Claims
- 1. An apparatus for applying spin-on-glass material to a wafer under controlled humidity conditions comprising:
- a treatment chamber;
- a spin-on-glass coater spin table within said treatment chamber;
- a plurality of hotplates within said treatment chamber connected to one another and from said coater spin table by a moving belt;
- wafer handlers within said treatment chamber to transfer wafers, onto said coater spin table and onto said moving belt;
- a dehumidifier disposed on top of said treatment chamber; and
- a humidity control unit on top of said dehumidifier through which air is drawn and whereby relative humidity within said treatment chamber can be controlled.
- 2. An apparatus for applying spin-on-glass material to a wafer under controlled humidity conditions comprising:
- a spin-on-glass coater spin table;
- an enclosure completely covering said coater spin table;
- a dehumidifier incorporated with a top of said enclosure; and
- a humidity control unit disposed on top of said dehumidifier through which air is drawn and whereby relative humidity within said enclosure can be controlled to less than about 35%.
- 3. An apparatus of claim 13 wherein said humidity control unit further comprises means for flowing dry nitrogen gas into said enclosure until desired relative humidity is achieved.
Parent Case Info
This is a divisional of application Ser. No. 08/094,705, filed Jul. 22, 1993, now U.S. Pat. No. 5,371, 046.
US Referenced Citations (8)
Foreign Referenced Citations (1)
Number |
Date |
Country |
0053421 |
Mar 1989 |
JPX |
Divisions (1)
|
Number |
Date |
Country |
Parent |
94705 |
Jul 1993 |
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