The present invention relates to a shieldable circuit board structure, in particular to a stacked three-layer structure with an insulating layer, a conductive layer, and a protective layer sequentially formed on the surface of the circuit board. And deionized water and volatile alcohols are added to each layer respectively, so that the rheological strength of each layer can be controlled by deionized water and volatile alcohols.
In order to solve the problems of EMI (Electromagnetic Interference), noise, crosstalk or heat dissipation, some manufacturers install metal shells on the circuit boards of electronic devices. The metal shell is used to cover the outside of the electronic components, and the metal shell is used to sense, absorb and shield electromagnetic waves, crosstalk, noise and provide heat dissipation. However, the circuit board equipped with a metal shell will increase the overall thickness, and the mold opening and assembly of the metal shell during production and manufacturing will also consume a lot of time and cost, thus failing to meet the development trend of electronic devices to be lighter, thinner, shorter and smaller.
Furthermore, in order to improve the market competitiveness of electronic devices, some related companies have developed a thin film structure with multiple layers of insulating layer, conductive layer of metal material (such as silver glue, etc.) coated on the surface of the circuit board, so that the circuit board can be designed in the form of a thin structure. The conductive layer of the metal material is attached to the surface of multiple electronic components on the circuit board through a glue dispensing process. However, the commonly used physical vapor deposition (PVD) and chemical vapor deposition (CVD) methods can form thin film structures on circuit boards. Although the conductive layer of metal materials (such as silver glue, etc.) can be formed into a thin film layer through high-temperature, high-energy sputtering, evaporation, etc., it will cause damage to the insulating layer below the conductive layer, and the conductive layer of metal materials (such as silver glue, etc.) can only be processed through the glue dispensing process.
Furthermore, when the relevant industry uses the glue dispensing process to form a thin film structure on the multiple electronic components on the circuit board, the edges and peripheries of the top sides of the multiple electronic components are prone to difficult adhesion, which in turn causes the film structure on the circuit board to have uneven thickness. When the thin circuit board is bent, the film structure will also crack. To this end, the relevant industry has significantly increased the stacking thickness of the thin film structure so that the thin film structure can completely cover the surface of multiple electronic components. However, a significant increase in the stacking thickness will also increase the amount of thin film material used in the process, resulting in higher material costs, longer film baking time, and longer production and processing time. And the thickness of the thin circuit board will also increase with the thickness of the film structure.
Therefore, how to solve the above problems and deficiencies is what those working in this industry are eager to study and improve.
The main object of the present invention is to provide a shieldable circuit board structure, which comprises a circuit board with a plurality of electronic components with chips welded on its surface, and a copper foil layer arranged inside the circuit board and extended to the surface position of the periphery of each electronic component, and a stacked three-layer structure of insulating layer, conductive layer and protective layer formed in sequence on the surface of the circuit board. There is no need to assemble a metal shell for shielding, so as to achieve the overall volume reduction. Through the deionized water and volatile alcohols in each layer, a large number of unreacted functional groups can be found in each layer. The rheology can be controlled by volatile alcohols and deionized water through the gaps between hydrogen bonds, so that each layer can form a film of uniform thickness when it is transformed from a wet film to a dry film and cover the electronic components on the circuit board.
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The components of the insulating layer 3 comprise a first base material (approximately 30% to 90% by weight), a first crosslinking agent (approximately 0.3% to 10% by weight), deionized water (approximately 10% to 30% by weight), and volatile alcohols (approximately 30% to 60% by weight). The first base material comprises one or a combination of polyurethane, polyimide, polycarbonate, polyamide, epoxy resin, polyethyleneimine, polymethylsiloxane, acrylic polymer, ether polymer or polyolefin. The first crosslinking agent comprises: high imine methyl ether melamine resin (hmmm) or aziridine or garbodiimide or epoxy crosslinking agent. The volatile alcohol component is: one of methanol or ethanol.
The conductive layer 4 comprises: a second base material (approximately 20% to 50% by weight), a binder (approximately 1% to 40% by weight), a second crosslinking agent (approximately 0.3% to 10% by weight), deionized water (approximately 10% to 30% by weight), and volatile alcohols (approximately 30% to 60% by weight). The components of the second base material comprise: carbon nanotubes, graphene, graphite powder and conductive colloid (such as silver glue, gold glue or copper glue, etc.). The components of the binder comprise: one or a combination of polyurethane, polyimide, polycarbonate, polyamide, polyethylene terephthalate, polyethylene naphthalate, polyethyleneimine, polydimethylsiloxane, acrylic polymer, ether polymer or polyolefin. The second crosslinking agent comprises: high imine methyl ether melamine resin (hmmm) or aziridine or garbodiimide. The volatile alcohol component is one of methanol and ethanol.
