Abstract JP 7-309882, Nov. 1995.* |
Abstract SU 1073248, Feb. 1984.* |
Singer, “Anti-Reflective Coatings: A Story of Interfaces”, Semiconductor International, pp. 55-60 (Mar. 1999). |
Lucas, et al., “Anti-reflective coating optimizing techniques for sub-0.2um geometries”, Motorola, Advanced Products Research and Development Lab, p. 171, SPIE 25th Annual Symposium on Microlithography, Feb. 27-Mar. 3, 2000. |
Puppo, et al., “A novel organic resist removal and cleaning technolgy”, p. 228, SPIE 25th Annual Symposium on Microlithography, Feb. 27-Mar. 3, 2000. |
Taylor, et al., “Methyacrylate Resists and Antireflective Coatings for 193 nm Lithography”, p. 245, SPIE 25th Annual Symposium on Microlithography, Feb. 27-Mar. 3, 2000. |
Lin, et al., “Dual Layer Inorganic SiON Bottom ARC for 0.25 μm DUV Hard Mask Applications”, p. 246, SPIE 25th Annual Symposium on Microlithography, Feb. 27-Mar. 3, 2000. |
Yamanaka, et al., “Suppression of Resist pattern Deformation on SiON Bottom Anti-Reflective Layer for Deep UV Lithography”, p. 247, SPIE 25th Annual Symposium on Microlithography, Feb. 27-Mar. 3, 2000. |
Padmanaban, “Bottom Anti-Reflective Coatings for ArF, KrF, and I-line Applications: A Comparison of Theory, Design and Lithographic Aspects”, p. 281, SPIE 25th Annual Symposium on Microlighotraphy, Feb. 27-Mar. 3, 2000. |
Onishi, “Application of polysilanes for deep UV antireflective coating”, p. 248, SPIE 25th Annual Symposium on Microlithography, Feb. 27-Mar. 3, 2000. |
Mitzutani, et al., “Design of a new bottom antireflective coating composition for KrF resist”, p. 277, SPIE 25th Annual Symposium on Microlithography, Feb. 27-Mar. 3, 2000. |
Trefonas, “Organic Antireflective Coatings for 193nm Lithography”, p. 298, SPIE 25th Annual Symposium on Microlighotraphy, Feb. 27-Mar. 3, 2000. |
Meador, “Recent Progress in 193 nm Antireflective Coatings”, p. 311, SPIE 25th Annual Symposium on Microlithography, Feb. 27-Mar. 3, 2000. |
Ding, et al., Process and Performance Optimization of Bottom Antireflective Coatings (Part II), p. 328, SPIE 25th Annual Symposium on Microlithography, Feb. 27-Mar. 3, 2000. |
Schiavone, et al., “SiON based antireflective coating for 193nm lithography”, p. 335, SPIE 25th Annual Symposium on Microlithography, Feb. 27-Mar. 3, 2000. |
Lu, “Performance impact of novel polymetric dyes in photoresist application”, p. 346, SPIE 25th Annual Symposium on Microlithography, Feb. 27-Mar. 3, 2000. |
Andrews, et al., “Spinnable and UV-Patternable Hybrid Sol-Gel Silica Glass for Direct Semiconductor Dielectric Layer Manufacturing”, p. 347, SPIE 25th Annual Symposium on Microlithography, Feb. 27-Mar. 3, 2000. |
Stephen, et al., “Antireflective Coating for 193nm Lithography”, p. 355, SPIE 25th Annual Symposium on Microlithography, Feb. 27-Mar. 3, 2000. |
Chun, et al., “Novel Hardening Methods of DUV Chemically Amplified Photoresist By ION Implanation and Its Application to New Organic ARC Material and Bilayer Process”, p. 360, SPIE 25th Annual Symposium on Microlithography, Feb. 27-Mar. 3, 2000. |
van Wingerden, “Joint optimisation of substrate reflectivity, resist thickness and resist absorption for CD control and resolution”, p. 451, SPIE 25th Annual Symposium on Microlithography, Feb. 27-Mar. 3, 2000. |
Chou, et al., “Anti-Reflection Strategies for Sub-0.18μm Dual Damascene Patterning in KrF 248nm Lithography”, p. 453, SPIE 25th Annual Symposium on Microlithography, Feb. 27-Mar. 3, 2000. |
Nakaoka, et al., “Comparison of CD variation between organic and inorganic bottom anti-reflective coating on Topographic Substrates”, p. 454, SPIE 25th Annual Symposium on Microlithography, Feb. 27-Mar. 3, 2000. |
Bauer, et al., “ARC technology to minimize CD-Variations during Emitter structuring—Experiment and Simulation”, p. 459, SPIE 25th Annual Symposium on Microlithography, Feb. 27-Mar. 3, 2000. |