust ports 110 of the first processing zone 104a may be coupled to a first exhaust tube 114a, such that the processing fluid may exhaust from the first processing zone 104a to the first exhaust tube 114a; the one or more exhaust ports 110 of the second processing zone 104b may be coupled to a second exhaust tube 114b, such that the processing fluid may exhaust from the second processing zone 104b to the second exhaust tube 114b; the one or more exhaust ports 110 of the third processing zone 104c may be coupled to a third exhaust tube 114c, such that the processing fluid may exhaust from the third processing zone 104c to the third exhaust tube 114c; and the one or more exhaust ports 110 of the fourth processing zone 104d may be coupled to a fourth exhaust tube 114d, such that the processing fluid may exhaust from the fourth processing zone 104d to the fourth exhaust tube 114d. The processing fluid comprises gas-phase particles (e.g., atoms, molecules, ions) and is disposed throughout the plurality of ambient environments 105a-d. In some embodiments, the gas-phase particles may be or comprise, for example, sol-gel by-products (e.g., hydrogen, oxygen, carbon, lead, zirconium, titanium, etc.), processing gases (e.g., hydrogen gas), or the like.

The plurality of exhaust tubes 114a-d couple the one or more exhaust ports 110 of the plurality of processing zones 104a-d to a plurality of individual exhaust outputs 116a-d, respectively. For example, the first exhaust tube 114a couples the one or more exhaust ports 110 of the first processing zone 104a to a first individual exhaust output 116a, the second exhaust tube 114b couples the one or more exhaust ports 110 of the second processing zone 104b to a second individual exhaust output 116b, the third exhaust tube 114c couples the one or more exhaust ports 110 of the third processing zone 104c to a third individual exhaust output 116c, and the fourth exhaust tube 114d couples the one or more exhaust ports 110 of the fourth processing zone 104d to a fourth individual exhaust output 116d. In some embodiments, each of the plurality of exhaust tubes 114a-d are separate from one another. In further embodiments, each of the plurality of individual exhaust outputs 116a-d are separate from one another.

Each of the plurality of individual exhaust outputs 116a-d is an area of fluid (e.g., gas) that is discrete from the processing chamber 102. For example, in some embodiments, the individual exhaust outputs 116a-d are discrete areas of fluid in Earth's atmosphere. In other embodiments, the individual exhaust outputs 116a-d may be discrete areas of fluid in a piping system that are discrete from the plurality of exhaust tubes 114a-d (e.g., discrete areas of fluid in the piping system that cannot flow into the processing chamber 102). In yet other embodiments, the individual exhaust outputs 116a-d may be discrete regions of a vacuum system (e.g., a piping system comprising one or more vacuum pumps).

In some embodiments, each of the plurality of individual exhaust outputs 116a-d may have a different pressure than a corresponding one of the plurality of processing zones 104a-d. For example, the first individual exhaust output 116a may have a lower pressure than the first processing zone 104a. In further embodiments, a pressure difference between each of the plurality of individual exhaust outputs 116a-d and its corresponding one of the plurality of processing zones 104a-d is substantially the same. For example, a pressure difference between the first individual exhaust output 116a and the first processing zone 104a may be substantially the same as a pressure difference between the second individual exhaust output 116b and the second processing zone 104b, between the third individual exhaust output 116c and the third processing zone 104c, and between the fourth individual exhaust output 116d and the fourth processing zone 104d. In yet further embodiments, the plurality of exhaust tubes 114a-d may have substantially similar dimensions (e.g., length, inner diameter, geometry, etc.) and/or properties (e.g., chemical compositions), such that a pressure difference between each of the plurality of individual exhaust outputs 116a-d and its corresponding one of the plurality of processing zones 104a-d are substantially the same.

Because the plurality of exhaust tubes 114a-d are coupled to the plurality of individual exhaust outputs 116a-d, respectively, and because the plurality of exhaust tubes 114a-d may have substantially the same dimensions and/or properties, the processing fluid may flow through each of the one or more exhaust ports 110 at substantially the same fluid flow rate. Because the processing fluid may flow through each of the one or more exhaust ports 110 at substantially the same fluid flow rate, the plurality of ambient environments 105a-d may be substantially the same (e.g., substantially the same amount of processing fluid). Accordingly, fabrication process(es) performed in the semiconductor fabrication tool 100 (e.g., forming a piezoelectric layer via a sol-gel process) may be improved between the plurality of processing zones 104a-d (e.g., improved permittivity uniformity between piezoelectric layers formed in the plurality of processing zones 104a-d).

FIG. 2 illustrates a perspective view of some more detailed embodiments of a region 200 of the processing chamber 102 of FIG. 1 (viewed from under the region 200) in which the second processing zone 104b is disposed. FIG. 2 illustrates the second exhaust tube 114b as partially transparent. Further, FIG. 2 illustrates the processing chamber 102 in phantom, such that sidewalls 102s of the processing chamber 102 are illustrated by a first dotted line. In addition, FIG. 2 illustrates a perimeter of one of the plurality of semiconductor workpieces 108 through the one of the plurality of heating elements 106 of the second processing zone 104b by a second dotted line. It will be appreciated that, in some embodiments, the first processing zone 104a, the third processing zone 104c, and the fourth processing zone 104d may comprise substantially similar features as illustrated in FIG. 2.

As shown in FIG. 2, a hotplate tray 202 comprises one of the plurality of heating elements 106. In such embodiments, the one of the plurality of heating elements 106 may be disposed on a bottom surface of the hotplate tray 202. In further embodiments, a shape of the one of the plurality of heating elements 106 may be, for example, circular, elliptical, rectangular, square, or the like. The hotplate tray 202 may comprise sidewalls that extend vertically from the bottom surface of the hotplate tray 202. In further embodiments, the hotplate tray 202 may also comprise a top surface, such that the bottom surface, the sidewalls, and the top surface of the hotplate tray 202 may form a box-like enclosure around the one of the semiconductor workpieces 108 once the one of the semiconductor workpieces 108 is placed in/on the hotplate tray 202. In further embodiments, the hotplate tray 202 may be removable from the processing chamber 102. In yet further embodiments, the hotplate tray 202 comprises, for example, a metal (e.g., steel), a ceramic (e.g., porcelain), or the like.

A plurality of structural support structures 204 are disposed in the processing chamber 102. In some embodiments, the structural support structures 204 may comprise, for example, a metal (e.g., steel), a plastic (e.g., acrylic), or the like. In further embodiments, sidewalls 102s of the processing chamber 102 are mounted to the structural support structures 204, or vice versa. The sidewalls 102s of the processing chamber 102 may comprise, for example, a metal (e.g., steel), a plastic (e.g., acrylic), or the like. It will be appreciated that the sidewalls 102s of the processing chamber 102 may extend between an upper surface of the processing chamber 102 and a bottom surface of the processing chamber 102, such that the processing chamber 102 encloses the plurality of processing zones 104a-d (see, e.g., FIG. 1).