The protective layer 5 comprises: a third base material (approximately 20% to 50% by weight), a heat dissipation material (approximately 10% to 40% by weight), a third crosslinking agent (approximately 0.3% to 10% by weight), deionized water (approximately 10% to 30% by weight), and volatile alcohols (approximately 30% to 60% by weight). The third base material comprises one or a combination of polyurethane, polyimide, polycarbonate, polyamide, polyethylene terephthalate, polyethylene naphthalate, polyethyleneimine, polydimethylsiloxane, acrylic polymer, ether polymer or polyolefin. The components of the heat dissipation material comprise: boron nitride, aluminum oxide, aluminum nitride, etc. The third crosslinking agent comprises: high imine methyl ether melamine resin (hmmm) or aziridine or garbodiimide, etc. The volatile alcohol component is one of methanol and ethanol.
However, the first base material, the first crosslinking agent, the deionized water and the volatile alcohols in the insulating layer 3 will also produce the same reaction and phenomenon as the wet film 41 and the dry film 42 of the conductive layer 4 after mixing. The third base material, the third crosslinking agent, the deionized water and the volatile alcohols in the protective layer 5 will also produce the same reaction and phenomenon as the wet film 41 and the dry film 42 of the conductive layer 4 after mixing. Here, the conductive layer 4 is used as an example for description and illustration. The main protection point of the present invention is to add and mix deionized water and volatile alcohols to each layer so that each layer forms a wet film 41 and a dry film 42.
When the conductive layer 4 is in a wet film 41 state, the particles in the second base material mixed with the binder are divided into: charged non-ionic type (for example: carbon tube, graphene, etc.), cationic (for example: silver colloid, etc.), and anionic (mixed polymer material). When migration occurs between charged non-ionic type, cationic and anionic, the cationic silver ions will sink to the bottom to form an electrical connection with the contact, and the charged non-ionic type polymer material floating on the upper surface forms a high-impedance protective layer. Thereby, the protective layer 5 can be added or not added on the conductive layer 4 according to product requirements and process requirements.
When the conductive layer 4 is in a dry film 42 state, the second base material mixed with the second crosslinking agent can utilize the second crosslinking agent to produce a close bonding effect between the particles of the components through chemical bonds, thereby providing the conductive layer 4 with a viscosity of about 30000 Pa·s (poise) to 100000 Pa·s (poise), so that the conductive layer 4 can be coated on the surface of the circuit board 1 to form a stable and firm effect. At the same time, the insulating layer 3 and the protective layer 5 can also form a close bonding effect with a viscosity of about 30000 Pa·s (poise) to 100000 Pa·s (poise) through the first crosslinking agent and the first base material, the third crosslinking agent and the third base material. The electronic components 2 can be packaged on the circuit board 1 through the insulating layer 3, the conductive layer 4, and the protective layer 5, so that the circuit board 1 can be designed in a soft, flexible and thin structure, thereby meeting the development trend of various electronic products such as smart phones, smart watches or wearable devices.
In addition, in the preferred embodiment of the present invention, the copper foil layer 11 is integrated into the circuit board 1, and one side of the surface is flat against the surface of the circuit board 1. One side of the surface of the copper foil layer 11 can also be higher or lower than the surface of the circuit board 1, so that the surface of the copper foil layer 11 can be exposed on one side of the surface of the electronic components 2 on the circuit board 1. Such simple equivalent changes and modifications do not limit the scope of protection of this creation.
In a preferred embodiment of the present invention, the circuit board 1 is a flexible circuit board (FPC) or the like, and the circuit board 1 has at least one copper foil layer 11 for forming a contact. The preferred thickness range of the copper foil layer 11 is about 0.3 mm to 0.8 mm (millimeter).
Therefore, the present invention has the following advantages when applied in practice:
This application is a Continuation-In-Part of application Ser. No. 18/687,567, filed on Feb. 28, 2024; application Ser. No. 18/687,567, filed on Feb. 28, 2024 is a U.S. National Stage of International Application No. PCT/CN2021/000175, filed on Aug. 30, 2021, for which priority is claimed under 35 U.S.C. § 120, the entire contents of which are hereby incorporated by reference.
Number | Date | Country | |
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Parent | 18687567 | Feb 2024 | US |
Child | 18889865 | US |