Claims
- 1. A magnetoresistive sensor having an MR stack, a first contact and a second contact, a first hard bias element and a second hard bias element and a first pedestal and a second pedestal, characterized by:
the first contact and second contact are formed from a material with characteristics of high permeability, low coercivity, high electrical conductivity, and low magnetoresistive signal; and the first pedestal and the second pedestal are formed from a material with characteristics of high permeability, low coercivity and low magnetoresistive signal.
- 2. The magnetoresistive sensor of claim 1 wherein the magnetoresistive sensor additionally comprises:
a first lower spacer placed between the first hard bias element and the first pedestal that magnetically decouples the first hard bias element and the first pedestal; and a second lower spacer placed between the second hard bias element and the second pedestal that magnetically decouples the second hard bias element and the second pedestal; a first upper spacer placed between the first hard bias element and the first contact that magnetically decouples the first hard bias element and the first contact; and a second upper spacer placed between the second hard bias element arid the second contact that magnetically decouples the second hard bias element and the second contact.
- 3. The magnetoresistive sensor of claim 1 wherein the material is chosen from a group consisting of: NiFeCu, CoZrTa, CoZrNb, cobalt amorphous materials, and ferromagnetic particles in a conductive non-magnetic matrix.
- 4. The magnetoresistive sensor of claim 1 wherein the material is NiFeCu wherein Ni is between about 45% to about 80%, Fe is between about 5% to about 20% and Cu is between about 10% to about 50%.
- 5. The magnetoresisitive sensor of claim 1 wherein the material is chosen from a group consisting of: 52.6 a/oNi 9.6 a/oFe 37.8 a/oCu, 52.8 a/oNi 7.3 a/oFe 39.9 a/oCu, and 71.4 a/oNi 14.6 a/oFe 14.0 a/oCu.
- 6. A magnetoresistive sensor having an MR stack, a first hard bias element, a second hard bias element, a first contact, a second contact, the magnetoresistive sensor characterized by:
the first and second contact are formed from a magnetically soft material; a first spacer placed between the first hard bias element and the first contact that magnetically decouples the first hard bias element and the first side shield; and a second spacer placed between the second hard bias element and the second contact that magnetically decouples the second hard bias element and the second side shield.
- 7. The magnetoresistive sensor of claim 6 wherein the magnetically soft material is chosen from a group consisting of: NiFeCu, CoZrTa, CoZrNb, cobalt amorphous materials, and ferromagnetic particles in a conductive non-magnetic matrix.
- 8. The magnetoresistive sensor of claim 6 wherein the material is NiFeCu wherein Ni is between about 45% to about 80%, Fe is between about 5% to about 20% and Cu is between about 10% to about 50%.
- 9. The magnetoresisitive sensor of claim 6 wherein the material is chosen from a group consisting of: 52.6 a/oNi 9.6 a/oFe 37.8 a/oCu, 52.8 a/oNi 7.3 a/oFe 39.9 a/oCu, and 71.4 a/oNi 14.6 a/oFe 14.0 a/oCu.
- 10. A magnetoresistive sensor having an MR stack, a hard bias element and a pedestal for the hard bias element, wherein the pedestal is formed from a material with characteristics of high permeability, low coercivity and low magnetoresistive signal.
- 11. The magnetoresistive sensor of claim 10 wherein a spacer placed between the hard bias element and the pedestal that magnetically decouples the hard bias element and the pedestal.
- 12. The magnetoresistive sensor of claim 10 wherein the materials are chosen from a group consisting of: NiFeCu, CoZrTa, CoZrNb, cobalt amorphous materials, and ferromagnetic particles in a conductive non-magnetic matrix.
- 13. The magnetoresistive sensor of claim 10 where in the material is NiFeCu wherein Ni is between about 45% to about 80%, Fe is between about 5% to about 20% and Cu is between about 10% to about 50%.
- 14. The magnetoresisitive sensor of claim 10 wherein the material is chosen from a group consisting of: 52.6 a/oNi 9.6 a/oFe 37.8 a/oCu, 52.8 a/oNi 7.3 a/oFe 39.9 a/oCu, and 71.4 a/oNi 14.6 a/oFe 14.0 a/oCu.
- 15. A magnetoresistive sensor having an MR stack, and first and second side shields, characterized by:
the first side shield including: a first hard bias element, a first contact, a first pedestal, a first upper spacer and a first lower spacer, wherein the first lower spacer magnetically decouples the first hard bias element and the first pedestal, and wherein the first upper spacer magnetically decouples the first hard bias element and the first contact; and the second side shield comprising: a second hard bias element, a second contact, a second pedestal, a second upper spacer and a second lower spacer, wherein the second lower spacer magnetically decouples the second hard bias element and the second pedestal, and wherein the second upper spacer magnetically decouples the second hard bias element and the second contact.
- 16. A magnetoresistive sensor of claim 15 wherein the first and second side shields are at least partially formed from a material with characteristics of high electrical conductivity, high permeability, low coercivity and low magnetoresistive signal.
- 17. A magnetoresistive sensor comprising:
a plurality of generally parallel layers forming an MR stack, the MR stack having a first side, a second side, a top and a bottom; a first hard bias element having a top and a bottom, wherein the s first hard bias element is placed adjacent to the first side of the MR stack; a first spacer having a top and a bottom, wherein the bottom of the first spacer is placed adjacent to the top of the first hard bias element, wherein the first spacer is formed of non-magnetic material; a first contact placed adjacent to the top of the first spacer on either side of the MR stack and contacting the MR stack, wherein the first contact is formed of soft bias material with the properties of high electrical conductivity, high permeability and low coercivity, and wherein the first spacer magnetically decouples the first contact from the first hard bias element; a second hard bias element having a top and a bottom, wherein the second hard bias element is placed adjacent to the second side of the MR stack; a second spacer have a top and a bottom, wherein the bottom of the second spacer is placed adjacent to the top of the second hard bias element, wherein the second spacer is formed of non-magnetic material; and a second contact placed adjacent to the top of the second spacer and contacting the MR stack, wherein the second contact is formed of soft bias material with the properties of high electrical conductivity, high permeability and low coercivity, and wherein the second spacer magnetically decouples the second contact from the second hard bias element.
- 18. The magnetoresistive sensor of claim 17, and further comprising:
a first lower spacer of non-magnetic material, wherein the first lower spacer has a top and a bottom, and the top of the first lower spacer is placed adjacent to the bottom of the first hard bias element; a first pedestal placed adjacent to the bottom of the first lower spacer, wherein the pedestal is formed of soft bias material of high permeability and low coercivity, and wherein the first pedestal is magnetically decoupled from the first hard bias element; a second lower spacer of non-magnetic material, wherein the second lower spacer has a top and a bottom, and the top of the second lower spacer is placed adjacent to the bottom of the second hard bias element; a second pedestal placed adjacent to the bottom of the second lower spacer, wherein the pedestal is formed of soft bias material of high permeability and low coercivity, and wherein the second pedestal is magnetically decoupled from the second hard bias element;
CROSS-REFERENCE TO RELATED APPLICATION
[0001] This application claims priority from Provisional Application No. 60/386,635 filed Jun. 5, 2002, for Side Shielded Current In Plane Spin-Valve.
Provisional Applications (1)
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Number |
Date |
Country |
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60386635 |
Jun 2002 |
US |