A plurality of mounting brackets 206 are disposed on the plurality of structural support structures 204, respectively. The plurality of mounting brackets 206 are configured to support the hotplate tray 202. In some embodiments, the plurality of mounting brackets 206 comprise, for example, a metal (e.g., steel), a ceramic (e.g., porcelain), or the like. In further embodiments, the plurality of mounting brackets 206 are L-shaped.

In some embodiments, the second exhaust tube 114b is disposed in an exhaust tube housing unit (not shown). The second exhaust tube 114b may be mounted inside the exhaust tube housing unit. In further embodiments, the exhaust tube housing unit is mounted to the sidewalls 102s of the processing chamber 102. In some embodiments, the second exhaust tube 114b may comprise, for example, a metal (e.g., steel), a plastic (e.g., acrylic), or the like. In further embodiments, a cross-sectional geometry of the second exhaust tube 114b may be, for example, rectangular, square, circular, elliptical, or the like. In yet further embodiments, the exhaust tube housing unit may comprise, for example, a metal (e.g., steel), a plastic (e.g., acrylic), or the like.

In some embodiments, the second exhaust tube 114b is disposed on opposite sides of the processing chamber 102. For example, a first portion and a second portion of the second exhaust tube 114b may be disposed on a first side of the processing chamber 102, and a third portion and a fourth portion of the second exhaust tube 114b may be disposed on a second side of the processing chamber 102 opposite the first side. In further embodiments, the first portion and the second portion of the second exhaust tube 114b may converge to a fifth portion of the second exhaust tube 114b, and the third portion and the fourth portion may converge to a sixth portion of the second exhaust tube 114b. In yet further embodiments, the fifth portion and the sixth portion of the second exhaust tube may converge to a seventh portion of the exhaust tube. In yet further embodiments, the seventh portion of the second exhaust tube 114b may be coupled to the second individual exhaust output 116b.

In some embodiments, the one or more exhaust ports 110 in the second processing zone 104b are disposed on the opposite sides of the processing chamber 102. The one or more exhaust ports 110 in the second processing zone 104b may be mounted to the exhaust tube housing unit. In further embodiments, a first one, a second one, a third one, and a fourth one of the one or more exhaust ports 110 in the second processing zone 104b are coupled to the first portion, the second portion, the third portion, and the fourth portion of the second exhaust tube 114b, respectively. In further embodiments, each of the one or more exhaust ports 110 in the second processing zone 104b may comprise a hotplate tray locking mechanism (e.g., a spring plunger, button clip, etc.) that engages with a corresponding engaging point disposed on the hotplate tray 202, such that the hotplate tray 202 may lock into the processing chamber 102 at a specific locking location. In yet further embodiments, the one or more exhaust ports 110 may comprise, for example, a metal (e.g., steel), a plastic (e.g., acrylic), or the like.

When the hotplate tray 202 is in the specific locking location, the openings 112 may be aligned with corresponding openings in the hotplate tray 202 and corresponding openings in the second exhaust tube 114b, respectively, such that the processing fluid may exhaust from the second processing zone 104b to the second exhaust tube 114b. In some embodiments, a shape of the openings 112 may be, for example, elliptical, rectangular, square, circular, or the like.

In some embodiments, each of the one or more exhaust ports 110 in the second processing zone 104b may comprise a sensor mounting element 208. Each of the sensor mounting elements 208 is configured to position a sensor (e.g., a gas flow sensor) in one of the one or more exhaust ports 110 in the second processing zone 104b. In some embodiments, the sensor mounting elements 208 are orifices that extend from the openings 112 to sidewalls of the one or more exhaust ports 110 disposed in the second processing zone 104b, respectively. For example, one of the sensor mounting elements 208 may extend from the opening of a first one of the one or more exhaust ports 110 disposed in the second processing one 104a to a sidewall of the first one of the one or more exhaust ports 110, such that the sensor may be mounted inside the opening of the first one of the one or more exhaust ports 110.

FIG. 3 illustrates a view of some other embodiments of the semiconductor fabrication tool 100 of FIG. 1.

A plurality of fluid control elements 302a-d are disposed in the plurality of exhaust tubes 114a-d, respectively. For example, a first fluid control element 302a is disposed in the first exhaust tube 114a, a second fluid control element 302b is disposed in the second exhaust tube 114b, a third fluid control element 302c is disposed in the third exhaust tube 114c, and a fourth fluid control element 302d is disposed in the fourth exhaust tube 114d. The plurality of fluid control elements 302a-d are configured to control the plurality of ambient environments 105a-d, respectively. In some embodiments, the plurality of fluid control elements 302a-d control the plurality of ambient environments 105a-d so that each of the plurality of ambient environments 105a-d comprise a substantially similar amount of the processing fluid.

In some embodiments, the plurality of fluid control elements 302a-d control the plurality of ambient environments 105a-d, respectively, by adjusting fluid flow rates that correspond to rates in which the processing fluid flows through the one or more exhaust ports 110. For example, the first fluid control element 302a controls the first ambient environment 105a by adjusting a first fluid flow rate corresponding to a rate in which the processing fluid flows from the first processing zone 104a through the one or more exhaust ports 110 disposed in the first processing zone 104a, and the second fluid control element 302b controls a second fluid flow rate that corresponds to a rate in which the processing fluid flows from the second processing zone 104b through the one or more exhaust ports 110 disposed in the second processing zone 104b. In further embodiments, for the plurality of ambient environments 105a-d to have substantially the same amount of processing fluid, the plurality of fluid control elements 302a-d may be adjusted so that the fluid flow rates are the same and/or different. For example, all of the fluid flow rates may be the same, all of the fluid flow rates may be different, or some of the fluid flow rates may be the same and some may be different.

In some embodiments, the plurality of fluid control elements 302a-d control the plurality of ambient environments 105a-d, respectively, by adjusting the exhaust pressures at the one or more exhaust ports 110. For example, the first fluid control element 302a controls the first ambient environment 105a by adjusting the exhaust pressure at the one or more exhaust ports 110 disposed in the first processing zone 104a, and the second fluid control element 302b controls the second ambient environment 105b by adjusting the exhaust pressure at the one or more exhaust ports 110 disposed in the second processing zone 104b. In further embodiments, for the plurality of ambient environments 105a-d to have substantially the same amount of processing fluid, the plurality of fluid control elements 302a-d may be adjusted so that the exhaust pressures are the same and/or different. For example, all of the exhaust pressures may be the same, all of the exhaust pressures may be different, or some of the exhaust pressures may be the same and some may be different.

In some embodiments, the plurality of fluid control elements 302a-d may be, for example, valves (e.g., needle valves, globe valves, etc.), pumps (e.g., positive displacement pumps, velocity pumps, etc.), a combination of the foregoing, or some other device configured to control fluid flow through a tube. In further embodiments, each of the plurality of fluid control elements 302a-d may be adjusted independently of one another (e.g., adjusting pump speed, adjusting valve positioning, etc.), such that the plurality of ambient environments 105a-d may be independently controlled.

