Claims
- 1. A spin castable mixture comprising by weight
- (A) 100 parts of organic solvent,
- (B) 1 to 30 parts of inert organic polymer binder,
- (C) 1 to 30 parts of aryl nitrone,
- where the spin castable mixture forms a photobleachable layer when cast upon a photoresist substrate comprising a novolak or polyvinylphenol which is initially relatively opaque to light of a predetermined wavelength in the range of 300 to 450 nm prior to photobleaching, and after photobleaching, the photobleachable layer is substantially transparent to such light, the organic binder in the spin castable mixture is sufficient inert with respect to the aryl nitrone during photobleaching to allow for the total stripping of the resulting photobleached material without affecting the photoresist substrate.
- 2. A spin castable mixture in accordance with claim 1 where the aryl nitrone has the formula ##STR27## where Z is a monovalent group selected from (R.sup.3).sub.a --Q--R.sup.4 --, or R.sup.5 --, Z' is a group having the formula
- --R.sup.6 (X).sub.b,
- R, R.sup.1, R.sup.2 and R.sup.3 are monovalent radicals selected from the class consisting of hydrogen, C.sub.(1-8) alkyl, C.sub.(1-8) substituted alkyl, C.sub.(6-13) aryl hydrocarbon and C.sub.(6-13) substituted aryl hydrocarbon, Q is a monovalent, divalent, or trivalent atom selected from the group consisting of F, C, Br, I, O, S, and N, a has a value of 0, 1 or 2, R.sup.4 is a C.sub.(6-13) aryl hydrocarbon or a C.sub.(6-13) substituted aryl hydrocarbon, R.sup.5 is selected from the group consisting of substituted or unsubstituted C.sub.(6-20) aromatic heterocyclic compounds incorporating one or more atoms from the group consisting of O, N or S, R.sup.6 is selected from C.sub.(6-20) aromatic hydrocarbon radicals, X is selected from the group consisting of halo, cyano, alkylcarbonyl, C.sub.(1-8) alkyl radicals, C.sub.(1-8) substituted alkyl radicals, C.sub.(6-13) aryl hydrocarbon radicals, C.sub.(6-13) substituted aryl hydrocarbon radicals, and alkoxycarbonyl, b has a value of 0 to 3 inclusive and n has a value of 0 to 4 inclusive.
- 3. A spin castable mixture in accordance with claim 1, where the organic solvent is ethylbenzene.
- 4. A spin castable mixture in accordance with claim 1, where the organic solvent is toluene.
- 5. A spin castable mixture in accordance with claim 1, where the organic solvent is a butanol solvent.
- 6. A spin castable mixture in accordance with claim 1, where there is utilized, per hundred parts of organic solvent, 5-15 parts of arylnitrone, and 5-15 parts of organic binder.
- 7. A spin castable mixture in accordance with claim 1, where the arylnitrone is .alpha.-(4-diethylaminophenyl)-N-(4-ethoxycarbonylphenyl)nitrone.
- 8. A spin castable composition in accordance with claim 5, where the aryl nitrone is .alpha.-(4-diethylaminophenyl)-N-phenylnitrone.
- 9. A spin castable mixture in accordance with claim 6, where the inert organic polymer binder is a copolymer of styrene and allyl alcohol.
- 10. A spin castable mixture capable of forming a removable photobleachable layer which initially is relatively opaque to light having an absorption maximum in the range of 300 to 450 nanometers comprising by weight
- (A) 100 parts of toluene,
- (B) 5 to 15 parts of a copolymer of styrene and allyl alcohol,
- (C) 5 to 15 parts of .alpha.-(4-diethylaminophenyl)-N-phenylnitrone.
CROSS REFERENCE TO RELATED APPLICATIONS
This application is a division of Ser. No. 536,923, filed Sept. 28, 1983 which is a continuation-in-part of Ser. No. 438,194, filed Nov. 1, 1982, now abandoned, both assigned to the same assignee as the present invention and incorporated herein by reference.
US Referenced Citations (7)
Foreign Referenced Citations (5)
Number |
Date |
Country |
0156740 |
Sep 1982 |
DEX |
1109473 |
Apr 1968 |
GBX |
2032125 |
Apr 1980 |
GBX |
1566802 |
May 1980 |
GBX |
1588417 |
Apr 1981 |
GBX |
Non-Patent Literature Citations (3)
Entry |
Sam H. Kaplan, "Control of Fluorescent Screen Dot Size for Color TV", Journal of the Society of Motion Picture and Television Engineers, vol. 65, No. 8, Aug. 1985, pp. 407-410. |
W. S. DeForest, Photoresist:Materials and Processes, McGraw-Hill Book Company, 1975, New York, N.Y., pp. 100-101. |
Jan Hamer and Anthony Macaluso, "Nitrones", Chemical Reviews, vol. 64, No. 4, Aug. 1964, pp. 473-495. |
Divisions (1)
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Number |
Date |
Country |
Parent |
536923 |
Sep 1983 |
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Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
438194 |
Nov 1982 |
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