Claims
- 1. A method of making high-strength silicon carbide filament in a continuous process comprising the steps of:
- passing a carbonaceous filament through a reactor;
- heating the filament to a temperature of 1400.degree.-1500.degree. C.;
- exposing the filament while at an elevated temperature to a mixture consisting essentially of a blend of dimethyldichlorosilane and monomethyldichlorosilane, hydrogen and a substance capable of releasing carbon when heated for forming a carbon rich silicon carbide coating on the filament;
- adding additional silane blend and hydrogen to said mixture to lower the temperature of said filament; and
- exposing the carbon rich silicon carbide coating to the mixture with said added silane and hydrogen for effecting the deposition of a silicon carbide coating on said carbon rich silicon carbide layer.
- 2. A method as described in claim 1 wherein said silicon carbide coating is formed at 1200.degree.-1400.degree. C.
- 3. A method as described in claim 2 wherein in addition an outer coating of carbon rich silicon carbide is deposited on the silicon carbide coating by raising the temperature of said filament and adding a source of carbon to said mixture.
- 4. A method of making a high-strength silicon carbide filament in a continuous process comprising the steps of:
- passing a carbonaceous filament through a tubular reactor;
- exposing the filament while at an elevated temperature of 1400.degree.-1500.degree. C. to a mixture consisting essentially of a blend of dimethyldichlorisilane and monomethyldichlorisilane, hydrogen, argon, and a substance capable of releasing carbon when heated for depositing a carbon rich silicon carbide layer on the filament;
- diluting said argon and carbon in said mixture with additional silane and hydrogen for lowering the temperature of said filament; and
- exposing the carbon rich silicon carbide layer to said diluted mixture at said lower temperature for effecting the deposition of a silicon carbide coating on said carbon rich silicon carbide layer.
- 5. A method as described in claim 4 wherein the diluent includes also nitrogen and air.
- 6. A method as described in claim 4 wherein said silicon carbide coating is formed at 1200.degree.-1400.degree. C.
- 7. A method as described in claim 4 wherein additional quantities of argon and a source of carbon are added to decrease the heat loss from said filament and for depositing a second carbon rich silicon carbide coating on said filament, respectively.
BACKGROUND OF THE INVENTION
This is a division of application Ser. No. 646,029 filed Jan. 2, 1976, now U.S. Pat. No. 4,068,037.
US Referenced Citations (12)
Divisions (1)
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Number |
Date |
Country |
Parent |
646029 |
Jan 1976 |
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