In some embodiments, the plurality of exhaust tubes 114a-d may have different dimensions (e.g., length, inner diameter, geometry, etc.) and/or properties (e.g., chemical composition), such that a pressure difference between each of the plurality of individual exhaust outputs 116a-d and its corresponding one of the plurality of processing zones 104a-d may be different. Because each of the plurality of individual exhaust outputs 116a-d are coupled to a corresponding one of the plurality of exhaust tubes 114a-b and because each of the plurality of fluid control elements 302a-d may be adjusted independently, even though the plurality of exhaust tubes 114a-d may have different dimensions and/or properties, the ambient environments 105a-d may be controlled to be substantially the same (e.g., substantially the same amount of processing fluid). Accordingly, fabrication process(es) performed in the semiconductor fabrication tool 100 may be improved between the plurality of processing zones 104a-d (e.g., improved permittivity uniformity between piezoelectric layers formed in the plurality of processing zones 104a-d).

FIG. 4 illustrates a view of some other embodiments of the semiconductor fabrication tool 100 of FIG. 1.

As shown in FIG. 4 each of the plurality of processing zones 104a-d comprise a plurality of ambient environment regions 404a-b. For example, a first ambient environment region 404a may be disposed at a first location in the fourth processing zone 104d, and a second ambient environment region 404b may be disposed at a second location in the fourth processing zone 104d different than the first location. In some embodiments, each of the plurality of ambient environment regions 404a-b may comprise a substantially similar area of space inside the processing chamber 102 (e.g., a half of one of the plurality of processing zones 104a-d, a quarter of one of the plurality of processing zones 104a-d, etc.). It will be appreciated that, in some embodiments, the plurality of ambient environment regions 404a-b may comprise any number of ambient environment regions (e.g., 3, 4, 5, etc.).

In some embodiments, each of the one or more exhaust ports 110 is disposed in one of the ambient environment regions 404a-b. For example, a first one of the one or more exhaust ports 110 is disposed in the first ambient environment region 404a, and a second one of the one or more exhaust ports 110 is disposed in the second ambient environment region 404b.

In some embodiments, a plurality of exhaust port fluid control elements 402 are disposed in each of the plurality of exhaust tubes 114a-d. Each of the plurality of exhaust port fluid control elements 402 correspond to one of the one or more exhaust ports 110. For example, a first one of the plurality of exhaust port fluid control elements 402 is disposed in a first portion of the fourth exhaust tube 114d and corresponds to the first one of the one or more exhaust ports 110, and a second one of the plurality of exhaust port fluid control elements 402 may be disposed in a second portion of the fourth exhaust tube 114d and correspond to the second one of the one or more exhaust ports 110.

Each of the plurality of exhaust port fluid control elements 402 is configured to control a corresponding one of the plurality of ambient environment regions 404a-b. For example, the first one of the plurality of exhaust port fluid control elements 402 is configured to control the first ambient environment region 404a, and the second one of the plurality of exhaust port fluid control elements 402 is configured to control the second ambient environment region 404b. In some embodiments, the plurality of exhaust port fluid control elements 402 control the plurality of ambient environment regions 404a-b so that each of the plurality of ambient environment regions 404a-b comprise a substantially similar amount of the processing fluid.

In some embodiments, the plurality of exhaust port fluid control elements 402 control the plurality of ambient environment regions 404a-b by adjusting fluid flow rates that correspond to rates in which the processing fluid flows through the one or more exhaust ports 110. For example, the first one of the plurality of exhaust port fluid control elements 402 controls the first ambient environment region 404a by adjusting a third fluid flow rate corresponding to a rate in which the processing fluid flows from the fourth processing zone 104d through the first one of the one or more exhaust ports 110, and the second one of the plurality of exhaust port fluid control elements 402 controls the second ambient environment region 404b by adjusting a fourth fluid flow rate corresponding to a rate in which the processing fluid flows from the fourth processing zone 104d through the second one of the one or more exhaust ports 110. In further embodiments, for the plurality of ambient environment regions 404a-b to have substantially the same amount of processing fluid, the plurality of exhaust port fluid control elements 402 may be adjusted so that the fluid flow rates are the same and/or different. For example, all of the fluid flow rates may be the same, all of the fluid flow rates may be different, or some of the fluid flow rates may be the same and some may be different.

In some embodiments, the plurality of exhaust port fluid control elements 402 control the plurality of ambient environment regions 404a-b by adjusting the exhaust pressures at the one or more exhaust ports 110. For example, the first one of the plurality of exhaust port fluid control elements 402 controls the first ambient environment region 404a by adjusting the exhaust pressure at the first one of the one or more exhaust ports 110, and the second one of the plurality of exhaust port fluid control elements 402 controls the second ambient environment region 404b by adjusting the exhaust pressure at the second one of the one or more exhaust ports 110. In further embodiments, for the plurality of ambient environment regions 404a-b to have substantially the same amount of processing fluid, the plurality of exhaust port fluid control elements 402 may be adjusted so that the exhaust pressures are the same and/or different. For example, all of the exhaust pressures may be the same, all of the exhaust pressures may be different, or some of the exhaust pressures may be the same and some may be different.

In some embodiments, the plurality of exhaust port fluid control elements 402 may be, for example, valves (e.g., needle valves, globe valves, etc.), pumps (e.g., positive displacement pumps, velocity pumps, etc.), a combination of the foregoing, or some other device configured to control fluid flow through a tube. In further embodiments, each of the plurality of exhaust port fluid control elements 402 may be adjusted independently of one another (e.g., adjusting pump speed, adjusting valve positioning, etc.), such that the plurality of ambient environment regions 404a-b may be independently controlled. Because each of the plurality of exhaust port fluid control elements 402 correspond to one of the one or more exhaust ports 110 and because each of the plurality of exhaust port fluid control elements 402 may be adjusted independently, the ambient environment regions 404a-b may be controlled to be substantially the same (e.g., substantially the same amount of processing fluid). Accordingly, fabrication process(es) performed in the semiconductor fabrication tool 100 may be improved in each of the plurality of processing zones 104a-d (e.g., improved permittivity uniformity across a piezoelectric layer formed in one of the plurality of processing zones 104a-d).

FIG. 5 illustrates a view of some other embodiments of the semiconductor fabrication tool 100 of FIG. 1.

As shown in FIG. 5, the semiconductor fabrication tool 100 comprises both the plurality of fluid control elements 302a-d and the plurality of exhaust port fluid control elements 402. Because the semiconductor fabrication tool comprises both the plurality of fluid control elements 302a-d and the plurality of exhaust port fluid control elements 402, the fabrication process(es) performed in the semiconductor fabrication tool 100 may be further improved between the plurality of processing zones 104a-d and in each of the plurality of processing zones 104a-d. For example, the plurality of fluid control elements 302a-d may be adjusted to selectively control pressures in the plurality of exhaust tubes 114a-d, respectively, such that fluid flow rates in which the processing fluid flows from the plurality of ambient environment regions 404a-b may be further controlled.

