Claims
- 1. A spin castable photoresist composition comprising
- (A) 100 parts of an inert organic solvent
- (B) 1 to 15 parts of a polymethylmethacrylate and
- (C) 0.01 to 1.0 part of a cinnamic acid derivative of the formula ##STR4## where R and R.sup.1 are selected from hydrogen or C.sub.(1-8) alkyl, Q is --O-- or --N--, X is selected from halogen and nitrile, R.sup.2 is a monovalent group selected from ##STR5## polyalkylene glycol, polyalkylene amide and polyalkylene ester and R.sup.3 is a C.sub.(1-8) alkylene radical or C.sub.(6-13) aryl radical.
- 2. A spin castable composition in accordance with claim 1, where the cinnamic acid derivative is 1,3-propanediol diester of p-diethylamino-.alpha.-cyano cinnamic acid.
Parent Case Info
This application is a division of application Ser. No. 619,526 filed June 11, 1984, U.S. Pat. No. 4,535,053.
US Referenced Citations (5)
Divisions (1)
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Number |
Date |
Country |
Parent |
619526 |
Jun 1984 |
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