FIG. 6 illustrates a view of some other embodiments of the semiconductor fabrication tool 100 of FIG. 4. It will be appreciated that, in some embodiments, the semiconductor fabrication tools of FIGS. 3 and 5 may comprise similar features as illustrated in the semiconductor fabrication tool 100 of FIG. 6.

As shown in FIG. 6, the plurality of exhaust port fluid control elements 402 are controlled electronically. In some embodiments, the plurality of exhaust port fluid control elements 402 comprise a plurality of electronic actuators, respectively. In further embodiments, the plurality of electronic actuators adjust the plurality of exhaust port fluid control elements 402 (e.g., adjusting pump speed, adjusting valve positioning, etc.) based on a plurality of received electrical signals, respectively.

A plurality of sensors 602 are disposed in the plurality of ambient environment regions 404a-b, respectively. The plurality of sensors 602 are configured to generate a plurality of first electrical signals based on properties of the semiconductor fabrication tool 100. For example, in some embodiments, the plurality of sensors 602 generate the plurality of first electrical signals based on the fluid flow rates through the one or more exhaust ports 110, respectively. In other embodiments, the plurality of sensors 602 generate the plurality of first electrical signals based on pressures inside the plurality of ambient environment regions 404a-b, respectively. In other embodiments, the plurality of sensors 602 generate the plurality of first electrical signals based on a composition of the processing fluid inside the plurality of ambient environment regions 404a-b, respectively. In further embodiments, the plurality of sensors 602 generate the plurality of first electrical signals in real time, such that the plurality of first electrical signals vary based on real-time changes in the properties of the semiconductor fabrication tool 100.

In some embodiments, the plurality of sensors 602 may be, for example, fluid flow sensors, pressure sensors, or the like. The plurality of sensors 602 may be mounted to the one or more exhaust ports 110, respectively. For example, one of the plurality of sensors 602 may be mounted to one of the one or more exhaust ports 110 via the sensor mounting element 208 (see, e.g., FIG. 2) of the one of the one or more exhaust ports 110.

The plurality of sensors 602 are electrically coupled to measurement circuitry 604. In some embodiments, the measurement circuitry 604 may comprise, for example, memory, a microprocessor, a power supply, and/or other computer hardware. The measurement circuitry 604 is configured to monitor the plurality of ambient environment regions 404a-b. In further embodiments, the measurement circuitry 604 monitors the plurality of ambient environment regions 404a-b by receiving the plurality of first electrical signals from the plurality of sensors 602 and calculating the properties of the semiconductor fabrication tool 100 based on the plurality of first electrical signals. For example, in some embodiments, the measurement circuitry 604 calculates the fluid flow rates through the one or more exhaust ports 110, respectively. In other embodiments, the measurement circuitry 604 calculates exhaust pressures at the one or more exhaust ports 110, respectively. In other embodiments, the measurement circuitry 604 calculates compositions of the processing fluid in the plurality of ambient environment regions 404a-b, respectively.

Bias circuitry 606 is electrically coupled to the plurality of exhaust port fluid control elements 402. In some embodiments, the bias circuitry 606 is electrically coupled to the measurement circuitry 604. In some embodiments, the bias circuitry 606 may comprise, for example, memory, a microprocessor, a power supply, and/or other computer hardware. The bias circuitry 606 is configured to provide a plurality of second electrical signals to the plurality of exhaust port fluid control elements 402, respectively, such that the bias circuitry 606 may adjust each of the plurality of exhaust port fluid control elements 402. In further embodiments, the bias circuitry 606 provides the plurality of second electrical signals in real time, such that the bias circuitry 606 may adjust the plurality of exhaust port fluid control elements 402 in real time.

In some embodiments, the bias circuitry 606 provides the plurality of second electrical signals to the plurality of exhaust port fluid control elements 402, respectively, based on the properties of the semiconductor fabrication tool 100 calculated by the measurement circuitry 604. For example, the measurement circuitry 604 may provide a plurality of third electrical signals to the bias circuitry 606 based on calculated fluid flow rates though the one or more exhaust ports 110. Based on the plurality of third electrical signals, the bias circuitry 606 may provide the plurality of second electrical signals to the plurality of exhaust port fluid control elements 402, respectively, to adjust each of the plurality of exhaust port fluid control elements 402. By adjusting the plurality of exhaust port fluid control elements 402 based on the properties of the semiconductor fabrication tool 100 calculated by the measurement circuitry 604, the semiconductor fabrication tool 100 may automatically adjust the ambient environment in each of the plurality of ambient environment regions 404a-b (or the plurality of processing zones 104a-d) as the properties in semiconductor fabrication tool 100 change, thereby further improving the fabrication process(es) performed in each of the plurality of processing zones 104a-d.

As illustrated in FIG. 7, a flowchart 700 of some embodiments of a method for forming a plurality of layers on a plurality of semiconductor workpieces 108, respectively, with the semiconductor fabrication tool 100 of FIG. 6 is provided. While the flowchart 700 of FIG. 7 is illustrated and described herein as a series of acts or events, it will be appreciated that the illustrated ordering of such acts or events is not to be interpreted in a limiting sense. For example, some acts may occur in different orders and/or concurrently with other acts or events apart from those illustrated and/or described herein. Further, not all illustrated acts may be required to implement one or more aspects or embodiments of the description herein, and one or more of the acts depicted herein may be carried out in one or more separate acts and/or phases.

At act 702, a first processing solution is formed on a first semiconductor workpiece and a second processing solution is formed on a second semiconductor workpiece.

In some embodiments, the first processing solution may be formed on the first semiconductor workpiece (see, e.g., FIG. 6—108) via a first deposition process (e.g., a spin-on process, a wafer dipping process, etc.). The first processing solution may be deposited on the first semiconductor workpiece outside of a processing chamber (see, e.g., FIG. 6—102) of a semiconductor fabrication tool (see, e.g., FIG. 6—100) configured to heat the first and second semiconductor workpieces. In further embodiments, the first processing solution may be deposited on a metal layer (e.g., a platinum layer) of the first semiconductor workpiece. In further embodiments, the first processing solution may comprise, for example, zirconium (Zr), titanium (Ti), and/or lead (Pb). In yet further embodiments, the first processing solution may be a first sol-gel solution.

In some embodiments, the second processing solution may be formed on the second semiconductor workpiece (see, e.g., FIG. 6—108) via a second deposition process (e.g., a spin-on process, a wafer dipping process, etc.). The second processing solution may be deposited on the second semiconductor workpiece outside of the processing chamber of the semiconductor fabrication tool. In further embodiments, the second processing solution may be deposited on a metal layer (e.g., a platinum layer) of the second semiconductor workpiece. In further embodiments, the second processing solution may comprise, for example, Zr, Ti, and/or Pb. In yet further embodiments, the second processing solution may be a second sol-gel solution.

At act 704, the first semiconductor workpiece and the second semiconductor workpiece are placed inside a processing chamber of a semiconductor fabrication tool, where the first semiconductor workpiece is placed in a first processing zone having a first ambient environment, and where the second semiconductor workpiece is placed in a second processing zone having a second ambient environment.

In some embodiments, the first semiconductor workpiece is placed in the processing tool by, for example: 1) removing a first hotplate tray (see, e.g., FIG. 2—202) comprising a first heating element (see, e.g., FIG. 6—106) from the processing chamber; 2) placing the first semiconductor workpiece onto the first heating element; and 3) loading the first hotplate tray into the first processing zone (see, e.g., FIG. 6—104a) of the processing chamber. In some embodiments, the first hotplate tray is loaded into the first processing zone by placing the first hotplate tray onto a plurality of mounting brackets (see, e.g., FIG. 2—206) disposed in the first processing zone. In further embodiments, loading the first hotplate tray into the first processing zone may engage a first locking mechanism that aligns openings in the first hotplate tray with openings (see, e.g., FIG. 6—112) of the one or more exhaust ports (see, e.g., FIG. 6—110) disposed in the first processing zone.

In some embodiments, the second semiconductor workpiece is placed in the processing tool by, for example: 1) removing a second hotplate tray (see, e.g., FIG. 2—202) comprising a second heating element (see, e.g., FIG. 6—106) from the processing chamber; 2) placing the second semiconductor workpiece onto the second heating element; and 3) loading the second hotplate tray into the second processing zone (see, e.g., FIG. 6—104b) of the processing chamber. In some embodiments, the second hotplate tray is loaded into the second processing zone by placing the second hotplate tray onto a plurality of mounting brackets (see, e.g., FIG. 2—206) disposed in the second processing zone. In further embodiments, loading the second hotplate tray into the second processing zone may engage a second locking mechanism that aligns openings in the second hotplate tray with openings (see, e.g., FIG. 6—112) of the one or more exhaust ports (see, e.g., FIG. 6—110) disposed in the second processing zone.

At act 706, the first semiconductor workpiece and the second semiconductor workpiece are processed by heating the first and second semiconductor workpieces to a first processing temperature for a first period of time.

In some embodiments, the first semiconductor workpiece is heated to the first processing temperature by passing a first current through the first heating element (e.g., a conductive wire). By heating the first semiconductor workpiece to the first processing temperature for the first period of time, a third processing layer is formed on the first semiconductor workpiece (e.g., via pyrolysis of the first processing solution). In further embodiments, the third processing layer may be a gel layer and comprise, for example, Zr, Ti, and/or Pb.

In some embodiments, the second semiconductor workpiece is heated to the first processing temperature by passing a second current through the second heating element (e.g., a conductive wire). By heating the second semiconductor workpiece to the first processing temperature for the first period of time, a fourth processing layer is formed on the second semiconductor workpiece (e.g., via pyrolysis of the second processing solution). In further embodiments, the fourth processing layer may be a gel layer and comprise, for example, Zr, Ti, and/or Pb.

In some embodiments, the first period of time is less than or equal to about 15 minutes. In further embodiments, the first processing temperature may be between about 200° C. and 600° C. More specifically, the first processing temperature may be about 300° C. In yet further embodiments, the first processing temperature may be a sol-gel pyrolysis temperature.

By heating the first and second semiconductor workpieces to the first processing temperature, by-products from processing the first and second semiconductor workpieces form a processing fluid that is disposed throughout the first and second ambient environments. In some embodiments, the by-products are gas-phase particles. In further embodiments, the by-products may be or comprise, for example, Zr, Ti, Pb, carbon (C), hydrogen (H), oxygen (O), or the like.

At act 708, while the first semiconductor workpiece and the second semiconductor workpiece are being processed, the first ambient environment and the second ambient environment are individually controlled to ensure the first ambient environment and the second ambient environment are substantially the same.

In some embodiments, individually controlling the first and second ambient environments to ensure the first and second ambient environments are substantially the same comprises calculating properties of the semiconductor fabrication tool. For example, a first set of properties for the first processing zone is calculated, and a second set of properties for the second processing zone is calculated. In further embodiments, the first set of properties may be fluid flow rates, exhaust pressures, processing fluid composition (e.g., an amount of by-products), and/or other properties of the first processing zone. In yet further embodiments, the second set of properties may be fluid flow rates, exhaust pressures, processing fluid composition, and/or other properties of the second processing zone.

For example, the first processing zone may comprise a first ambient environment region (see, e.g., FIG. 6—404a) and a second ambient environment region (see, e.g., FIG. 6—404b), which are regions of the first ambient environment. A first exhaust port (see, e.g., FIG. 6—110) may be disposed in the first ambient environment region, and a second exhaust port (see, e.g., FIG. 6—110) may be disposed in the second ambient environment region. A first sensor (see, e.g., FIG. 6—602) may be disposed in the first ambient environment region. In some embodiments, the first sensor provides a plurality of first electrical signals to measurement circuitry (see, e.g., FIG. 6—604) based on rates in which the processing fluid flows through the first exhaust port during the first period of time, such that the measurement circuitry may calculate a plurality of first fluid flow rates. A second sensor (see, e.g., FIG. 6—602) may be disposed in the second ambient environment region. In some embodiments, the second sensor provides a plurality of second electrical signals to the measurement circuitry based on rates in which the processing fluid flows through the second exhaust port during the first period of time, such that the measurement circuitry (see, e.g., FIG. 6—604) may calculate a plurality of second fluid flow rates.

The second processing zone may comprise a third ambient environment region (see, e.g., FIG. 6—404a) and a fourth ambient environment region (see, e.g., FIG. 6—404b), which are regions of the second ambient environment. A third exhaust port (see, e.g., FIG. 6—110) may be disposed in the third ambient environment region, and a fourth exhaust port (see, e.g., FIG. 6—110) may be disposed in the fourth ambient environment region. A third sensor (see, e.g., FIG. 6—602) may be disposed in the third ambient environment region. In some embodiments, the third sensor provides a plurality of third electrical signals to the measurement circuitry based on rates in which the processing fluid flows through the third exhaust port during the first period of time, such that the measurement circuitry may calculate a plurality of third fluid flow rates. A fourth sensor (see, e.g., FIG. 6—602) may be disposed in the fourth ambient environment region. In some embodiments, the fourth sensor provides a plurality of fourth electrical signals to the measurement circuitry based on rates in which the processing fluid flows through the fourth exhaust port during the first period of time, such that the measurement circuitry (see, e.g., FIG. 6—604) may calculate a plurality of fourth fluid flow rates.

In some embodiments, a first exhaust tube (see, e.g., FIG. 6—114a) is coupled to the first exhaust port, the second exhaust port, and a first individual exhaust output (see, e.g., FIG. 6—116a), such that the processing fluid may flow from the first processing zone to the first individual exhaust output. In further embodiments, the first exhaust tube comprises a first portion and a second portion that converge to the first individual exhaust output. In yet further embodiments, the first portion of the first exhaust tube is coupled to the first exhaust port, and the second portion of the first exhaust tube is coupled to the second exhaust port.

In some embodiments, a second exhaust tube (see, e.g., FIG. 6—114b) is coupled to the third exhaust port, the fourth exhaust port, and a second individual exhaust output (see, e.g., FIG. 6—116b), such that the processing fluid may flow from the second processing zone to the second individual exhaust output. In further embodiments, the second exhaust tube comprises a third portion and a fourth portion that converge to the second individual exhaust output. In yet further embodiments, the third portion of the second exhaust tube is coupled to the third exhaust port, and the fourth portion of the second exhaust tube is coupled to the fourth exhaust port.

Further, in some embodiments, individually controlling the first and second ambient environments to ensure the first and second ambient environments are substantially the same comprises adjusting a plurality of exhaust port fluid control elements (see, e.g., FIG. 6—402) based on the first set of properties and the second set of properties. For example, a first exhaust port fluid control element (see, e.g., FIG. 6—402) is disposed in the first portion of the first exhaust tube. The first exhaust port fluid control element is configured to control the first ambient environment region. In some embodiments, the first exhaust port fluid control element controls a rate in which the processing fluid exhausts from the first ambient environment region through the first exhaust port. In further embodiments, a second exhaust port fluid control element (see, e.g., FIG. 6—402) is disposed in the second portion of the first exhaust tube. The second one of the plurality of exhaust port fluid control element is configured to control the second ambient environment region. In yet further embodiments, the second exhaust port fluid control element controls a rate in which the processing fluid exhausts from the second ambient environment region through the second exhaust port.

In some embodiments, a third exhaust port fluid control element (see, e.g., FIG. 6—402) is disposed in the third portion of the second exhaust tube. The third exhaust port fluid control element is configured to control the third ambient environment region. For example, the third exhaust port fluid control element controls a rate in which the processing fluid exhausts from the third ambient environment region through the third exhaust port. In further embodiments, a fourth exhaust port fluid control element (see, e.g., FIG. 6—402) is disposed in the fourth portion of the fourth exhaust tube. The fourth exhaust port fluid control element is configured to control the fourth ambient environment region. For example, the fourth exhaust port fluid control element controls a rate in which the processing fluid exhausts from the fourth ambient environment region through the fourth exhaust port.

In some embodiments, bias circuitry (see, e.g., FIG. 6—606) is electrically coupled to the first, second, third, and fourth exhaust port fluid control elements and the measurement circuitry. The measurement circuitry may provide a plurality of fifth electrical signals to the bias circuitry, where the plurality of fifth electrical signals are based on calculations of the first set of properties and the second set of properties. For example, the plurality of fifth electrical signals may be based on a combination of the calculated plurality of first fluid flow rates, plurality of second fluid flow rates, plurality of third fluid flow rates, and plurality of fourth fluid flow rates.

Based on the plurality of fifth electrical signals, the bias circuitry may adjust the first, second, third, and fourth exhaust port fluid control elements, such that the first ambient environment and the second ambient environment are substantially the same. For example, the plurality of fifth electrical signals may indicate that there is a larger amount of the by-products in the first ambient environment than the second ambient environment (e.g., due to a difference in fluid flow rates through the first, second, third, and fourth exhaust ports). In addition, the plurality of fifth electrical signals may indicate that there is a larger amount of the by-products in the first ambient environment region than the second ambient environment region (e.g., due to a difference in fluid flow rates through the first and second exhaust ports).

The bias circuitry may individually adjust the first, second, third, and/or fourth fluid control elements by providing a plurality of sixth electrical signals to the first, second, third, and fourth exhaust port fluid control elements, respectively. For example, the plurality of sixth electrical signals may individually adjust the first and/or second fluid control element, such that the fluid flow rate through the second exhaust port is substantially the same as the fluid flow rate through the first exhaust port, thereby ensuring the first ambient environment region is substantially the same as the second ambient environment region. Further, the plurality of sixth electrical signals may individually adjust the third and/or fourth fluid control elements, such that the fluid flow rates through the third and fourth exhaust ports are substantially the same as the fluid flow rates through the first and second exhaust ports, thereby ensuring the first and second ambient environment regions are substantially the same. It will be appreciated that, in some embodiments, to ensure the first and second ambient environments are substantially the same, the plurality of sixth electrical signals may adjust the first, second, third, and/or fourth fluid control elements, such that the fluid flow rates through the first, second, third, and/or fourth exhaust ports are different.

In some embodiments, while the first and second semiconductor workpieces are being processed, the bias circuitry may continuously adjust the first, second, third, and/or fourth exhaust port fluid control elements to ensure the first ambient environment and the second ambient environment are substantially the same. In further embodiments, the bias circuitry may continuously adjust the first, second, third, and fourth exhaust port fluid control elements automatically (e.g., without input from an operator). In other embodiments, the first, second, third, and/or fourth exhaust port fluid control elements may be adjusted manually (e.g., by an operator).

Because the semiconductor fabrication tool may individually adjust the first, second, third, and/or fourth exhaust port fluid control elements, the first and second ambient environments (and the first, second, third, and fourth ambient environment regions) may be individually controlled. Accordingly, fabrication process(es) performed in the semiconductor fabrication tool (e.g., forming a piezoelectric layer via a sol-gel process) may be improved between (and within) the first and second processing zones (e.g., improved permittivity uniformity between piezoelectric layers formed in the first processing zone and the second processing zone, improved permittivity uniformity across a piezoelectric layer formed in the first or second processing zone, etc.)

At act 710, the first semiconductor workpiece and the second semiconductor workpiece are heated to a second processing temperature for a second period of time, such that a first layer is formed on the first semiconductor workpiece and a second layer is formed on the second semiconductor workpiece.

In some embodiments, the first semiconductor workpiece is heated to the second processing temperature by a first anneal process (e.g., rapid thermal anneal (RTA), microwave anneal, furnace anneal, etc.). By heating the first semiconductor workpiece to the second processing temperature for the second period of time, the first layer (e.g., a piezoelectric layer) may be formed on the first semiconductor workpiece (e.g., via crystallization of the first gel layer). In further embodiments, the first layer may be or comprise, for example, lead zirconate titanate (PZT), or some other piezoelectric material. In yet further embodiments, the first semiconductor workpiece may be heated to the second processing temperature outside of the processing chamber of the semiconductor fabrication tool.

In some embodiments, the second semiconductor workpiece is heated to the second processing temperature by a second anneal process (e.g., rapid thermal anneal (RTA), microwave anneal, furnace anneal, etc.). By heating the second semiconductor workpiece to the second processing temperature for the second period of time, the second layer (e.g., a piezoelectric layer) may be formed on the second semiconductor workpiece (e.g., via crystallization of the second gel layer). In further embodiments, the second layer may be or comprise, for example, lead zirconate titanate (PZT), or some other piezoelectric material. In yet further embodiments, the second semiconductor workpiece may be heated to the second processing temperature outside of the processing chamber of the semiconductor fabrication tool.

In some embodiments, the second period of time may be greater than about 60 seconds. In further embodiments, the second processing temperature may be greater than about 600° C. In further embodiments, the second processing temperature may be about 700° C. In yet further embodiments, the second processing temperature may be a sol-gel crystallization temperature. It will be appreciated that, in some embodiments, after the first and second piezoelectric layers are formed, additional layers (e.g., a metal layer, an oxide layer, a nitride layer, etc.) may be formed on/over the first and/or second layers.

In some embodiments, the present application provides a semiconductor fabrication tool. The semiconductor fabrication tool comprises a first processing zone and a second processing zone disposed at different locations inside a processing chamber. The first processing zone has a first ambient environment and the second processing zone has a second ambient environment, where gas-phase particles are disposed throughout the first and second ambient environments. A first exhaust port is disposed in the first processing zone. A first exhaust pipe is coupled to the first exhaust port and a first individual exhaust output. Further, the semiconductor fabrication tool comprises a first adjustable fluid control element that is configured to control the first ambient environment by adjusting a first fluid flow rate corresponding to a rate in which the gas-phase particles flow through the first exhaust port. A second exhaust port is disposed in the second processing zone. A second exhaust pipe is coupled to the second exhaust port and a second individual exhaust output, where the first exhaust pipe and the second exhaust pipe are separate from one another. Moreover, the semiconductor fabrication tool comprises a second adjustable fluid control element that is configured to control the second ambient environment by adjusting a second fluid flow rate corresponding to a rate in which the gas-phase particles flow through the second exhaust port, where the first adjustable fluid control element and the second adjustable fluid control element are independently adjustable.

In other embodiments, the present application provides a semiconductor fabrication tool. The semiconductor fabrication tool comprises a first processing zone disposed at a first location inside a processing chamber, where the first processing zone comprises a first heating element configured to heat a first semiconductor workpiece, and where a processing fluid is dispersed throughout the first processing zone. A first exhaust port and a second exhaust port are disposed in the first processing zone, where the first exhaust port and the second exhaust port are disposed at different locations in the first processing zone. A first exhaust pipe is coupled to the first exhaust port and the second exhaust port. A first port fluid control element is disposed in a first portion of the first exhaust pipe and is configured to control a first fluid flow rate that corresponds to a rate in which the processing fluid flows through the first exhaust port. A second exhaust port fluid control element is disposed in a second portion of the first exhaust pipe and is configured to control a second fluid flow rate that corresponds to a rate in which the processing fluid flows through the second exhaust port.

In yet other embodiments, the present application provides a method for forming a layer on a semiconductor workpiece. The method comprises forming a first processing solution on a first semiconductor workpiece. A second processing solution is formed on a second semiconductor workpiece. The first semiconductor workpiece is placed into a first processing zone of a processing chamber, where the first processing zone has a first ambient environment. The second semiconductor workpiece is placed into a second processing zone of the processing chamber, where the second processing zone has a second ambient environment. The first semiconductor workpiece and the second semiconductor workpiece are heated to a processing temperature for a period of time, such that by-products from the first processing solution and the second processing solution form a processing fluid that is disposed throughout the first ambient environment and the second ambient environment. During the period of time, the first ambient environment and the second ambient environment are individually controlled to ensure the first ambient environment and the second ambient environment are substantially the same.

The foregoing outlines features of several embodiments so that those skilled in the art may better understand the aspects of the present disclosure. Those skilled in the art should appreciate that they may readily use the present disclosure as a basis for designing or modifying other processes and structures for carrying out the same purposes and/or achieving the same advantages of the embodiments introduced herein. Those skilled in the art should also realize that such equivalent constructions do not depart from the spirit and scope of the present disclosure, and that they may make various changes, substitutions, and alterations herein without departing from the spirit and scope of the present disclosure.

Claims

1. A semiconductor fabrication tool, comprising: a first processing zone having a first process environment and a second processing zone having a second process environment disposed at different locations inside a processing chamber, wherein gas-phase particles are disposed throughout the first and second process environments;a first exhaust port disposed in the first processing zone;a first exhaust pipe coupled to the first exhaust port and a first individual exhaust output;a first adjustable fluid control element configured to control the first process environment by adjusting a first fluid flow rate corresponding to a rate in which the gas-phase particles flow through the first exhaust port;a second exhaust port disposed in the second processing zone;a second exhaust pipe coupled to the second exhaust port and a second individual exhaust output, wherein the first exhaust pipe and the second exhaust pipe are separate from one another; anda second adjustable fluid control element configured to control the second process environment by adjusting a second fluid flow rate corresponding to a rate in which the gas-phase particles flow through the second exhaust port, wherein the first adjustable fluid control element and the second adjustable fluid control element are independently adjustable.
2. The semiconductor fabrication tool of claim 1, further comprising: a first heating element disposed in the first processing zone, the first heating element configured to heat a first semiconductor workpiece to a first processing temperature; anda second heating element disposed in the second processing zone, the second heating element configured to heat a second semiconductor workpiece to a second processing temperature.
3. The semiconductor fabrication tool of claim 2, further comprising: measurement circuitry configured to monitor the first process environment and the second process environment; andbias circuitry electrically coupled to the measurement circuitry, the first adjustable fluid control element, and the second adjustable fluid control element, wherein: based on the first process environment, the bias circuitry provides a first electrical signal to the first adjustable fluid control element to adjust the first fluid flow rate; andbased on the second process environment, the bias circuitry provides a second electrical signal to the second adjustable fluid control element to adjust the second fluid flow rate.
4. The semiconductor fabrication tool of claim 3, wherein the gas-phase particles comprise by-products of a sol-gel pyrolysis process.
5. The semiconductor fabrication tool of claim 4, wherein the bias circuitry provides the first electrical signal to the first adjustable fluid control element and the second electrical signal to the second adjustable fluid control element, such that the first process environment and the second process environment comprise substantially the same amount of the by-products of the sol-gel pyrolysis process.
6. The semiconductor fabrication tool of claim 5, further comprising: a hotplate tray comprising the first heating element, the hotplate tray having sidewalls that extend vertically from a bottom surface.
7. The semiconductor fabrication tool of claim 6, wherein the first processing zone is disposed above the second processing zone.
8. The semiconductor fabrication tool of claim 7, wherein: the first adjustable fluid control element is disposed in the first exhaust pipe; andthe second adjustable fluid control element is disposed in the second exhaust pipe.
9. The semiconductor fabrication tool of claim 8, wherein the first adjustable fluid control element and the second adjustable fluid control element are pumps or valves.
10. The semiconductor fabrication tool of claim 9, wherein the first processing temperature and the second processing temperature are a sol-gel pyrolysis temperature.
11. A semiconductor fabrication tool, comprising: a first processing zone disposed at a first location inside a processing chamber, the first processing zone comprising a first heating element configured to heat a first semiconductor workpiece, wherein a processing fluid is dispersed throughout the first processing zone;a first exhaust port and a second exhaust port disposed in the first processing zone, wherein the first exhaust port and the second exhaust port are disposed at different locations in the first processing zone;a first exhaust pipe coupled to the first exhaust port and the second exhaust port, wherein: a first exhaust port fluid control element is disposed in a first portion of the first exhaust pipe and is configured to control a first fluid flow rate that corresponds to a rate in which the processing fluid flows through the first exhaust port; anda second exhaust port fluid control element is disposed in a second portion of the first exhaust pipe and is configured to control a second fluid flow rate that corresponds to a rate in which the processing fluid flows through the second exhaust port.
12. The semiconductor fabrication tool of claim 11, further comprising: measurement circuitry configured to calculate the first fluid flow rate and the second fluid flow rate; andbias circuitry electrically coupled to the measurement circuitry, the first exhaust port fluid control element, and the second exhaust port fluid control element, wherein: based on the calculated first fluid flow rate, the bias circuitry provides a first electrical signal to the first exhaust port fluid control element to adjust the first fluid flow rate; andbased on the calculated second fluid flow rate, the bias circuitry provides a second electrical signal to the second exhaust port fluid control element to adjust the second fluid flow rate; andthe bias circuitry provides the first electrical signal to the first exhaust port fluid control element and the second electrical signal to the second exhaust port fluid control element, such that the first fluid flow rate and the second fluid flow rate are substantially the same.
13. The semiconductor fabrication tool of claim 11, further comprising: a second processing zone disposed at a second location inside the processing chamber different than the first location, the second processing zone comprising a second heating element configured to heat a second semiconductor workpiece, wherein the processing fluid is dispersed throughout the first and second processing zones;a third exhaust port and a fourth exhaust port disposed in the second processing zone, wherein the third exhaust port and the fourth exhaust port are disposed at different locations in the second processing zone; anda second exhaust pipe coupled to the third exhaust port and the fourth exhaust port, wherein: a third exhaust port fluid control element is disposed in a third portion of the second exhaust pipe and is configured to control a third fluid flow rate that corresponds to a rate in which the processing fluid flows through the third exhaust port; anda fourth exhaust port fluid control element is disposed in a fourth portion of the second exhaust pipe and is configured to control a fourth fluid flow rate that corresponds to a rate in which the processing fluid flows through the fourth exhaust port.
14. The semiconductor fabrication tool of claim 13, further comprising: measurement circuitry configured to calculate the first fluid flow rate, the second fluid flow rate, the third fluid flow rate, and the fourth fluid flow rate; andbias circuitry electrically coupled to the measurement circuitry, the first exhaust port fluid control element, the second exhaust port fluid control element, the third exhaust port fluid control element, and the fourth exhaust port fluid control element, wherein: based on the calculated first fluid flow rate, the bias circuitry provides a first electrical signal to the first exhaust port fluid control element to adjust the first fluid flow rate;based on the calculated second fluid flow rate, the bias circuitry provides a second electrical signal to the second exhaust port fluid control element to adjust the second fluid flow rate;based on the calculated third fluid flow rate, the bias circuitry provides a third electrical signal to the third exhaust port fluid control element to adjust the third fluid flow rate; andbased on the calculated fourth fluid flow rate, the bias circuitry provides a fourth electrical signal to the fourth exhaust port fluid control element to adjust the fourth fluid flow rate.
15. The semiconductor fabrication tool of claim 14, wherein the bias circuitry provides the first electrical signal to the first exhaust port fluid control element, the second electrical signal to the second exhaust port fluid control element, the third electrical signal to the third exhaust port fluid control element, and the fourth electrical signal to the fourth exhaust port fluid control element, such that a sum of the first fluid flow rate and the second fluid flow rate is substantially the same as a sum of the third fluid flow rate and the fourth fluid flow rate.
16. The semiconductor fabrication tool of claim 15, wherein: the first exhaust pipe couples both the first exhaust port and the second exhaust port to a first individual exhaust output; andthe second exhaust pipe couples both the third exhaust port and the fourth exhaust port to a second individual exhaust output.
17. The semiconductor fabrication tool of claim 16, wherein: the processing chamber comprises a first sidewall and a second sidewall, and wherein the first sidewall and the second sidewall are spaced apart in a first direction;the first exhaust port and the second exhaust port are spaced about evenly from the first sidewall, and wherein the first exhaust port and the second exhaust port are spaced apart in a second direction perpendicular to the first direction; andthe third exhaust port and the second exhaust port are spaced about evenly from the second sidewall, and wherein the third exhaust port and the fourth exhaust port are spaced apart in the second direction.
18. The semiconductor fabrication tool of claim 14, further comprising: wherein the bias circuitry provides the first electrical signal to the first exhaust port fluid control element, the second electrical signal to the second exhaust port fluid control element, the third electrical signal to the third exhaust port fluid control element, and the fourth electrical signal to the fourth exhaust port fluid control element, such that the first fluid flow rate, the second fluid flow rate, the third fluid flow rate, and the fourth fluid flow rate are substantially the same.
19. A method for forming layers on semiconductor workpieces, respectively, the method comprising: forming a first processing solution on a first semiconductor workpiece and a second processing solution on a second semiconductor workpiece;placing the first semiconductor workpiece into a first processing zone of a processing chamber, wherein the first processing zone has a first process environment;placing the second semiconductor workpiece into a second processing zone of the processing chamber, wherein the second processing zone has a second process environment;processing the first semiconductor workpiece and the second semiconductor workpiece for a period of time; andduring the period of time, individually controlling the first process environment and the second process environment to ensure the first process environment and the second process environment are substantially the same.
20. The method of claim 19, wherein: processing the first semiconductor workpiece and the second semiconductor workpiece for the period of time comprises: heating the first semiconductor workpiece and the second semiconductor workpiece to a processing temperature for the period of time, such that by-products from the first processing solution and the second processing solution form a processing fluid that is disposed throughout the first process environment and the second process environment; andindividually controlling the first process environment and the second process environment to ensure the first process environment and the second process environment are substantially the same comprises: determining an amount of the by-products in the first process environment and an amount of the by-products in the second process environment; andbased on the amount of the by-products in the first process environment and the amount of the by-products in the second process environment, adjusting a rate in which the processing gas is exhausted from the first processing zone and/or the second processing zone, such that the amount of the by-products in the first process environment is substantially the same as the amount of the by-products in the second process environment.

REFERENCE TO RELATED APPLICATION

This application claims priority to U.S. Provisional Application No. 62/752,746 filed on Oct. 30, 2018, the contents of which are hereby incorporated by reference in their entirety.

Provisional Applications (1)

	Number	Date	Country
	62752746	Oct 2018	US

SEMICONDUCTOR TOOL HAVING CONTROLLABLE AMBIENT ENVIRONMENT PROCESSING ZONES

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REFERENCE TO RELATED APPLICATION

Provisional Applications (1)